Abstract: The method regards manufacturing devices by replication, wherein each of the devices comprises a device surface. The method comprises producing the devices from a replication material by replication using a replication tool (1), wherein the replication tool (1) comprises a tool material comprising replication sites (4) comprising a replication surface (5) each. Each of the replication surfaces (5) corresponds to a negative of the device surface of a respective one of the devices. The tool material comprises, in addition to the replication sites, one or more mitigating features (7) for reducing asymmetric form errors of the device surfaces. Replication tools (1) and methods for manufacturing these are also described.

Abstract: The method for manufacturing a multitude of devices comprises: providing a replication tool comprising a tool material; conditioning the replication tool, wherein the conditioning comprises applying a treatment to the tool material, wherein the treatment comprises exposing the tool material to a conditioning material. And it further comprises, after the conditioning: carrying out one or more replication processes, wherein in each of the one or more replication processes, one or more of the devices are produced from a replication material by replication using the replication tool. The treatment can comprise dimensionally changing the tool material by the exposure of the tool material to the conditioning material. Before carrying out the replication processes, the conditioning material can be hardened and removed.

Abstract: The method regards manufacturing devices by replication, wherein each of the devices comprises a device surface. The method comprises producing the devices from a replication material by replication using a replication tool (1), wherein the replication tool (1) comprises a tool material comprising replication sites (4) comprising a replication surface (5) each. Each of the replication surfaces (5) corresponds to a negative of the device surface of a respective one of the devices. The tool material comprises, in addition to the replication sites, one or more mitigating features (7) for reducing asymmetric form errors of the device surfaces. Replication tools (1) and methods for manufacturing these are also described.

Abstract: The method for manufacturing a multitude of devices comprises: providing a replication tool comprising a tool material; conditioning the replication tool, wherein the conditioning comprises applying a treatment to the tool material, wherein the treatment comprises exposing the tool material to a conditioning material. And it further comprises, after the conditioning: carrying out one or more replication processes, wherein in each of the one or more replication processes, one or more of the devices are produced from a replication material by replication using the replication tool. The treatment can comprise dimensionally changing the tool material by the exposure of the tool material to the conditioning material. Before carrying out the replication processes, the conditioning material can be hardened and removed.

Abstract: The present disclosure describes methods of attaching surfaces together. In one aspect, a method includes depositing a first adhesive onto a first surface of a first item, the first adhesive forming a pattern that at least partially surrounds a region of the first surface where there is no first adhesive. A second adhesive is jetted onto the region of the first surface, wherein the second adhesive has a viscosity lower than a viscosity of the first adhesive. The first surface of the first item and a second surface of a second item are brought into contact with one another. The method also includes curing the first and second adhesives. While the methods can be particularly suitable for manufacturing optical light guide elements, the methods also can be used in other contexts and applications as well.

Abstract: The present disclosure describes methods of attaching surfaces together. In one aspect, a method includes depositing a first adhesive onto a first surface of a first item, the first adhesive forming a pattern that at least partially surrounds a region of the first surface where there is no first adhesive. A second adhesive is jetted onto the region of the first surface, wherein the second adhesive has a viscosity lower than a viscosity of the first adhesive. The first surface of the first item and a second surface of a second item are brought into contact with one another. The method also includes curing the first and second adhesives. While the methods can be particularly suitable for manufacturing optical light guide elements, the methods also can be used in other contexts and applications as well.

Abstract: A silver-based magnesium alloy thin film is provided for the semi-reflective coating layer of optical discs. This alloy has moderate to high reflectivity and reasonable corrosion resistance in the ambient environment.

Abstract: A silver-based magnesium alloy thin film is provided for the semi-reflective coating layer of optical discs. This alloy has moderate to high reflectivity and reasonable corrosion resistance in the ambient environment.

Abstract: A silver-based alloy thin film is provided for the semi-reflective coating layer of optical discs. Alloy additions to silver include copper and a rare earth metal. These alloys have moderate to high reflectivity and reasonable corrosion resistance in the ambient environment.

Abstract: A silver-based alloy thin film is provided for the semi-reflective coating layer of optical discs. Alloy additions to silver include copper and a rare earth metal. These alloys have moderate to high reflectivity and reasonable corrosion resistance in the ambient environment.

Abstract: A silver-based alloy thin film is provided for the highly reflective or semi-reflective coating layer of optical discs. Elements that can be added to silver to produce useful silver alloys include zinc, aluminum, copper, manganese, germanium, yttrium, bismuth, scandium, and cobalt. These alloys have moderate to high reflectivity and reasonable corrosion resistance in the ambient environment.

Abstract: A silver-based alloy thin film is provided for the semi-reflective coating layer of optical discs. Alloy additions to silver include zinc, lithium, germanium, indium, tin, aluminum, and silicon. These alloys have moderate to high reflectivity and reasonable corrosion resistance in the ambient environment.

Abstract: Materials and methods are provided for forming single crystal diamond growth using microwave plasma chemical vapor deposition (CVD) process in partial vacuum with a gaseous mixture containing a methane/hydrogen mixture with optional nitrogen, oxygen and xenon addition. The single crystal substrate can be formed by a modified directional solidification process starting with at least one of the following: pure nickel or a nickel alloy which includes cobalt, iron, or a combination thereof using a vacuum induction melting process. A surface of the single crystal substrate is coated using an electron beam evaporation device with pure iridium or an alloy of iridium and a component selected from the group consisting of iron, cobalt, nickel, molybdenum, rhenium and a combination thereof.

Abstract: The current invention provides for the manufacture of solar voltaic cells with high sunlight to electricity conversion efficiencies by using improved silver-alloy thin films with a thickness in the range of 30 to 60 as a back reflector/conductor. The back reflector surface may be smooth or roughened depending on the design of the solar voltaic cell and the reflective surface used. Silver-alloy thin film in the thickness range of 3 to 10 nanometers can be used to replace traditional transparent conductor such as indium oxide, indium tin oxide, zinc oxide, tin oxide etc. Elements that can be alloyed with silver to create alloys for use in the invention include, Pd, Cr, Zr, Pt, Au, Cu, Cd, B, In, Zn, Mg, Be, Ni, Ti, Si, Li, Al, Mn, Mo, W, Ga, Ge, Sn, and Sb. These alloys may be present in the silver-alloys in amounts ranging from 0.01 to 10.0 a/o percent.

Abstract: A silver-based alloy thin film is provided for the highly reflective or the semi-reflective layer of optical discs. Alloy additions to silver include gold, rhodium, ruthenium, osmium, platinum, palladium, copper, silicon, cadmium, tin, lithium, nickel, cobalt, manganese, indium, chromium, antimony, gallium, boron, molybdenum, zirconium, beryllium, titanium, aluminum, germanium and zinc. These alloys have moderate to high reflectivity and reasonable corrosion resistance in ambient environments.

Abstract: A copper-based alloy film is provided for the highly reflective layer of optical discs. Alloy additions to copper include, silver, magnesium, nickel, zinc, cobalt, boron, aluminum, and indium. These alloys have moderate to high reflectivity and reasonable corrosion resistance in ambient environments.

Abstract: A silver-based alloy thin film is provided, suitable for use as a reflective and/or a transparent electrical conductor for various opto-electronic device applications such as liquid crystal displays, flat panel displays, plasma displays, solar cells, organic light emitting diode and electrochromic or energy efficient windows. Elements alloyed with silver include copper, palladium, platinum, gold, zinc, silicon, cadmium, tin, lithium, nickel, indium, chromium, antimony, gallium, boron, molybdenum, germanium, zirconium, beryllium, aluminum, magnesium, manganese, cobalt and titanium. Over a thickness range of 3 nm to 20 nm, these silver alloy thin films can be used as transparent electrical conductors. At a thickness greater than 20 nm, they can be used as reflectors. These alloys have moderate to high reflectivity and electrical conductivity and reasonable good corrosion resistance under ambient conditions.

Abstract: A silver-based alloy thin film is provided for the highly reflective or the semi-reflective layer of optical discs. Alloy additions to silver include gold, rhodium, ruthenium, osmium, platinum, palladium, copper, silicon, cadmium, tin, lithium, nickel, cobalt, manganese, indium, chromium, antimony, gallium, boron, molybdenum, zirconium, beryllium, titanium, aluminum, germanium and zinc. These alloys have moderate to high reflectivity and reasonable corrosion resistance in ambient environments.

Abstract: A silver-based alloy thin film is provided for the highly reflective or semi-reflective layer of optical discs. Alloy additions to silver include gold, rhodium, ruthenium, osmium, platinum, palladium, copper, silicon, cadmium, tin, lithium, nickel, cobalt, indium, chromium, antimony, gallium, boron, molybdenum, zirconium, beryllium, titanium, magnesium, and zinc. These alloys have moderate to high reflective and reasonable corrosion resistance in the ambient environment.

Abstract: A silver-based alloy thin film is provided for the highly reflective or the semi-reflective layer of optical discs. Alloy additions to silver include magnesium, gold, rhodium, ruthenium, osmium, platinum, palladium, copper, silicon, cadmium, tin, lithium, nickel, cobalt, manganese, indium, chromium, antimony, gallium, boron, molybdenum, zirconium, beryllium, titanium, aluminum, germanium and zinc. These alloys have moderate to high reflectivity and reasonable corrosion resistance in ambient environments.