Patents by Inventor Han-Bin Cheng

Han-Bin Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phenanthrene compounds
    Patent number: 6967255
    Abstract: A phenanthrene compound represented by the formula (I): in which, R1, R2, R3, R4, R5, R6, R7, and R8 are identical or different and may each be hydrogen, halogen, C1-6 alkyl, C1-6 alkoxy, or a conjugated group. The phenanthrene compound has a polycyclic structure and semiconductor properties including electron transfer, electroluminescence, and photoluminescence.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: November 22, 2005
    Assignee: Industrial Technology Research Institute
    Inventors: Chi-Shen Tuan, Zong-Wei Tsai, S-Sling Hsu, Han-Bin Cheng, Yu-Fen Cheng, Shinn-Jen Chang
  • PHENANTHRENE COMPOUNDS
    Publication number: 20050176952
    Abstract: A phenanthrene compound represented by the formula (I): in which, R1, R2, R3, R4, R5, R6, R7, and R8 are identical or different and may each be hydrogen, halogen, C1-6 alkyl, C1-6 alkoxy, or a conjugated group. The phenanthrene compound has a polycyclic structure and semiconductor properties including electron transfer, electroluminescence, and photoluminescence.
    Type: Application
    Filed: February 6, 2004
    Publication date: August 11, 2005
    Inventors: Chi-Shen Tuan, Zong-Wei Tsai, S-Sling Hsu, Han-Bin Cheng, Yu-Fen Cheng, Shinn-Jen Chang
  • Silicon-containing copolymer and photosensitive resin composition containing the same
    Patent number: 6670093
    Abstract: The present invention relates to a silicon-containing copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit. The silicon-containing copolymer is suitable for use as a top layer resist in a bilayer resist system.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: December 30, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Tsing-Tang Song, Tsong-Shin Jean, Weir-Torn Jiaang, Chih-Shin Chuang, Han-Bin Cheng, Jui-Fa Chang, Tzu-Yu Lin
  • Silicon-containing copolymer and photosensitive resin composition containing the same
    Publication number: 20020177066
    Abstract: The present invention relates to a silicon-containing copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit. The silicon-containing copolymer is suitable for use as a top layer resist in a bilayer resist system.
    Type: Application
    Filed: May 16, 2001
    Publication date: November 28, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Tsing-Tang Song, Tsong-Shin Jean, Weir-Torn Jiaang, Chih-Shin Chuang, Han-Bin Cheng, Jui-Fa Chang, Tzu-Yu Lin