Patents by Inventor Hanno Heiße

Hanno Heiße has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing a reflection-reducing layer system and reflection-reducing layer system
    Patent number: 10539716
    Abstract: A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface including a nanostructure.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: January 21, 2020
    Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
    Inventors: Ulrike Schulz, Friedrich Rickelt, Peter Munzert, Hanno Heiße, Heiko Knopf, Kevin Füchsel, Norbert Kaiser
  • Method for producing a reflection-reducing layer system and reflection-reducing layer system
    Publication number: 20180203162
    Abstract: A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface including a nanostructure.
    Type: Application
    Filed: March 14, 2018
    Publication date: July 19, 2018
    Inventors: Ulrike Schulz, Friedrich Rickelt, Peter Munzert, Hanno Heiße, Heiko Knopf, Kevin Füchsel, Norbert Kaiser
  • Method for Producing a Reflection-Reducing Layer System and Reflection-Reducing Layer System
    Publication number: 20160216409
    Abstract: A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.
    Type: Application
    Filed: January 27, 2016
    Publication date: July 28, 2016
    Inventors: Ulrike Schulz, Friedrich Rickelt, Peter Munzert, Hanno Heiße, Heiko Knopf, Kevin Füchsel, Norbert Kaiser