Patents by Inventor Halil Gökay YEGEN

Halil Gökay YEGEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR
    Publication number: 20240012332
    Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
    Type: Application
    Filed: November 12, 2021
    Publication date: January 11, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Guilherme BRONDANI TORRI, Sebastianus Adrianus GOORDEN, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Edgar Alberto OSORIO OLIVEROS
  • HIGH ACCURACY TEMPERATURE-COMPENSATED PIEZORESISTIVE POSITION SENSING SYSTEM
    Publication number: 20240004184
    Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
    Type: Application
    Filed: November 8, 2021
    Publication date: January 4, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Sebastianus Adrianus GOORDEN, Alexis HUMBLET, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Guilherme BRONDANI TORRI, Edgar Alberto OSORIO OLIVEROS
  • PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
    Publication number: 20220276553
    Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
    Type: Application
    Filed: August 20, 2020
    Publication date: September 1, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrey NIKIPELOV, Sander BALTUSSEN, Vadim Yevgenyevich BANINE, Alexandr DOLGOV, DONMEZ NOYAN, Zomer Silvester HOUWELING, Arnoud Willem NOTENBOOM, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Paul Alexander VERMEULEN, David Ferdinand VLES, Victoria VORONINA, Halil Gökay YEGEN