Patents by Inventor Han-Ting Tsai
Han-Ting Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12382640Abstract: An integrated circuit device includes a ferroelectric layer that is formed with chlorine-free precursors. A ferroelectric layer formed according to the present teaching may be chlorine-free. Structures adjacent the ferroelectric layer are also formed with chlorine-free precursors. The absence of chlorine in the adjacent structures prevents diffusion of chlorine into the ferroelectric layer and prevents the formation of chlorine complexes at interfaces with the ferroelectric layer. The ferroelectric layer may be used in a memory device such as a ferroelectric field effect transistor (FeFET). The absence of chlorine ameliorates time-dependent dielectric breakdown (TDDB) and Bias Temperature Instability (BTI).Type: GrantFiled: April 8, 2022Date of Patent: August 5, 2025Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ya-Ling Lee, Wei-Gang Chiu, Yen-Chieh Huang, Han-Ting Tsai, Tsann Lin, Yu-Ming Lin, Chung-Te Lin
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Patent number: 12274068Abstract: Provided is a method of forming a ferroelectric memory device including: forming a ferroelectric layer between a gate electrode and a channel layer by a first atomic layer deposition (ALD) process. The first ALD process includes: providing a first precursor during a first section; and providing a first mixed precursor during a second section, wherein the first mixed precursor includes a hafnium-containing precursor and a zirconium-containing precursor. In this case, the ferroelectric layer is directly formed as Hf0.5Zr0.5O2 with an orthorhombic phase (O-phase) to enhance the ferroelectric polarization and property.Type: GrantFiled: May 9, 2022Date of Patent: April 8, 2025Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Rainer Yen-Chieh Huang, Han-Ting Tsai, Tsann Lin, Kuo-Chang Chiang, Min-Kun Dai, Chung-Te Lin
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Patent number: 12274181Abstract: In an embodiment, a device includes: a magnetoresistive random access memory (MRAM) array including MRAM cells arranged in rows and columns, where a first column of the columns includes: first bottom electrodes arranged along the first column; first magnetic tunnel junction (MTJ) stacks over the first bottom electrodes; a first shared electrode over each of the first MTJ stacks; second bottom electrodes arranged along the first column; second MTJ stacks over the second bottom electrodes; a second shared electrode over each of the second MTJ stacks; and a bit line electrically connected to the first shared electrode and the second shared electrode.Type: GrantFiled: April 18, 2023Date of Patent: April 8, 2025Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tai-Yen Peng, Yu-Feng Yin, An-Shen Chang, Han-Ting Tsai, Qiang Fu
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Patent number: 12268097Abstract: A memory array device includes an array of memory cells located over a substrate, a memory-level dielectric layer laterally surrounding the array of memory cells, and top-interconnection metal lines laterally extending along a horizontal direction and contacting a respective row of top electrodes within the memory cells. Top electrodes of the memory cells are planarized to provide top surfaces that are coplanar with the top surface of the memory-level dielectric layer. The top-interconnection metal lines do not extend below the horizontal plane including the top surface of the memory-level dielectric layer, and prevent electrical shorts between the top-interconnection metal lines and components of memory cells.Type: GrantFiled: June 16, 2023Date of Patent: April 1, 2025Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Yu-Feng Yin, Tai-Yen Peng, An-Shen Chang, Qiang Fu, Chung-Te Lin, Han-Ting Tsai
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Publication number: 20250081470Abstract: In a method of manufacturing a semiconductor device, a magnetic random access memory (MRAM) cell structure is formed. The MRAM cell structure includes a bottom electrode, a magnetic tunnel junction (MTJ) stack and a top electrode. A first insulating cover layer is formed over the MRAM cell structure. A second insulating cover layer is formed over the first insulating cover layer. An interlayer dielectric (ILD) layer is formed. A contact opening in the ILD layer is formed, thereby exposing the second insulating cover layer. A part of the second insulating cover layer and a part of the first insulating cover layer are removed, thereby exposing the top electrode. A conductive layer is formed in the opening contacting the top electrode.Type: ApplicationFiled: November 19, 2024Publication date: March 6, 2025Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hui-Hsien WEI, Chung-Te LIN, Han-Ting TSAI, Tai-Yen PENG, Yu-Teng DAI, Chien-Min LEE, Sheng-Chih LAI, Wei-Chih WEN
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Patent number: 12219880Abstract: A memory device includes a bottom electrode contact, a magnetic tunnel junction pattern, a protection insulating layer, a first capping layer, an interlayer insulating layer, and a second capping layer. The magnetic tunnel junction pattern is over the bottom electrode contact. The protection insulating layer surrounds the magnetic tunnel junction pattern. The first capping layer surrounds the protection insulating layer. The interlayer insulating layer surrounds the first capping layer. The second capping layer is over the first capping layer and the interlayer insulating layer.Type: GrantFiled: March 4, 2024Date of Patent: February 4, 2025Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tai-Yen Peng, Hui-Hsien Wei, Wei-Chih Wen, Pin-Ren Dai, Chien-Min Lee, Sheng-Chih Lai, Han-Ting Tsai, Chung-Te Lin
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Patent number: 12178051Abstract: In a method of manufacturing a semiconductor device, a magnetic random access memory (MRAM) cell structure is formed. The MRAM cell structure includes a bottom electrode, a magnetic tunnel junction (MTJ) stack and a top electrode. A first insulating cover layer is formed over the MRAM cell structure. A second insulating cover layer is formed over the first insulating cover layer. An interlayer dielectric (ILD) layer is formed. A contact opening in the ILD layer is formed, thereby exposing the second insulating cover layer. A part of the second insulating cover layer and a part of the first insulating cover layer are removed, thereby exposing the top electrode. A conductive layer is formed in the opening contacting the top electrode.Type: GrantFiled: July 31, 2023Date of Patent: December 24, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hui-Hsien Wei, Chung-Te Lin, Han-Ting Tsai, Tai-Yen Peng, Yu-Teng Dai, Chien-Min Lee, Sheng-Chih Lai, Wei-Chih Wen
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Patent number: 12167609Abstract: A method of forming a semiconductor structure includes following operations. A memory layer is formed over the first gate electrode. A channel layer is formed over the memory layer. A first SUT treatment is performed. A second dielectric layer is formed over the memory layer and the channel layer. A source electrode and a drain electrode are formed in the second dielectric layer. A temperature of the first SUT treatment is less than approximately 400° C.Type: GrantFiled: January 31, 2022Date of Patent: December 10, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Min-Kun Dai, Yen-Chieh Huang, Kuo-Chang Chiang, Han-Ting Tsai, Tsann Lin, Chung-Te Lin
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Patent number: 12154608Abstract: A semiconductor device and a method of forming the same are provided. The method includes forming a bottom electrode layer over a substrate. A magnetic tunnel junction (MTJ) layers are formed over the bottom electrode layer. A top electrode layer is formed over the MTJ layers. The top electrode layer is patterned. After patterning the top electrode layer, one or more process cycles are performed on the MTJ layers and the bottom electrode layer. A patterned top electrode layer, patterned MTJ layers and a patterned bottom electrode layer form MTJ structures. Each of the one or more process cycles includes performing an etching process on the MTJ layers and the bottom electrode layer for a first duration and performing a magnetic treatment on the MTJ layers and the bottom electrode layer for a second duration.Type: GrantFiled: August 8, 2023Date of Patent: November 26, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Bo-Jhih Shen, Kuang-I Liu, Joung-Wei Liou, Jinn-Kwei Liang, Yi-Wei Chiu, Chin-Hsing Lin, Li-Te Hsu, Han-Ting Tsai, Cheng-Yi Wu, Shih-Ho Lin
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Publication number: 20240389343Abstract: A method for forming a semiconductor structure includes following operations. A substrate is received. The substrate includes a first dielectric layer and a conducive layer formed in the first dielectric layer. A ferroelectric layer is formed over the first dielectric layer and the conductive layer. A metal oxide semiconductor layer is formed over the ferroelectric layer. An SUT treatment is performed. A temperature of the SUT treatment is less than approximately 400° C.Type: ApplicationFiled: July 25, 2024Publication date: November 21, 2024Inventors: MIN-KUN DAI, YEN-CHIEH HUANG, KUO-CHANG CHIANG, HAN-TING TSAI, TSANN LIN, CHUNG-TE LIN
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Publication number: 20240381786Abstract: In an embodiment, a device includes: a magnetoresistive random access memory (MRAM) array including MRAM cells arranged in rows and columns, where a first column of the columns includes: first bottom electrodes arranged along the first column; first magnetic tunnel junction (MTJ) stacks over the first bottom electrodes; a first shared electrode over each of the first MTJ stacks; second bottom electrodes arranged along the first column; second MTJ stacks over the second bottom electrodes; a second shared electrode over each of the second MTJ stacks; and a bit line electrically connected to the first shared electrode and the second shared electrode.Type: ApplicationFiled: July 23, 2024Publication date: November 14, 2024Inventors: Tai-Yen Peng, Yu-Feng Yin, An-Shen Chang, Han-Ting Tsai, Qiang Fu
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Publication number: 20240371861Abstract: A method includes forming a transistor having source and drain regions. The following are formed on the source/drain region: a first via, a first metal layer extending along a first direction on the first via, a second via overlapping the first via on the first metal layer, and a second metal extending along a second direction different from the first direction on the second via; and the following are formed on the drain/source region: a third via, a third metal layer on the third via, a fourth via overlapping the third via over the third metal layer, and a controlled device at a same height level as the second metal layer on the third metal layer.Type: ApplicationFiled: July 18, 2024Publication date: November 7, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Wei-Chih WEN, Han-Ting TSAI, Chung-Te LIN
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Patent number: 12127489Abstract: An IC structure comprises a substrate, a first dielectric structure, a second dielectric structure, a first via structure, and a memory cell structure. The substrate comprises a memory region and a logic region. The first dielectric structure is over the memory region. The second dielectric structure laterally extends from the first dielectric structure to over the logic region. The second dielectric structure has a thickness less than a thickness of the first dielectric structure. The first via structure extends through the first dielectric structure. A top segment of the first via structure is higher than a top surface of the first dielectric structure. The first memory cell structure is over the first via structure.Type: GrantFiled: February 17, 2023Date of Patent: October 22, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tai-Yen Peng, Hui-Hsien Wei, Wei-Chih Wen, Pin-Ren Dai, Chien-Min Lee, Han-Ting Tsai, Jyu-Horng Shieh, Chung-Te Lin
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Patent number: 12113063Abstract: A method includes forming a transistor having source and drain regions. The following are formed on the source/drain region: a first via, a first metal layer extending along a first direction on the first via, a second via overlapping the first via on the first metal layer, and a second metal extending along a second direction different from the first direction on the second via; and the following are formed on the drain/source region: a third via, a third metal layer on the third via, a fourth via overlapping the third via over the third metal layer, and a controlled device at a same height level as the second metal layer on the third metal layer.Type: GrantFiled: January 30, 2023Date of Patent: October 8, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Wei-Chih Wen, Han-Ting Tsai, Chung-Te Lin
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Patent number: 12078607Abstract: A method of characterizing a wide-bandgap semiconductor material is provided. A substrate is provided, which includes a layer stack of a conductive material layer, a dielectric material layer, and a wide-bandgap semiconductor material layer. A mercury probe is disposed on a top surface of the wide-bandgap semiconductor material layer. Alternating-current (AC) capacitance of the layer stack is determined as a function of a variable direct-current (DC) bias voltage across the conductive material layer and the wide-bandgap semiconductor material layer. A material property of the wide-bandgap semiconductor material layer is extracted from a profile of the AC capacitance as a function of the DC bias voltage.Type: GrantFiled: January 6, 2022Date of Patent: September 3, 2024Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Chih-Yu Chang, Ken-Ichi Goto, Yen-Chieh Huang, Min-Kun Dai, Han-Ting Tsai, Sai-Hooi Yeong, Yu-Ming Lin, Chung-Te Lin
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Patent number: 12069958Abstract: A device includes a resistance switching layer, a capping layer, a top electrode, a first spacer, and a second spacer. The resistance switching layer is over a substrate. The capping layer is over the resistance switching layer. The top electrode is over the capping layer. The first spacer lines the resistance switching layer and the capping layer. The second spacer lines the first spacer. The capping layer is in contact with the top electrode, the first spacer, and the second spacer.Type: GrantFiled: May 4, 2023Date of Patent: August 20, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tai-Yen Peng, Hui-Hsien Wei, Wei-Chih Wen, Pin-Ren Dai, Chien-Min Lee, Sheng-Chih Lai, Han-Ting Tsai, Chung-Te Lin
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Publication number: 20240260480Abstract: A magnetic tunnel junction (MTJ) memory cell and a metallic etch mask portion are formed over a substrate. At least one dielectric etch stop layer is deposited over the metallic etch mask portion, and a via-level dielectric layer is deposited over the at least one dielectric etch stop layer. A via cavity may be etched through the via-level dielectric layer, and a top surface of the at least one dielectric etch stop layer is physically exposed. The via cavity may be vertically extended by removing portions of the at least one dielectric etch stop layer and the metallic etch mask portion. A contact via structure is formed directly on a top surface of the top electrode in the via cavity to provide a low-resistance contact to the top electrode.Type: ApplicationFiled: April 10, 2024Publication date: August 1, 2024Inventors: Yu-Feng Yin, Tai-Yen Peng, An-Shen Chang, Qiang FU, Chung-Te Lin, Han-Ting Tsai
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Publication number: 20240251566Abstract: An embodiment of an integrated circuit chip includes a combination processing core and magnetoresistive random access memory (MRAM) circuitry integrated into the chip. The MRAM circuitry includes a plurality of MRAM cells. The MRAM cells are organized into a number of memories, including a cache memory, a main or working memory and an optional secondary storage memory. The cache memory includes multiple cache levels.Type: ApplicationFiled: April 4, 2024Publication date: July 25, 2024Inventors: Chung-Te Lin, Yen-Chung Ho, Pin-Cheng Hsu, Han-Ting Tsai, Katherine Chiang
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Publication number: 20240206344Abstract: A memory device includes a bottom electrode contact, a magnetic tunnel junction pattern, a protection insulating layer, a first capping layer, an interlayer insulating layer, and a second capping layer. The magnetic tunnel junction pattern is over the bottom electrode contact. The protection insulating layer surrounds the magnetic tunnel junction pattern. The first capping layer surrounds the protection insulating layer. The interlayer insulating layer surrounds the first capping layer. The second capping layer is over the first capping layer and the interlayer insulating layer.Type: ApplicationFiled: March 4, 2024Publication date: June 20, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tai-Yen PENG, Hui-Hsien WEI, Wei-Chih WEN, Pin-Ren DAI, Chien-Min LEE, Sheng-Chih LAI, Han-Ting TSAI, Chung-Te LIN
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Patent number: 11990167Abstract: A semiconductor device and a method of forming the same are provided. The method includes forming a bottom electrode layer over a substrate. A magnetic tunnel junction (MTJ) layers are formed over the bottom electrode layer. A top electrode layer is formed over the MTJ layers. The top electrode layer is patterned. After patterning the top electrode layer, one or more process cycles are performed on the MTJ layers and the bottom electrode layer. A patterned top electrode layer, patterned MTJ layers and a patterned bottom electrode layer form MTJ structures. Each of the one or more process cycles includes performing an etching process on the MTJ layers and the bottom electrode layer for a first duration and performing a magnetic treatment on the MTJ layers and the bottom electrode layer for a second duration.Type: GrantFiled: June 21, 2021Date of Patent: May 21, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Bo-Jhih Shen, Kuang-I Liu, Joung-Wei Liou, Jinn-Kwei Liang, Yi-Wei Chiu, Chin-Hsing Lin, Li-Te Hsu, Han-Ting Tsai, Cheng-Yi Wu, Shih-Ho Lin