Patents by Inventor Han-Lin Zeng

Han-Lin Zeng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Overlay target for optically measuring overlay alignment of layers formed on semiconductor wafer
    Patent number: 9653404
    Abstract: The present invention provides an overlay target. The overlay target includes a plurality of first pattern blocks and a plurality of second pattern blocks. The first pattern blocks and the second patterns blocks are arranged in array by being separated by at least one first gaps stretching along a first direction and at least one second gaps stretching along a second direction. Each first pattern block is composed of a plurality of first stripe patterns stretching along a third direction, and each second pattern block is composed of a plurality of second stripe patterns stretching along a fourth direction. The first direction is orthogonal to the second direction, the third direction and the fourth direction are 45 degrees relative to the first direction.
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: May 16, 2017
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yi-Jing Wang, En-Chiuan Liou, Mei-Chen Chen, Han-Lin Zeng, Chia-Hung Lin, Chun-Chi Yu