Abstract: A laser device according to an aspect of the present disclosure includes a chamber into which laser gas is introduced; a pair of electrodes arranged in the chamber; a power source configured to apply a voltage between the electrodes; a nozzle structure which includes an internal passage for receiving the laser gas and a slit connected to the internal passage and is configured to generate flow of the laser gas between the electrodes due to the laser gas blowing out from the slit; a gas flow path which has a suction port through which the laser gas in the chamber is suctioned and introduces, to the nozzle structure, the laser gas suctioned through the suction port; and a blower device configured to cause the laser gas to blow toward the internal passage of the nozzle structure through the gas flow path.

Abstract: A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0<G1·G2<1 where G1 is a G parameter of the first optical member, and G2 is a G parameter of the second optical member.

Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0<G1·G2<1 where G1 is a G parameter of the first optical member, and G2 is a G parameter of the second optical member.

Abstract: There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively.

Abstract: A spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light may include an extreme ultraviolet light source, an optical system, and a first photosensor. The extreme ultraviolet light source may be configured to output extreme ultraviolet light to a spheroidal mirror that includes a spheroidal reflection surface. The optical system may be configured to allow the extreme ultraviolet light to travel to the spheroidal reflection surface via a first focal position of the spheroidal mirror. The first photosensor may be provided at a second focal position of the spheroidal mirror, and may be configured to detect the extreme ultraviolet light that has passed through the first focal position and then has been reflected by the spheroidal reflection surface.

Abstract: A target generation device may include a filter structure, a flange, a tank unit, and a nozzle section. The flange may accommodate the filter structure and contain a flow path passing through the filter structure. The tank unit may contain a space in communication with the flow path in the flange and store a predetermined target material. The nozzle section may be provided to the flange and in communication with the space in the tank unit through the flow path in the flange. The filter structure according to one embodiment of the present disclosure may include a filter of a porous material and a socket integrally formed with the filter.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber.

Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract: A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.