Patents by Inventor Hakki U Alpay

Hakki U Alpay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for optimizing a pellicle for off-axis transmission of light
    Patent number: 7271950
    Abstract: An apparatus and method for optimizing a pellicle for off-axis transmission are disclosed. A pellicle includes a thin film optimized for transmission of off-axis incident light at a desired angle. The pellicle further includes an optical thickness greater than a design thickness by less than or equal to approximately one-quarter of an exposure wavelength.
    Type: Grant
    Filed: February 15, 2001
    Date of Patent: September 18, 2007
    Assignee: Toppan Photomasks, Inc.
    Inventors: Joseph S Gordon, Gregory P Hughes, Franklin D Kalk, Hakki U Alpay
  • Photomask blanks
    Patent number: 5459002
    Abstract: Transmissive embedded phase shifter-photomask blanks are disclosed which comprise an optically inhomogeneous attenuating film which has a transmission of at least 0.001 and consists essentially of a combination of a metallic component and a dielectric component. One surface of the film has a higher content of metallic component than the other surface and the profile of change in extinction coefficient is gradual through the film thickness. The profile of change in extinction coefficient and the film thickness are selected to provide a phase shift of about 180.degree. (or an odd multiple thereof) at a selected wavelength.
    Type: Grant
    Filed: March 28, 1994
    Date of Patent: October 17, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Hakki U. Alpay, Roger H. French, Franklin D. Kalk
  • Photomask blanks comprising transmissive embedded phase shifter
    Patent number: 5415953
    Abstract: Transmissive embedded phase shifter-photomask blanks are disclosed which comprise an optically inhomogeneous attenuating film which has a transmission of at least 0.001 at the lithographic wavelength and consists essentially of a combination of multiple components with one of the components having a higher absorbance than another at the lithographic wavelength, One depth from a surface of the films has a higher content of the higher absorbing component than another depth and the profile of change in refractive index and/or extinction coefficient is gradual through the film thickness, Said profile(s) of change and the film thickness are selected to provide a phase shift of about 180.degree. (or an odd multiple thereof) at a selected lithographic wavelength.
    Type: Grant
    Filed: February 14, 1994
    Date of Patent: May 16, 1995
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Hakki U. Alpay, Roger H. French, Franklin D. Kalk
  • Photomask blank and process for making a photomask blank using gradual compositional transition between strata
    Patent number: 5230971
    Abstract: A single pass, multiple target, continuous sputtering process for manufacturing photomask blanks comprising a single masking layer having plural strata of different composition and gradual compositional transitions between strata. Photomask blanks are useful in the process of integrated circuit manufacture.
    Type: Grant
    Filed: August 8, 1991
    Date of Patent: July 27, 1993
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Hakki U. Alpay