Patents by Inventor Han Henricus Aldegonda Lempens

Han Henricus Aldegonda Lempens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OBJECT HOLDER AND LITHOGRAPHIC APPARATUS
    Publication number: 20170315454
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Application
    Filed: June 21, 2017
    Publication date: November 2, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Wilhelmus Franciscus Johannes SIMONS, Martijn HOUBEN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Rogier Hendrikus Magdalena CORTIE, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Siegfried Alexander TROMP, Theodorus Wilhelmus POLET, Jim Vincent OVERKAMP, Van Vuong VY
  • Object holder and lithographic apparatus
    Patent number: 9785055
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Grant
    Filed: May 7, 2013
    Date of Patent: October 10, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170242348
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Application
    Filed: May 8, 2017
    Publication date: August 24, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel RIEPEN, Christiaan Alexander HOOGENDAM, Paulus Martinus Maria LIEBREGTS, Ronald VAN DER HAM, Wilhelmus Franciscus Johannes SIMONS, Daniël Jozef Maria DIRECKS, Paul Petrus Joannes BERKVENS, Eva MONDT, Gert-Jan Gerardus Johannes Thomas BRANDS, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Mathieus Anna Karel VAN LIEROP, Christophe DE METSENAERE, Marcio Alexandre Cano MIRANDA, Patrick Johannes Wilhelmus SPRUYTENBURG, Joris Johan Anne-Marie VERSTRAETE, Franciscus Johannes Joseph JANSSEN
  • IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170219939
    Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.
    Type: Application
    Filed: June 26, 2015
    Publication date: August 3, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Theodorus Wilhelmus POLET, Johannes Jacobus BASELMANS, Willem Jan BOUMAN, Han Henricus Aldegonda LEMPENS, Theodorus Marinus MODDERMAN, Cornelius Maria ROPS, Bart SMEETS, Koen STEFFENS, Ronald VAN DER HAM
  • Lithographic apparatus and device manufacturing method
    Patent number: 9645506
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: May 9, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Franciscus Johannes Joseph Janssen
  • OBJECT HOLDER AND LITHOGRAPHIC APPARATUS
    Publication number: 20150131064
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Application
    Filed: May 7, 2013
    Publication date: May 14, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140098353
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Application
    Filed: December 13, 2013
    Publication date: April 10, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel RIEPEN, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
  • Lithographic apparatus and device manufacturing method
    Patent number: 8681308
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
    Type: Grant
    Filed: September 13, 2007
    Date of Patent: March 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
  • Lithographic apparatus and device manufacturing method
    Patent number: 8634053
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: January 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8472003
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: June 25, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Geradus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendrikus Martinus Johannes Bloks
  • Immersion lithographic apparatus and device manufacturing method
    Patent number: 8259283
    Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
    Type: Grant
    Filed: March 20, 2009
    Date of Patent: September 4, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Daniël Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110005603
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
    Type: Application
    Filed: June 22, 2010
    Publication date: January 13, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendricus Martinus Johannes Bloks
  • IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090237632
    Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
    Type: Application
    Filed: March 20, 2009
    Publication date: September 24, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
  • Lithographic apparatus and device manufacturing method
    Publication number: 20090073395
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
    Type: Application
    Filed: September 13, 2007
    Publication date: March 19, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Spruytenburg, Joris Johan Verstraete
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080212046
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Application
    Filed: November 30, 2007
    Publication date: September 4, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Josef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete