Abstract: An illumination apparatus for an optical system is disclosed, the illumination apparatus (1) encompassing a single light source (2) that emits broad-band light into an illumination beam path (2a). Placed after the light source (2) in accordance with the present invention is a filter system (4), with which several wavelengths or wavelength regions are separable and are guided through a light-guiding means (22) to an optical system (5). The filter system possesses several reflecting filters (8a, 8b, 8c, 8d) which are arranged in such a way that a selected wavelength is guidable by way of those reflection filters and leaves the filter system (4) parallel to the illumination beam path (2a).

Abstract: An illumination apparatus for an optical system is disclosed, the illumination apparatus (1) encompassing a single light source (2) that emits broad-band light into an illumination beam path (2a). Placed after the light source (2) in accordance with the present invention is a filter system (4), with which several wavelengths or wavelength regions are separable and are guided through a light-guiding means (22) to an optical system (5). The filter system possesses several reflecting filters (8a, 8b, 8c, 8d) which are arranged in such a way that a selected wavelength is guidable by way of those reflection filters and leaves the filter system (4) parallel to the illumination beam path (2a).

Abstract: The invention is based on an apparatus and a method for calibration of an optoelectronic sensor (3) that at least intermittently also receives UV light. A first response characteristic of the sensor (3) is ascertained by illuminating the sensor (3) with the light of a light source (1, 1a, 1b), varying the light quantity of the light incident onto the sensor (3), determining the magnitude of the electrical output signal of the sensor (3) as a function of the light quantity received by the sensor (3).

Abstract: The invention concerns a method for automatic determination of optical parameters of a layer stack, such as layer thicknesses, refractive indices, or absorption coefficients, by comparing an optical measured spectrum acquired from one location in the layer stack to an analysis spectrum calculated on the basis of specified optical parameter values, and optimizing the calculated analysis spectrum to the measured spectrum. It is proposed herein that the acquired measured spectrum be classified on the basis of curve shape parameters that characterize the measured spectrum and are determined therefrom, and that those curve shape parameters be compared to corresponding spectrum curve shape parameters calculated for known layer stacks in order to determine (initial) values or value ranges for the optical parameters to be identified, on the basis of which the analysis spectrum or spectra for comparison with the measured spectrum is/are calculated.