Patents by Inventor Hangyao Wang

Hangyao Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Increasing zinc sulfide hardness
    Patent number: 9914996
    Abstract: The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: March 13, 2018
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Jitendra S. Goela, Hangyao Wang, Hua Bai, Michael A. Pickering
  • Method of increasing zinc sulfide hardness
    Patent number: 9863040
    Abstract: A method is directed to increasing the hardness of zinc sulfide. The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: January 9, 2018
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Jitendra S. Goela, Hangyao Wang, Hua Bai, Michael A. Pickering
  • Increasing zinc sulfide hardness
    Patent number: 9562286
    Abstract: The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: February 7, 2017
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Jitendra S. Goela, Hangyao Wang, Hua Bai, Michael A. Pickering
  • INCREASING ZINC SULFIDE HARDNESS
    Publication number: 20170022368
    Abstract: The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
    Type: Application
    Filed: October 6, 2016
    Publication date: January 26, 2017
    Inventors: Jitendra S. GOELA, Hangyao WANG, Hua BAI, Michael A. PICKERING
  • INCREASING ZINC SULFIDE HARDNESS
    Publication number: 20160281220
    Abstract: The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
    Type: Application
    Filed: June 10, 2016
    Publication date: September 29, 2016
    Inventors: Jitendra S. GOELA, Hangyao Wang, Hua Bai, Michael A. Pickering
  • INCREASING ZINC SULFIDE HARDNESS
    Publication number: 20160017486
    Abstract: The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 21, 2016
    Inventors: Jitendra S. GOELA, Hangyao WANG, Hua BAI, Michael A. PICKERING
  • Apparatus and method for producing free-standing materials
    Patent number: 8613899
    Abstract: An apparatus includes a manifold with a chamber for mixing multiple reactants. Gases are jetted into the manifold by a plurality of inlet injectors. The inlet injectors are arranged such that the gases passing into the manifold impinge on each other at a common point to form a mixture. The mixture passes through a plurality of holes in one side of the manifold into a deposition chamber where the mixture of gases impinges on additional gases at a common point to provide a reaction resulting in deposition of solid materials in the deposition chamber. The solid materials are free-standing.
    Type: Grant
    Filed: April 17, 2012
    Date of Patent: December 24, 2013
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Heather A. G. Stern, Vincent DiFilippo, Jitendra S. Goela, Michael A. Pickering, Hua Bai, Debashis Chakraborty, Hangyao Wang
  • APPARATUS AND METHOD FOR PRODUCING FREE-STANDING MATERIALS
    Publication number: 20130270356
    Abstract: An apparatus includes a manifold with a chamber for mixing multiple reactants. Gases are jetted into the manifold by a plurality of inlet injectors. The inlet injectors are arranged such that the gases passing into the manifold impinge on each other at a common point to form a mixture. The mixture passes through a plurality of holes in one side of the manifold into a deposition chamber where the mixture of gases impinges on additional gases at a common point to provide a reaction resulting in deposition of solid materials in the deposition chamber. The solid materials are free-standing.
    Type: Application
    Filed: April 17, 2012
    Publication date: October 17, 2013
    Applicants: Dow Globel Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Heather A. G. Stern, Vincent DiFilippo, Jitendra S. Goela, Michael A. Pickering, Hua Bai, Debashis Chakraborty, Hangyao Wang