Patents by Inventor Hakaru Mizoguchi

Hakaru Mizoguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10447001
    Abstract: A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0<G1·G2<1 where G1 is a G parameter of the first optical member, and G2 is a G parameter of the second optical member.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: October 15, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Minoru Taniyama, Hakaru Mizoguchi, Osamu Wakabayashi
  • Publication number: 20190252846
    Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively.
    Type: Application
    Filed: April 26, 2019
    Publication date: August 15, 2019
    Applicants: National University Corporation Nagaoka University of Technology, Gigaphoton Inc.
    Inventors: Weihua JIANG, Hiroshi UMEDA, Hakaru MIZOGUCHI, Takashi MATSUNAGA, Hiroaki TSUSHIMA, Tomoyuki OHKUBO
  • Patent number: 10306743
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: May 28, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Kouji Kakizaki, Tatsuya Yanagida, Osamu Wakabayashi, Hakaru Mizoguchi
  • Publication number: 20190141826
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Application
    Filed: December 17, 2018
    Publication date: May 9, 2019
    Applicant: Gigaphoton Inc.
    Inventors: Tsukasa HORI, Kouji KAKIZAKI, Tatsuya YANAGIDA, Osamu WAKABAYASHI, Hakaru MIZOGUCHI
  • Patent number: 10251255
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Grant
    Filed: September 20, 2018
    Date of Patent: April 2, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Kouji Kakizaki, Tatsuya Yanagida, Osamu Wakabayashi, Hakaru Mizoguchi
  • Publication number: 20190037677
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Application
    Filed: September 20, 2018
    Publication date: January 31, 2019
    Applicant: Gigaphoton Inc.
    Inventors: Tsukasa HORI, Kouji KAKIZAKI, Tatsuya YANAGIDA, Osamu WAKABAYASHI, Hakaru MIZOGUCHI
  • Patent number: 10117317
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: October 30, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Kouji Kakizaki, Tatsuya Yanagida, Osamu Wakabayashi, Hakaru Mizoguchi
  • Publication number: 20180123308
    Abstract: A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0<G1·G2<1 where G1 is a G parameter of the first optical member, and G2 is a G parameter of the second optical member.
    Type: Application
    Filed: December 29, 2017
    Publication date: May 3, 2018
    Applicant: GIGAPHOTON INC.
    Inventors: Minoru TANIYAMA, Hakaru MIZOGUCHI, Osamu WAKABAYASHI
  • Patent number: 9954339
    Abstract: There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: April 24, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Takashi Suganuma, Hakaru Mizoguchi, Osamu Wakabayashi
  • Publication number: 20180110116
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Application
    Filed: December 5, 2017
    Publication date: April 19, 2018
    Applicant: Gigaphoton Inc.
    Inventors: Tsukasa HORI, Kouji KAKIZAKI, Tatsuya YANAGIDA, Osamu WAKABAYASHI, Hakaru MIZOGUCHI
  • Patent number: 9877378
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: January 23, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Kouji Kakizaki, Tatsuya Yanagida, Osamu Wakabayashi, Hakaru Mizoguchi
  • Publication number: 20170336282
    Abstract: A spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light may include an extreme ultraviolet light source, an optical system, and a first photosensor. The extreme ultraviolet light source may be configured to output extreme ultraviolet light to a spheroidal mirror that includes a spheroidal reflection surface. The optical system may be configured to allow the extreme ultraviolet light to travel to the spheroidal reflection surface via a first focal position of the spheroidal mirror. The first photosensor may be provided at a second focal position of the spheroidal mirror, and may be configured to detect the extreme ultraviolet light that has passed through the first focal position and then has been reflected by the spheroidal reflection surface.
    Type: Application
    Filed: August 9, 2017
    Publication date: November 23, 2017
    Applicants: The University of Tokyo, GIGAPHOTON INC.
    Inventors: Yohei KOBAYASHI, Hakaru MIZOGUCHI, Junichi FUJIMOTO, Katsunori ISOMOTO, Osamu WAKABAYASHI, Georg SOUMAGNE
  • Publication number: 20170338618
    Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively.
    Type: Application
    Filed: August 8, 2017
    Publication date: November 23, 2017
    Applicants: National University Corporation Nagaoka University of Technology, Gigaphoton Inc.
    Inventors: Weihua JIANG, Hiroshi UMEDA, Hakaru MIZOGUCHI, Takashi MATSUNAGA, Hiroaki TSUSHIMA, Tomoyuki OHKUBO
  • Publication number: 20170203238
    Abstract: A target generation device may include a filter structure, a flange, a tank unit, and a nozzle section. The flange may accommodate the filter structure and contain a flow path passing through the filter structure. The tank unit may contain a space in communication with the flow path in the flange and store a predetermined target material. The nozzle section may be provided to the flange and in communication with the space in the tank unit through the flow path in the flange. The filter structure according to one embodiment of the present disclosure may include a filter of a porous material and a socket integrally formed with the filter.
    Type: Application
    Filed: March 31, 2017
    Publication date: July 20, 2017
    Applicant: Gigaphoton Inc.
    Inventors: Takanobu ISHIHARA, Hakaru MIZOGUCHI
  • Publication number: 20170019983
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Application
    Filed: September 28, 2016
    Publication date: January 19, 2017
    Applicant: Gigaphoton Inc.
    Inventors: Tsukasa HORI, Kouji KAKIZAKI, Tatsuya YANAGIDA, Osamu WAKABAYASHI, Hakaru MIZOGUCHI
  • Patent number: 9510434
    Abstract: Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: November 29, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Hakaru Mizoguchi, Yasufumi Kawasuji, Osamu Wakabayashi
  • Patent number: 9507248
    Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.
    Type: Grant
    Filed: November 20, 2012
    Date of Patent: November 29, 2016
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Okazaki, Hakaru Mizoguchi, Junichi Fujimoto, Takashi Matsunaga, Kouji Kakizaki, Osamu Wakabayashi
  • Patent number: 9497842
    Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
    Type: Grant
    Filed: January 11, 2016
    Date of Patent: November 15, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Tsukasa Hori, Kouji Kakizaki, Tatsuya Yanagida, Osamu Wakabayashi, Hakaru Mizoguchi
  • Patent number: 9465307
    Abstract: A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: October 11, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Hakaru Mizoguchi, Shinji Nagai
  • Patent number: 9402297
    Abstract: An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: July 26, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Osamu Wakabayashi, Tatsuya Yanagida, Hakaru Mizoguchi