Abstract: A multilayer Laue Lens includes a compensation layer formed in between a first multilayer section and a second multilayer section. Each of the first and second multilayer sections includes a plurality of alternating layers made of a pair of different materials. Also, the thickness of layers of the first multilayer section is monotonically increased so that a layer adjacent the substrate has a minimum thickness, and the thickness of layers of the second multilayer section is monotonically decreased so that a layer adjacent the compensation layer has a maximum thickness. In particular, the compensation layer of the multilayer Laue lens has an in-plane thickness gradient laterally offset by 90° as compared to other layers in the first and second multilayer sections, thereby eliminating the strict requirement of the placement error.

Abstract: A multilayer Laue Lens includes a compensation layer formed in between a first multilayer section and a second multilayer section. Each of the first and second multilayer sections includes a plurality of alternating layers made of a pair of different materials. Also, the thickness of layers of the first multilayer section is monotonically increased so that a layer adjacent the substrate has a minimum thickness, and the thickness of layers of the second multilayer section is monotonically decreased so that a layer adjacent the compensation layer has a maximum thickness. In particular, the compensation layer of the multilayer Laue lens has an in-plane thickness gradient laterally offset by 90° as compared to other layers in the first and second multilayer sections, thereby eliminating the strict requirement of the placement error.

Abstract: A multidimensional alignment apparatus is provided for multidimensional aligning of two linear multilayer Laue lenses (MLLs) for two-dimensional hard X-ray focusing. The multidimensional alignment apparatus precisely aligns and ensures stability of two linear MLLs performing hard x-ray focusing. The multidimensional alignment apparatus includes a base, a lower stages group controlling a first upstream MLL, an upper stages group positioned over the lower stages group controlling a second downstream MLL and an upper stage support attached to the base. The lower stages group provides five degrees of freedom precision positioning adjustment for the first upstream MLL. The second downstream MLL is mounted on the upper stages group with three degrees of freedom adjustment capability.