Patents by Inventor Hang Eui CHO

Hang Eui CHO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Skin preparation composition for external use containing complex hyaluronic acid
    Patent number: 11110117
    Abstract: Disclosed is a skin preparation composition for external use containing complex hyaluronic acid as an active ingredient, and specifically relates to a skin preparation composition for external use that contains hyaluronic acid, sodium hyaluronate, and hydrolyzed hyaluronic acid as active ingredients, and are excellent in an active oxygen scavenging effect, a wrinkle improvement effect, a moisturizing effect, a skin irritation relief effect, an acne prevention effect, an atopy improvement effect, and an anti-inflammatory effect, an hair damage prevention effect, and a hair loss prevention and hair growth effect.
    Type: Grant
    Filed: January 9, 2020
    Date of Patent: September 7, 2021
    Assignees: J2KBIO CO., LTD., COSMECCA KOREA CO., LTD.
    Inventors: Jae Soeb Lee, Jun Tae Bae, Seok Jong Kim, Young Kwon Cha, Hang Eui Cho, Ju Tae Jeong, Kyeong Seok So
  • Cosmetic composition effective for cell moisturization, intercellular moisturization and skin-barrier moisturization containing plant extract
    Patent number: 11052039
    Abstract: Provided is a cosmetic composition for skin moisturization containing a hydrolyzate extract obtained by adding a protease to the fruit of Cicer arietinum, a Rhododendron chrysanthum leaf extract and a Tricholoma matsutake extract. The cosmetic composition exhibits excellent effects on cell moisturization, intercellular moisturization and skin-barrier moisturization. In addition, the cosmetic composition is harmless to the human body and has excellent stability because it uses natural substances.
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: July 6, 2021
    Assignees: COSEEDBIOPHARM CO., LTD., COSMECCA KOREA CO., LTD.
    Inventors: Sung Min Park, Jung No Lee, Hwa Sun Ryu, Na Ri Kim, Young Kwon Cha, In Young Na, Hang Eui Cho
  • SKIN PREPARATION COMPOSITION FOR EXTERNAL USE CONTAINING COMPLEX HYALURONIC ACID
    Publication number: 20210015847
    Abstract: Disclosed is a skin preparation composition for external use containing complex hyaluronic acid as an active ingredient, and specifically relates to a skin preparation composition for external use that contains hyaluronic acid, sodium hyaluronate, and hydrolyzed hyaluronic acid as active ingredients, and are excellent in an active oxygen scavenging effect, a wrinkle improvement effect, a moisturizing effect, a skin irritation relief effect, an acne prevention effect, an atopy improvement effect, and an anti-inflammatory effect, an hair damage prevention effect, and a hair loss prevention and hair growth effect.
    Type: Application
    Filed: January 9, 2020
    Publication date: January 21, 2021
    Applicants: J2KBIO Co., Ltd., Cosmecca Korea Co., Ltd.
    Inventors: Jae Soeb Lee, Jun Tae Bae, Seok Jong Kim, Young Kwon Cha, Hang Eui Cho, Ju Tae Jeong, Kyeong Seok So
  • COSMETIC COMPOSITION EFFECTIVE FOR CELL MOISTURIZATION, INTERCELLULAR MOISTURIZATION AND SKIN-BARRIER MOISTURIZATION CONTAINING PLANT EXTRACT
    Publication number: 20200237645
    Abstract: Provided is a cosmetic composition for skin moisturization containing a hydrolyzate extract obtained by adding a protease to the fruit of Cicer arietinum, a Rhododendron chrysanthum leaf extract and a Tricholoma matsutake extract. The cosmetic composition exhibits excellent effects on cell moisturization, intercellular moisturization and skin-barrier moisturization. In addition, the cosmetic composition is harmless to the human body and has excellent stability because it uses natural substances.
    Type: Application
    Filed: January 22, 2020
    Publication date: July 30, 2020
    Applicants: Coseedbiopharm Co., Ltd., COSMECCA KOREA CO., LTD.
    Inventors: Sung Min PARK, Jung No LEE, Hwa Sun RYU, Na Ri KIM, Young Kwon CHA, In Young NA, Hang Eui CHO