Abstract: A polymer film that has an in-plane retardation Re(?) and a thickness-direction retardation Rth(?) satisfying formula (i) and (ii), and that further has a surface energy of at least one surface is from 50 mN/m to 80 mN/m: (i) 0?Re(630)?10, and |Rth(630)|?25; and (ii) |Re(400)?Re(700)?10, and |Rth(400)?Rth(700)|?35. in the formulae, Re(?) and Rth(?) are measurement values at the wavelength of ? nm, and an optically-compensatory film, an optical material such as a polarizer and a liquid-crystal display device using the polymer film.

Abstract: A liquid crystal display device comprising first and second polarizing elements of which transmission axes are perpendicular to each other, and, disposed between the polarizing elements, a liquid crystal layer vertically aligned in a black state, and first and second optically anisotropic layer is disclosed. In the liquid crystal display device, the first optically anisotropic layer is a biaxial optically anisotropic layer of which in-plane retardation (Re) and thickness-direction retardation (Rth) are larger at a longer wavelength range within a range of from 400 nm to 700 nm, and the second optically anisotropic layer satisfies 0 nm<|Re(550)|<10 nm and |Rth(550)|/|Re(550)|>10 in which Re(550) is in-plane retardation (Re) at a wavelength of 550 nm and Rth(550) is thickness-direction retardation at the same wavelength.

Abstract: A liquid crystal display comprising a first polarization film, a first retardation region, a second retardation region, a liquid crystal layer, a liquid crystal cell, and a second polarization film disposed in this order, liquid crystal molecules of the liquid crystal layer being aligned in parallel with surfaces of the substrates at the time of dark state, wherein Re of the first retardation region is 70 nm to 330 nm, Nz value of the first retardation region is greater than 0 and less than 0.

Abstract: A novel biaxial optical film of which in-plane retardation (Re) and thickness-direction retardation (Rth) are larger at a longer wavelength range within a range of from 400 nm to 700 nm, wherein the in-plane retardation thereof at a wavelength of 550 nm, Re(550), satisfies Re(550)>20 nm and the Nz value thereof (Nz=Rth(550)/Re(550)+0.5) satisfies 1.1?Nz?5, is disclosed. And a polarizing plate comprising the optical film is also disclosed.

Abstract: A liquid-crystal display device comprising at least a liquid-crystal cell, a first optically anisotropic layer and a second optically anisotropic layer is disclosed. The first optically anisotropic layer satisfies the following formula (a1), the second optically anisotropic layer has at least one optical axis, and at least one of the first and second optically anisotropic layers is formed according to a coating or transferring method. 10<Rth(548)/Re(548) ??(a1) [wherein Rth (?) means the retardation (nm) in the thickness direction at a wavelength ? (nm].

Abstract: An optical film satisfies the following formulae (1) to (6): 150?Re(550)?400 ??(1) ?100?Rth(550)?100 ??(2) 0.1<Re(450)/Re(550)<0.95 ??(3) 1.03<Re(650)/Re(550)<1.93 ??(4) 0.4<(Re(450)/Rth(450))/(Re(550)/Rth(550))<0.95 ??(5) 1.05<(Re(650)/Rth(650))/(Re(550)/Rth(550))<1.90, ??(6) wherein Re(450), Re(550) and Re(650) are an in-plane retardation value (unit: nm) measured with light at a wavelength of 450 nm, 550 nm and 650 nm, respectively, and Rth(450), Rth(550) and Rth(650) are a retardation value in a thickness-direction (unit: nm) measured with light at a wavelength of 450 nm, 550 nm and 650 nm, respectively.

Abstract: A liquid crystal display device comprising at least a liquid crystal cell, and a polarizing plate (a first polarizing plate) disposed on at least one side of the outsides of the liquid crystal cell, wherein the liquid crystal cell comprises a pair of substrates which face each other, an electrode disposed on at least one of the pair of substrates, a liquid crystal layer sandwiched between the pair of substrates, and at least three pixel regions, a color filter showing wavelength selectivity in transmissivity is disposed on each of the at least three pixel regions is disclosed.

Abstract: A novel liquid crystal display device is disclosed. The device comprises a first polarizing element and a second polarizing element which are disposed with their transmission axes perpendicular to each other, a liquid crystal layer disposed between the first and the second polarizing elements, and a first optically anisotropic layer disposed between the first or the second polarizing element and the liquid crystal layer, showing a positive in-plane retardation (Re) at ?1 and a negative Re at ?2, both of ?1 and ?2 (?1??2) are within a visible wavelength range, and its absolute value of a thickness-direction retardation at 550 nm, |Rth(550)|, is equal to or more than 50 nm.

Abstract: An optical film includes at least one kind of humidity dependency improver that improves ?Re, wherein the optical film has a ratio of Re/Rth which is larger as a wavelength is longer in the visible wavelength region; and Re which is larger as a wavelength is longer in the visible wavelength region, wherein Re represents an in-plane retardation (unit: nm) of the optical film; Rth represents a retardation (unit: nm) in a thickness direction of the optical film; and ?Re represents a humidity dependency of Re defined by the following formula (1): ?Re=|Re(550)10%RH?Re(550)80%RH|,: ??Formula (1) wherein Re(550)10%RH represents Re at a wavelength of 550 nm, at a temperature of 25° C. and at a relative humidity of 10%; and Re(550)80%RH represents Re at a wavelength of 550 nm, at a temperature of 25° C. and at a relative humidity of 80%.

Abstract: All optical compensation polarizing plate comprising: a first transparent protective film; a polarizer; a second transparent protective film; and an optical compensation layer in this order, wherein at least one of the first and second transparent protective films is a cellulose acylate film having a retardation value in plane Re (nm) and a retardation value in film thickness direction Rth (nm) which fulfill the following formulae (I) and (II), and Nz and Re1 defined by the following formulae (III) and (IV), of the optical compensation layer fulfill the following formulae (V) and (VI): (I) |Re|?10, (II) |Rth|?25, (III) Nz=(nx1?nz1)/(nx1?ny1), (IV) Re1=(nx1?ny1)×d1, (V) 0.4?Nz?0.

Abstract: An optical film having a value of 1.6 or more, wherein the value is obtained by dividing a larger value by a smaller value of the maximum X-ray diffraction intensity within a range 2?=10 to 40° in a longitudinal direction of the film and the maximum X-ray diffraction intensity within a range 2?=10 to 40° in a direction approximately vertical to the longitudinal direction of the film, and an optical film having a value of 1.3 or more, wherein the value is obtained by dividing a larger value by a smaller value of a tensile elastic modulus in a longitudinal direction of the film and a tensile elastic modulus in a direction approximately vertical to the longitudinal direction of the film.

Abstract: A novel transparent film is disclosed. Re (?) and Rth (?) of the film defined by the following formulae (I) and (II) satisfy the following formulae (III) and (IV): Re (?)=(nx?ny)×d,??(I) Rth (?)={(nx+ny)/2?nz}×d,??(II) 0?|Re(630)|?50,??(III) Rth (400)×Rth (700)?0, and 0<|Rth (700)?Rth (400)|?150,??(IV) wherein Re (?) means an in-plane retardation value at a wavelength ? nm (unit: nm); Rth (?) means a thickness-direction retardation value at a wavelength ? nm (unit: nm); nx means a refractive index in the in-plane slow-axis direction; ny means a refractive index in the in-plane fast-axis direction; nz means a refractive index in the film thickness direction; and d means a thickness of the film.

Abstract: An optical film is provided and contains at least one of a polycarbonate copolymer and a blend containing the polycarbonate copolymer. The polycarbonate copolymer contains specific repeating units. The optical film satisfies the following formulae (1) to (4). 0.1<Re(450)/Re(50)<0.95??(1) 1.03<Re(650)/Re(550)<1.93??(2) 0.4<(Re(450)/Rth(450))/(Re(550)/Rth(550))<0.95??(3) 1.05<(Re(650)/Rth(650))/(Re(550)/Rth(550))<1.

Abstract: An optical compensation film having: a retardation value Re in a film plane of the optical compensation film; and a retardation value Rth in a thickness direction of the optical compensation film, the retardation value Re and Rth being reduced by an elongation, satisfying the formulae (1) and (2) without the elongation, and satisfying the formulae (3) to (6) after the elongation: Re=0 to 30 nm??(1) Rth=?50 to 50 nm??(2) Re(n)=?500 to 0 nm??(3) Rth(n)=?800 to 0 nm??(4) Re(n)?Re(0)<0??(5) Rth(n)?Rth(0)<0??(6)

Abstract: An optical film is provided and has retardations satisfying relations (1) to (3): 0?Re(550)?10; ??(1) ?25?Rth(550)?25; and ??(2) |I|+|II|+|III|+|IV|>0.5 (nm), ??(3) with definitions: I=Re(450)?Re(550); II=Re(650)?Re(550); III=Rth(450)?Rth(550); and IV=Rth(650)?Rth(550), wherein Re(450), Re(550) and Re(650) are in-plane retardations measured with lights of wavelength of 450, 550 and 650 nm, respectively; and Rth(450), Rth(550) and Rth(650) are retardations in a thickness direction of the optical film, which are measured with lights of wavelength of 450, 550 and 650 nm, respectively.

Abstract: A semiconductor device suppressing the lateral diffusion of impurities doped in a PMOS and NMOS and shortening the distance between the PMOS and NMOS to reduce the size of the semiconductor device, including PMOS and NMOS formation regions isolated by an element isolation region; a p-type gate electrode arranged on the PMOS formation region; an n-type gate electrode arranged on the NMOS formation region; and first and second impurity storage regions arranged in a direction different from that of the arrangement of the p-type and n-type gate electrodes. An end of the first impurity storage region is connected to the p-type gate electrode, an end of the second impurity storage region is connected to the n-type gate electrode, and the other ends of the first and second impurity storage regions are electrically connected.

Abstract: A semiconductor device including a semiconductor substrate, an insulating layer formed on the substrate, a dielectric organic layer formed on the insulating layer and having a dielectric constant of not more than 3.0, and an interconnection layer in contact with the insulating layer in the dielectric organic layer, wherein the upper surface of the interconnection layer is formed higher than the upper surface of the dielectric organic layer, and a method of manufacture thereof.

Abstract: Disclosed is a rotatable-and-swingable type of rotary joint device according to the present invention comprises at least an input shaft rotatably fixed to the casing of the device, a precession spherical body responsive to the rotation of the input shaft for rotating and swinging, and an output shaft operatively connected to the precession spherical body for rotating. This arrangement permits the crossing of the input and output shafts to change freely within certain angular limits, thereby substantially increasing the versatility of designing, and contributing to the down-sizing of the drive transmission.

Abstract: The present invention provides a process for the fabrication of a wiring board, which comprises the following steps: (a) forming a first wiring pattern on a first side of a self-supporting carrier metal foil so as to obtain a self-supporting wiring sheet comprising the carrier metal foil and the first wiring pattern; (b) superposing and pressing the first side of said self-supporting wiring sheet on and against an insulating substrate so that the first wiring pattern is_embedded in the insulating substrate and constitutes a surface with the insulating substrate; and (c) etching off desired portions of said carrier metal foil to form a second wiring pattern made of said carrier metal foil remaining on the surface constituted by the insulating substrate and the first wiring pattern. The present invention also provides the wiring board for electrical tests so fabricated.

Abstract: A semiconductor device including a semiconductor substrate, an insulating layer formed on the substrate, a dielectric organic layer formed on the insulating layer and having a dielectric constant of not more than 3.0, and an interconnection layer in contact with the insulating layer in the dielectric organic layer, wherein the upper surface of the interconnection layer is formed higher than the upper surface of the dielectric organic layer, and a method of manufacture thereof.