Abstract: Described herein are photomask blanks and photomasks prepared therefrom, methods for producing the photomask blanks and apparatus used in such methods. In one aspect, there is described methods for preparing photomask blanks having layers with a compositional gradient, i.e., a varying composition through the thickness of the layer. In other aspects, either in conjunction with the above aspects or independently, methods and apparatus are provided which allow more efficient use of a cluster tool for preparing the photomask blanks and performing quality control on them. The inventions find applicability, for example, in preparing binary photomask blanks and phase shift photomask blanks.

Abstract: A method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism are disclosed. A pellicle is coupled to a photomask with a non-distorting mechanism that is located on a pellicle frame opposite a thin film coupled to the pellicle frame. The non-distorting mechanism acts to reduce stress exerted on the photomask by the pellicle.

Abstract: A photomask and a method for forming an opaque border on the same are disclosed. In an example method of manufacturing a photomask, no more than one patterning operation is used to form a mask field with an opaque border substantially surrounding the mask field. The border region may be substantially covered by an opaque material, and features in the mask field may be free from the opaque material. When the photomask is used to expose a pattern on an object, the opaque border may substantially prevent electromagnetic radiation (EMR) from exposing portions of the object outside the field of exposure associated with the mask field. The operation of forming the mask field may include forming an insulating clear region surrounding the features and leaving the border region outside the insulating clear region. The opaque layer may be deposited by electroplating or spraying an opaque material onto the border region.

Abstract: A photomask and method for coating a backside of the same with an antireflective material are disclosed. The photomask includes a transparent substrate with a front-side and a backside. The front-side absorber layer has a patterned absorber layer formed thereon. An anti-reflective layer is deposited on the backside of the substrate. More particularly, the antireflective coating may have a refractive index between 1.4 and 1.8. The anti-reflective layer allows the photomask to reduce unwanted reflections within a lithography system and therefore improve system efficacy and throughput.