Patents by Inventor Hajime Shirakawa

Hajime Shirakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11953829
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group; a first photoacid generator that generates an acid having a pKa of ?2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is ?2.00 or more and less than 1.00; and a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more.
    Type: Grant
    Filed: February 21, 2020
    Date of Patent: April 9, 2024
    Assignee: FUJIFILM Corporation
    Inventors: Kazunari Yagi, Takashi Kawashima, Tomotaka Tsuchimura, Hajime Furutani, Michihiro Shirakawa
  • Publication number: 20060043073
    Abstract: A substrate treating method for performing deionized water treatment of substrates with a treating solution including deionized water. The method includes the steps of performing chemical treatment of the substrates with a treating solution including a chemical solution, and supplying deionized water and performing deionized water treatment. The step of performing deionized water treatment is executed by using a treating solution having a specific resistance value lower than a reference specific resistance value of deionized water. The deionized water treatment is terminated in a deionized water treating time that elapses before the reference specific resistance value is attained.
    Type: Application
    Filed: August 22, 2005
    Publication date: March 2, 2006
    Inventors: Hajime Shirakawa, Atsushi Osawa
  • Publication number: 20040242004
    Abstract: A substrate treating method for performing a predetermined treatment of substrates as immersed in a treating liquid stored in a treating tank. The method includes a first step of deriving a current treating rate from a relationship between use history and treating rate of the treating liquid and an up-to-date use history of the treating liquid, a second step of determining a corrected treating time by extending a predetermined treating time according to the current treating rate, and a third step of treating the substrates for the corrected treating time.
    Type: Application
    Filed: March 23, 2004
    Publication date: December 2, 2004
    Applicant: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Hajime Shirakawa, Hiroaki Uchida, Akira Morita
  • Patent number: 6199568
    Abstract: A treating tank includes injection pipes for injecting a treating liquid. Each injection pipe has a closed distal end, and a plurality of jet bores arranged along a side wall thereof for jetting, into the treating tank, the treating liquid introduced through a proximal end. Each injection pipe includes a liquid jetting pipe portion defining the jet bores and having an inside diameter larger than a bore diameter of a liquid inlet formed at the proximal end for introducing the treating liquid into the liquid jetting pipe portion. This construction provides a uniform head length of the treating liquid jetting from the jet bores into the treating tank to effect uniform treatment of substrates in the treating tank. Where each injection pipe includes a sloping pipe portion having an inside diameter gradually increasing from the liquid inlet to the liquid jetting pipe portion, a higher degree of uniformity is achieved for the head length of the treating liquid jetting from the jet bores into the treating tank.
    Type: Grant
    Filed: October 19, 1998
    Date of Patent: March 13, 2001
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Kenichiro Arai, Hajime Shirakawa