Patents by Inventor Hale Erten

Hale Erten has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Image morphing to meet desired constraints in geometric patterns
    Patent number: 11301982
    Abstract: A method includes identifying a first geometric pattern that failed a design rule check, identifying a second geometric pattern that passed the design rule check, morphing the first geometric pattern based on the second geometric pattern to generate a morphed geometric pattern, wherein the morphed geometric pattern passes the design rule check, and replacing the first geometric pattern with the morphed geometric pattern.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: April 12, 2022
    Assignee: Intel Corporation
    Inventors: Bikram Baidya, Hale Erten, Allan Gu, John A. Swanson, Vivek K. Singh, Abde Ali Hunaid Kagalwalla, Mengfei Yang-Flint
  • IMAGE MORPHING TO MEET DESIRED CONSTRAINTS IN GEOMETRIC PATTERNS
    Publication number: 20190385300
    Abstract: A method includes identifying a first geometric pattern that failed a design rule check, identifying a second geometric pattern that passed the design rule check, morphing the first geometric pattern based on the second geometric pattern to generate a morphed geometric pattern, wherein the morphed geometric pattern passes the design rule check, and replacing the first geometric pattern with the morphed geometric pattern.
    Type: Application
    Filed: August 30, 2019
    Publication date: December 19, 2019
    Applicant: Intel Corporation
    Inventors: Bikram Baidya, Hale Erten, Allan Gu, John A. Swanson, Vivek K. Singh, Abde Ali Hunaid Kagalwalla, Mengfei Yang-Flint
  • Photolithography mask design simplification
    Patent number: 8881071
    Abstract: A photolithography mask design is simplified. In one example, a target mask design is optimized for a photolithography mask. Medial axes of the design and assist features on the optimized mask are identified. These are simplified to lines. Lines that are distant from a respective design feature are pruned. The remaining lines are simplified and then thickened to form assist features.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: November 4, 2014
    Assignee: Intel Corporation
    Inventors: Vivek K. Singh, Bikram Baidva, Omkar S. Dandekar, Hale Erten
  • PHOTOLITHOGRAPHY MASK DESIGN SIMPLIFICATION
    Publication number: 20140237434
    Abstract: A photolithography mask design in simplified. In one example, a target mask design is optimized for a photolithography mask. Medial axes of the design and assist features on the optimized mask are identified. These are simplified to lines. Lines that are distant from a respective design feature are pruned. The remaining lines are simplified and then thickened to form assist features.
    Type: Application
    Filed: December 29, 2011
    Publication date: August 21, 2014
    Inventors: Vivek K. Singh, Bikrsm Baidva, Omkar S. Dandekar, Hale Erten