Patents by Inventor Hanchuan JI

Hanchuan JI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10415639
    Abstract: A magnetic gravity compensator comprises a stator (1), a rotor (2), a base (4) and an adjustment mechanism (6). The stator (1) is disposed on the base (4), and the rotor (2) is levitated with respect to the stator (1). The stator (1) comprises a central cylindrical magnet (11) that is fixed to the base (4) by the adjustment mechanism (6) and consists of at least two arc magnets (111). The adjustment mechanism (6) has a first end fixed to the base (4) and a second end securely connected to the at least two arc magnets (111). The adjustment mechanism (6) is configured to drive the at least two arc magnets (111) to synchronously move radially with respect to a central axis of the central cylindrical magnet (11) so as to change a magnetic circuit between the central cylindrical magnet (11) and the rotor (2), and thereby adjust a magnetic levitation force between the stator (1) and the rotor (2).
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: September 17, 2019
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Hanchuan Ji, Qingsheng Chen
  • Patent number: 10133153
    Abstract: A self-damping shutter apparatus for use in an exposure system of a photolithography machine, comprising: at least two pieces of shutter blades (1) for cutting off light source to an exposure area when the shutter is closed; a shutter driving arm (2), for driving the shutter blades (1) to synchronically open or close; a magnetic damping brake motor (3), for driving or braking the shutter driving arm (2), and the magnetic damping brake motor (3) drives and brakes, via the shutter driving arm (2), the shutter blades (1). The self-damping shutter apparatus for use in the exposure system of the photolithography machine increases consistency of opening or closing the shutter blades, improves a light shading effect of the shutter apparatus in an exposure, and improves stability in the process of opening or closuring the shutter blades.
    Type: Grant
    Filed: December 29, 2015
    Date of Patent: November 20, 2018
    Assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.
    Inventors: Shuo Shi, Hanchuan Ji
  • Publication number: 20180010633
    Abstract: A magnetic gravity compensator comprises a stator (1), a rotor (2), a base (4) and an adjustment mechanism (6). The stator (1) is disposed on the base (4), and the rotor (2) is levitated with respect to the stator (1). The stator (1) comprises a central cylindrical magnet (11) that is fixed to the base (4) by the adjustment mechanism (6) and consists of at least two arc magnets (111). The adjustment mechanism (6) has a first end fixed to the base (4) and a second end securely connected to the at least two arc magnets (111). The adjustment mechanism (6) is configured to drive the at least two arc magnets (111) to synchronously move radially with respect to a central axis of the central cylindrical magnet (11) so as to change a magnetic circuit between the central cylindrical magnet (11) and the rotor (2), and thereby adjust a magnetic levitation force between the stator (1) and the rotor (2).
    Type: Application
    Filed: February 24, 2016
    Publication date: January 11, 2018
    Inventors: Hanchuan JI, Qingsheng CHEN
  • Publication number: 20170343883
    Abstract: A self-damping shutter apparatus for use in an exposure system of a photolithography machine, comprising: at least two pieces of shutter blades (1) for cutting off light source to an exposure area when the shutter is closed; a shutter driving arm (2), for driving the shutter blades (1) to synchronically open or close; a magnetic damping brake motor (3), for driving or braking the shutter driving arm (2), and the magnetic damping brake motor (3) drives and brakes, via the shutter driving arm (2), the shutter blades (1). The self-damping shutter apparatus for use in the exposure system of the photolithography machine increases consistency of opening or closing the shutter blades, improves a light shading effect of the shutter apparatus in an exposure, and improves stability in the process of opening or closuring the shutter blades.
    Type: Application
    Filed: December 29, 2015
    Publication date: November 30, 2017
    Inventors: Shuo SHI, Hanchuan JI