Patents by Inventor Hamao Watanabe

Hamao Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dimethylphenylsilylmethylpolysilane and method for producing the same
    Patent number: 4727170
    Abstract: A dimethylphenysilylmethylpolysilane is prepared by condensating 1,1-dichloro-1,2,2-trimethyl-2-phenyldisilane in the presence of an alkali metal or alkali earth metal, in an aprotic solvent. This polymer is a viscous liquid which has a weight average molecular weight in the range of from 5,000 to 500,000 and a narrow molecular weight distribution, and has various uses as electroconductors, photoresist and optical information recording materials.
    Type: Grant
    Filed: June 23, 1987
    Date of Patent: February 23, 1988
    Assignee: Yuki Gosei Kogyo Co., Ltd.
    Inventors: Yoichiro Nagai, Hamao Watanabe
  • 1,2,2-trimethyl-1-phenyl polydisilane and method for producing the same
    Patent number: 4727171
    Abstract: A 1,2,2-trimethyl-1-phenylpolydisilane is prepared by condensating 1,2-dichloro-1,2,2-trimethyl-1-phenyldisilane in the presence of an alkali metal or alkali earth metal, in an aprotic solvent. This polymer is a viscous liquid which has a weight average molecular weight in the range of from 5,000 to 500,000 and a narrow molecular weight distribution, and has various uses as electroconductors, photoresist and optical information recording materials.
    Type: Grant
    Filed: June 26, 1987
    Date of Patent: February 23, 1988
    Assignee: Yuki Gosei Kogyo Co., Ltd.
    Inventors: Yoichiro Nagai, Hamao Watanabe
  • 1,2-dichloro-1,2,2-trimethyl-1-phenyldisilane and method for producing the same
    Patent number: 4716240
    Abstract: This invention relates to 1,2-dichloro-1,2,2-trimethyl-1-phenyldisilane expressed by the chemical formula (II),Cl(CH.sub.3).sub.2 SiSi(CH.sub.3)(C.sub.6 H.sub.5)Cl.This invention further relates to a method for producing 1,2-dichloro-1,2,2-trimethyl-1-phenyldisilane by reacting phenyl lithium with 1,1,2-trichloro-1,2,2-trimethyldisilane expressed by the chemical formula (III),Cl(CH.sub.3).sub.2 SiSi(CH.sub.3)Cl.sub.2.This invention still further relates to a method for producing 1,2-dichloro-1,2,2-trimethyl-1-phenyldisilane by reacting 1,1,2-trichloro-1,2,2-trimethyldisilane with phenylmagnesium halide expressed by the general formula (IV), C.sub.6 H.sub.5 MgX (X=halogen atom) in the presence of a cobalt catalyst.
    Type: Grant
    Filed: February 6, 1987
    Date of Patent: December 29, 1987
    Assignee: Yuki Gosei Kogyo Co., Ltd.
    Inventors: Yoichiro Nagai, Hamao Watanabe, Yoshinori Akutsu
  • 1,1-dichloro-1,2,2-trimethyl-2-phenyldisilane and method for producing the same
    Patent number: 4707557
    Abstract: This invention relates to a novel asymmetric 1,1-dichloro-1,2,2-trimethyl-2-phenyldisilane expressed by the chemical formula (I), (C.sub.6 H.sub.5) (CH.sub.3).sub.2 SiSi(CH.sub.3)Cl.sub.2.This invention further relates to a method for producing 1,1-dichloro-1,2,2-trimethyl-2-phenyl disilane by reacting 1,1,2-trichloro-1,2,2-trimethyl disilane expressed by the chemical formula (III), Cl(CH.sub.3).sub.2 SiSi(CH.sub.3)Cl.sub.2 with phenyl magnesium halide expressed by the general formula (IV), C.sub.6 H.sub.5 MgX (X=halogen atom) in the presence of a transition metal (except for cobalt) catalyst.
    Type: Grant
    Filed: February 6, 1987
    Date of Patent: November 17, 1987
    Assignee: Yuki Gosei Kogyo Co., Ltd.
    Inventors: Yoichiro Nagai, Hamao Watanabe, Yoshinori Akutsu