Patents by Inventor Han-Hsien Wang

Han-Hsien Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136546
    Abstract: A vacuum battery structural assembly and a vacuum multi-cell battery module composed thereof are provided and include a first repeating unit including a first frame plate and a second frame plate with respect to the first frame plate; and an electrolyte channel defined within the first frame plate and the second frame plate to accommodate a liquid electrolyte, wherein both a surface of the first frame plate and a surface of the second frame plate include a vacuum suction area, the vacuum suction area includes a vacuum aperture and a vacuum channel, wherein the vacuum aperture is formed on at least one surface of the first frame plate and the second frame plate, the vacuum channel is positioned inside the first frame plate and the second frame plate, and is configured to generate a longitudinal pressing suction force and seal the first frame plate and the second frame plate.
    Type: Application
    Filed: November 23, 2022
    Publication date: April 25, 2024
    Inventors: Hung-Hsien Ku, Shang-Qing Zhuang, Ning-Yih Hsu, Chien-Hong Lin, Han-Jou Lin, Yi-Hsin Hu, Po-Yen Chiu, Yao-Ming Wang
  • Patent number: 11968908
    Abstract: In an embodiment, a method includes: forming a first inter-metal dielectric (IMD) layer over a semiconductor substrate; forming a bottom electrode layer over the first IMD layer; forming a magnetic tunnel junction (MTJ) film stack over the bottom electrode layer; forming a first top electrode layer over the MTJ film stack; forming a protective mask covering a first region of the first top electrode layer, a second region of the first top electrode layer being uncovered by the protective mask; forming a second top electrode layer over the protective mask and the first top electrode layer; and patterning the second top electrode layer, the first top electrode layer, the MTJ film stack, the bottom electrode layer, and the first IMD layer with an ion beam etching (IBE) process to form a MRAM cell, where the protective mask is etched during the IBE process.
    Type: Grant
    Filed: June 30, 2022
    Date of Patent: April 23, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tai-Yen Peng, Hui-Hsien Wei, Han-Ting Lin, Sin-Yi Yang, Yu-Shu Chen, An-Shen Chang, Qiang Fu, Chen-Jung Wang
  • Publication number: 20240083960
    Abstract: This disclosure relates to engineered SIRP? variants, and methods of use thereof.
    Type: Application
    Filed: October 31, 2023
    Publication date: March 14, 2024
    Inventors: Jiin-Tarng Wang, Han-Fang Teng, Pan-Hsien Kuo, Chi-Ling Tseng, Zong Sean Juo
  • Publication number: 20230387938
    Abstract: An error correction method comprises; when a decoder determines that an input analog code is at a forbidden state, setting a digital binary code as a first predetermined code and inputting the digital binary code to an ECC engine; determining whether the digital binary code has no error or two errors; when the digital binary code has no error, outputting the digital binary code after ECC by the ECC engine; when the digital binary code has two errors, resetting the digital binary code as a second predetermined code and inputting the digital binary code to the ECC engine for ECC; and when the decoder determines that the input analog code is not at the forbidden state, decoding the input analog code into the digital binary code and inputting the digital binary code to the ECC engine for ECC.
    Type: Application
    Filed: July 3, 2023
    Publication date: November 30, 2023
    Applicant: ETRON TECHNOLOGY, INC.
    Inventors: Ho-Yin CHEN, Han-Hsien WANG, Han-Nung YEH
  • Patent number: 11736121
    Abstract: An error correction method comprises: when a decoder determines that an input analog code is at a forbidden state, setting a digital binary code as a first predetermined code and inputting the digital binary code to an ECC engine; determining whether the digital binary code has no error or two errors; when the digital binary code has no error, outputting the digital binary code after ECC by the ECC engine; when the digital binary code has two errors, resetting the digital binary code as a second predetermined code and inputting the digital binary code to the ECC engine for ECC; and when the decoder determines that the input analog code is not at the forbidden state, decoding the input analog code into the digital binary code and inputting the digital binary code to the ECC engine for ECC.
    Type: Grant
    Filed: May 27, 2022
    Date of Patent: August 22, 2023
    Assignee: ETRON TECHNOLOGY, INC.
    Inventors: Ho-Yin Chen, Han-Hsien Wang, Han-Nung Yeh