Abstract: The invention relates to a process for the purification's of silicon tetrachloride or germanium tetrachloride contaminated with at least one hydrogen-containing compound, in which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a targeted manner by means of a cold plasma and purified silicon tetrachloride or germanium tetrachloride is isolated from the phase which has been treated in this way. The present invention further relates to an apparatus for carrying out the process of the invention, which comprises a stock and vaporization unit for silicon or germanium tetrachloride (4.1 or 5.1) which is connected via a connecting line with the inlet of the reactor (4.3 or 5.3) with control unit (4.4 or 5.4) for producing the dielectrically hindered discharges whose outlet leads via a pipe either directly or indirectly via at least one further reactor (5.5) to a condensation unit (4.5 or 5.11) with downstream collection vessel (4.6 or 5.12) which is connected via an offtake line (4.

Abstract: The invention relates to a process for the purification's of silicon tetrachloride or germanium tetrachloride contaminated with at least one hydrogen-containing compound, in which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a targeted manner by means of a cold plasma and purified silicon tetrachloride or germanium tetrachloride is isolated from the phase which has been treated in this way. The present invention further relates to an apparatus for carrying out the process of the invention, which comprises a stock and vaporization unit for silicon or germanium tetrachloride (4.1 or 5.1) which is connected via a connecting line with the inlet of the reactor (4.3 or 5.3) with control unit (4.4 or 5.4) for producing the dielectrically hindered discharges whose outlet leads via a pipe either directly or indirectly via at least one further reactor (5.5) to a condensation unit (4.5 or 5.11) with downstream collection vessel (4.6 or 5.12) which is connected via an offtake line (4.

Abstract: An ion laser with a gas discharge vessel, for example a helium-selenium ion laser, utilizing cataphoretic vapor transport provides monochromatic exit radiation in a parallel beam of high intensity. The discharge takes place in a tube of high silica glass surrounded at some spacing by an envelope tube that is subject to cooling and is therefore gas-tight for helium. The envelope tube has a configuration or partial partition that provides condensation chambers for the vapor. Advantages are increased power especially for compact and short configurations, with high reliability, safety, and service life.

Abstract: An improved high pressure mercury vapor discharge lamp having a high color emperature together with high luminous efficacy and a high color rendering. This is accomplished by including in the filling halides of at least one of the rare-earth metals dysprosium, holmium, thulium, erbium, and terbium; together with the halides of at least one of the alkali or alkaline earth metals; and including a filtering agent for radiation in the blue spectral region. The lamp is preferably of isothermal design. The electrodes preferably contain 1-3% of Dy.sub.2 O.sub.3.