Patents by Inventor HANCHEOL KWON

HANCHEOL KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR DRYING A SEMICONDUCTOR WAFER
    Publication number: 20120103371
    Abstract: A method and apparatus for drying semiconductor wafers uses hot isopropyl alcohol in liquid form at temperatures above 60° C. and below 82° C. The use of hot IPA better avoids pattern collapse and permits reduced consumption of IPA. The wafer temperature can be maintained by applying hot deionized water to the opposite wafer side and by evaporating the hot IPA from the wafer surface using heated nitrogen gas.
    Type: Application
    Filed: October 28, 2010
    Publication date: May 3, 2012
    Applicant: LAM RESEARCH AG
    Inventors: SEOKMIN YUN, HANCHEOL KWON, GERHARD WULZ, FREDERIC KOVACS