Abstract: A method of manufacturing a semiconductor device includes arranging a mask on a support. The mask includes a first area and a second area. A substrate is arranged on the mask. The substrate has a mounting area and a non-mounting area. A solder paste is applied on the mounting area of the substrate. After applying the solder paste, at least one electronic device is arranged on the mounting area. A light soldering process is performed by emitting light on the substrate from a light source above the substrate. The first area of the mask is positioned under the non-mounting area and the second area of the mask is positioned under the mounting area.

Abstract: The present invention relates to a method for formation of a redistribution layer using photo-sintering and to the redistribution layer formed by the method. The method for forming a redistribution layer using photo-sintering includes printing, on a substrate, a liquid electrode pattern for a redistribution layer; coating a transparent polymer on the substrate and the pattern; photo-sintering the electrode pattern using photonic energy; and evaporating an organic substance contained in the liquid electrode pattern via the photo-sintering to remove the polymer on a top face of the electrode pattern to form a redistribution layer as the sintered electrode pattern.

Abstract: The present invention relates to a method for formation of a redistribution layer using photo-sintering and to the redistribution layer formed by the method. The method for forming a redistribution layer using photo-sintering includes printing, on a substrate, a liquid electrode pattern for a redistribution layer; coating a transparent polymer on the substrate and the pattern; photo-sintering the electrode pattern using photonic energy; and evaporating an organic substance contained in the liquid electrode pattern via the photo-sintering to remove the polymer on a top face of the electrode pattern to form a redistribution layer as the sintered electrode pattern.