Patents by Inventor Hamid Balamame

Hamid Balamame has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a magnetic head with integration of a small flash field, zero bias, and non-reactive ion milling for pole tip uniformity
    Patent number: 7818875
    Abstract: A method of manufacturing a magnetic write head that provides improved pole critical dimension control, such as improved track width control (improved sigma) and improved flare point control. The method involves a combination of several process improvements, such as photolithographically patterning a P2 pole tip defining photoresist frame using a zero print bias and also using a small flash field. The method also involves the use of a non-reactive ion etch to notch the first pole (P1) using the second pole (P2) as a mask.
    Type: Grant
    Filed: December 7, 2005
    Date of Patent: October 26, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hamid Balamame, Daniel Wayne Bedell, Mary Kathryn Gutberlet, Clarence Kai-Sheng Hsieh, Aron Pentek, Yi Zheng
  • Integration of small flash field, zero bias, and non-reactive ion milling for pole tip uniformity
    Publication number: 20070124917
    Abstract: A method of manufacturing a magnetic write head that provides improved pole critical dimension control, such as improved track width control (improved sigma) and improved flare point control. The method involves a combination of several process improvements, such as photolithographically patterning a P2 pole tip defining photoresist frame using a zero print bias and also using a small flash field. The method also involves the use of a non-reactive ion etch to notch the first pole (P1) using the second pole (P2) as a mask.
    Type: Application
    Filed: December 7, 2005
    Publication date: June 7, 2007
    Inventors: Hamid Balamame, Daniel Bedell, Mary Gutberlet, Clarence Hsieh, Aron Pentek, Yi Zheng