Patents by Inventor Hako Botma
Hako Botma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180031982Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.Type: ApplicationFiled: February 16, 2016Publication date: February 1, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Han-Kwang NIENHUYS, Erik Willem BOGAART, Rilpho Ludovicus Donker, Borgert KRUIZINGA, Erik Roelof LOOPSTRA, Hako BOTMA, Gosse Charles DE VRIES, Olav Waldemar Vladimir FRIJNS, Johannes Jacobus Matheus BASELMANS
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Patent number: 9785051Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.Type: GrantFiled: September 17, 2013Date of Patent: October 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Sven Antoin Johan Hol, Edwin Johan Buis, Erik Maria Rekkers, Gosse Charles De Vries, Hako Botma, Marinus Johannes Maria Van Dam, Ramon Pascal Van Gorkom
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Publication number: 20150277233Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.Type: ApplicationFiled: September 17, 2013Publication date: October 1, 2015Inventors: Jan Bernard Plechelmus Van Schoot, Sven Antoin Johan Hol, Edwin Johan Buis, Erik Maria Rekkers, Gosse Charles De Vries, Hako Botma, Marinus Johannes Maria Van Dam, Ramon Pascal Van Gorkom
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Patent number: 8576373Abstract: A lithographic apparatus is provided with a sensor. The sensor comprises a frame that defines a space that is crossed multiple times by wire. Detection electronics are connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the wire. The detection electronics are further configured to provide an output signal in the event that a change of temperature of the wire is detected.Type: GrantFiled: September 29, 2010Date of Patent: November 5, 2013Assignee: ASML Netherlands B.V.Inventors: Hako Botma, Johannes Aldegonda Theodorus Marie Van Den Homberg
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Patent number: 8030628Abstract: A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.Type: GrantFiled: November 26, 2008Date of Patent: October 4, 2011Assignee: ASML Netherlands B.V.Inventor: Hako Botma
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Publication number: 20110149255Abstract: A lithographic apparatus is provided with a sensor. The sensor comprises a frame that defines a space that is crossed multiple times by wire. Detection electronics are connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the wire. The detection electronics are further configured to provide an output signal in the event that a change of temperature of the wire is detected.Type: ApplicationFiled: September 29, 2010Publication date: June 23, 2011Applicant: ASML Netherlands B.V.Inventors: Hako BOTMA, Johannes Aldegonda Theodorus Marie Van Den Homberg
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Patent number: 7715101Abstract: Apparatus and methods are used for controlling electromagnetic radiation pulse duration in a lithographic apparatus. A dividing element is arranged to divide an electromagnetic radiation pulse into a first portion and a second portion. A prism receives, refracts, and subsequently emits the first portion of the electromagnetic radiation pulse. A directing element is arranged to direct the first and second portions of the electromagnetic radiation pulse parallel to a common optical axis. The first portion combines with the second portion to form a combined radiation beam pulse. The combined radiation beam pulse has a longer pulse duration than the divided electromagnetic pulse and experiences no corresponding loss in intensity.Type: GrantFiled: September 24, 2007Date of Patent: May 11, 2010Assignee: ASML Netherlands B.V.Inventor: Hako Botma
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Publication number: 20090159819Abstract: A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.Type: ApplicationFiled: November 26, 2008Publication date: June 25, 2009Applicant: ASML Netherlands B. V.Inventor: Hako Botma
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Publication number: 20090080085Abstract: Apparatus and methods are used for controlling electromagnetic radiation pulse duration in a lithographic apparatus. A dividing element is arranged to divide an electromagnetic radiation pulse into a first portion and a second portion. A prism receives, refracts, and subsequently emits the first portion of the electromagnetic radiation pulse. A directing element is arranged to direct the first and second portions of the electromagnetic radiation pulse parallel to a common optical axis. The first portion combines with the second portion to form a combined radiation beam pulse. The combined radiation beam pulse has a longer pulse duration than the divided electromagnetic pulse and experiences no corresponding loss in intensity.Type: ApplicationFiled: September 24, 2007Publication date: March 26, 2009Applicant: ASML Netherlands B.V.Inventor: Hako BOTMA
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Patent number: 7507976Abstract: A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.Type: GrantFiled: May 31, 2006Date of Patent: March 24, 2009Assignee: ASML Netherlands B.V.Inventors: Hako Botma, Ewoud Vreugdenhil, Joe Sakai
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Patent number: 7432517Abstract: A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet pulses from the laser is configured to receive an input pulse of radiation along a first optical axis and further configured to emit one or more corresponding output pulses of radiation along a second optical axis, including a divider disposed along the first optical axis and configured to divide the incoming pulse into a first and a second pulse portion, wherein the divider is further configured to direct the first pulse portion along the second optical axis. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, configured to receive the second pulse portion and to redirect the second portion along the second optical axis.Type: GrantFiled: November 10, 2005Date of Patent: October 7, 2008Assignee: ASML Netherlands B.V.Inventors: Hako Botma, Joerg Bruebach, Mark Trentelman, Adel Joobeur
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Patent number: 7400381Abstract: A lithographic apparatus comprises an illumination system for providing a projection beam of radiation. A support structure is provided for supporting a patterning device, the patterning device serving to impart the projection beam with a pattern in its cross-section. A substrate table holds a substrate, while a projection system projects the patterned beam onto a target portion of the substrate. The illumination system comprises a field defining element arranged to define an illuminating field in the plane of the patterning device or in a plane conjugate thereto, the field being off-axis with respect to the optical axis of the illuminating system.Type: GrantFiled: May 26, 2004Date of Patent: July 15, 2008Assignee: ASML Netherlands B.V.Inventor: Hako Botma
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Patent number: 7375353Abstract: An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the members in such a manner as to control the attenuation of the patterned radiation beam projected onto a target portion of a substrate across the cross-section of the patterned radiation beam. The attenuation control device includes a detector configured to provide an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the detector after attenuation by the member.Type: GrantFiled: September 13, 2005Date of Patent: May 20, 2008Assignee: ASML Netherlands B.V.Inventors: Hendrik Antony Johannes Neerhof, Hako Botma, Marius Ravensbergen
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Publication number: 20080067424Abstract: A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.Type: ApplicationFiled: May 31, 2006Publication date: March 20, 2008Applicant: ASML Netherlands B.V.Inventors: Hako Botma, Ewoud Vreugdenhil, Joe Sakai
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Patent number: 7333178Abstract: A lithographic apparatus includes an illumination system including a field faceted mirror including a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil facets of a pupil faceted mirror. Each of the field facets is configured to provide an illumination slit at a level of a patterning device. The illumination slits are summed together at the level of the patterning device to illuminate the patterning device. First blades are configured to block radiation from a radiation source and each first blade is selectively actuable to cover a portion of a selectable number of field facets. The field faceted mirror further comprises partial field facets, the partial field facets being configured to produce a partial illumination slit at the level of the patterning device, and the pupil faceted mirror further includes pupil facets corresponding to the partial field facets.Type: GrantFiled: May 31, 2005Date of Patent: February 19, 2008Assignee: ASML Netherlands B.V.Inventors: Marcel Mathijs Theodore Marie Dierichs, Hako Botma, Markus Franciscus Antonius Eurlings
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Patent number: 7326948Abstract: A beam modifying device configured to receive an input radiation beam along a first optical axis, and configured to emit an output radiation beam along a second optical axis. The beam modifying device includes a divider disposed along the first optical axis and configured to divide the incoming radiation beam into a first part and a second part, the divider being configured to direct the first part along the second optical axis and to direct the second part via a delay path. The beam modifying device further includes optics forming the delay path, the optics being configured to receive the second part and to direct the second part via the delay path and then along the second optical axis. The optics are arranged to mirror the second part such that the second part is mirrored with respect to the first part.Type: GrantFiled: August 15, 2005Date of Patent: February 5, 2008Assignee: ASML Netherlands B.V.Inventor: Hako Botma
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Patent number: 7312850Abstract: A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator.Type: GrantFiled: April 2, 2004Date of Patent: December 25, 2007Assignee: ASML Netherlands B.V.Inventors: Heine Melle Mulder, Hako Botma
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Publication number: 20070170376Abstract: An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device may be provided to adjust the members in such a manner as to control attenuation of a radiation beam projected onto a target portion of a substrate across the cross-section of the radiation beam.Type: ApplicationFiled: November 2, 2006Publication date: July 26, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Hendrik Neerhof, Hako Botma, Marius Ravensbergen, Gerardus Baas
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Publication number: 20070090278Abstract: A beam modifying device configured to receive an input radiation beam along a first optical axis, and configured to emit an output radiation beam along a second optical axis. The beam modifying device includes a divider disposed along the first optical axis and configured to divide the incoming radiation beam into a first part and a second part, the divider being configured to direct the first part along the second optical axis and to direct the second part via a delay path. The beam modifying device further includes optics forming the delay path, the optics being configured to receive the second part and to direct the second part via the delay path and then along the second optical axis. The optics are arranged to mirror the second part such that the second part is mirrored with respect to the first part.Type: ApplicationFiled: August 15, 2005Publication date: April 26, 2007Applicant: ASML Netherlands B.V.Inventor: Hako Botma
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Publication number: 20070057201Abstract: An attenuation adjustment device is disposed in a radiation system of a lithography device and includes a plurality of members for casting penumbras in the radiation beam illuminating the patterning device. Furthermore an attenuation control device is provided for adjusting the members in such a manner as to control the attenuation of the patterned radiation beam projected onto the target portion of the substrate across the cross-section of the patterned radiation beam. The attenuation control device incorporates a detector for providing an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the angle detector after attenuation by the member.Type: ApplicationFiled: September 13, 2005Publication date: March 15, 2007Applicant: ASML Netherlands B.V.Inventors: Hendrik Neerhof, Hako Botma, Marius Ravensbergen