Abstract: A highly efficient getter pump with low maintenance requirements is applied to a vacuum coating installation, allowing a substrate to be coated to remain uncontaminated by a dusting of getter material. The getter pump comprises a pump housing with an exposure opening. The housing has a getter body, of getter material that essentially closes the exposure opening and can move in relation to the exposure opening. An inner sub-section of the surface of the getter body points towards the interior of the pump housing and an outer sub-section points towards the exterior of the pump housing through the exposure opening. The positions of the inner and outer sub-sections are interchangeable by movement of the getter body. The getter pump is equipped with a device for removing getter material from the inner sub-section.

Abstract: A vacuum coating unit with a transport device for transporting substrates in a transport direction, comprises at least one first endless conveyor running in the transport direction and having a conveyor device guided around at least two deflection rollers. The conveyor device is located at a distance from a guide device extending in the transport direction parallel to the conveyor device of the first endless conveyor in such a way that the substrates can be introduced into the gap between the conveyor device and the guide device and can be moved in the transport direction by the displacement of the conveyor device.

Abstract: A transport device for transporting elongated substrates through a vacuum coating system comprises an essentially rectangular frame and two groups of holding elements, which are rotatably mounted on opposite sides of the frame in such a manner that any pair of opposite holding elements can be connected to both ends of a substrate. Furthermore, at least one retainer bar is provided that is operatively connected to a group of holding elements in such a manner that the holding elements of this group are moveable in order to increase or decrease by choice their distance from the holding elements of the other group. Also provided are a loading and unloading device for loading and unloading the transport device, and a method for loading and unloading the transport device.

Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Abstract: A sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance comprises a prevacuum slice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance. The prevacuum sluice chamber is directly adjacent to the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber. A high-vacuum pump system can also alternatively and selectively be connected to the prevacuum sluice chamber.

Abstract: The invention concerns an apparatus for vacuum coating of substrates of various sizes that consists of lock chambers at the entrance and at the exit and several processing chambers arranged one behind the other as well as of a conveying system for the sequential transport of substrates with a certain substrate width through the lock chambers and for their continuous transport through the coating chambers. The lock and processing chambers each have a chamber width that corresponds to the substrate width, and the lock chamber is characterized by a loading area AL having a width b and a length l that indicates the size of substrate that can be accommodated. The object of the apparatus according to the invention is to better utilize the coatable area of each processing chamber so that less coating material is wasted. The object is solved by making the ratio R of width to length R=w/l greater than a minimum ratio Rmin where Rmin =0.95?0.019 AL.

Abstract: A system for coating band-shaped material, where the band-shaped material travels through at least one process chamber in which there is a vacuum, and at least one cooling roller. On the peripheral surface of each cooling roller are at least two magnetron sputter sources that are arranged separate from one another in magnetron chambers, which are formed by separate magnetron chamber walls and allow each chamber to be evacuated, so the pressure in the magnetron chamber can be maintained higher than that in the process chamber. The magnetron chamber walls and the magnetron sputter sources can be mounted on a common carriage, which is displaceable parallel to the cooling roller axis. The result is the reduction in the maintenance costs in cleaning of the magnetron chamber walls and at the same time improvement of the separation of gas between the magnetron chambers and the process chamber.

Abstract: A tube magnetron for a vacuum coating applications such as plasma sputtering is provided with a hollow rotating tube target arrangement and a magnet system. The hollow rotating tube target arrangement has longitudinally extended target plates that are fixed to a target support. The target plates in cross section are arranged adjacent to each other to form a polygon. The magnet system generates a magnetic field which extends through the tube target arrangement. The magnet system is configured so that generated magnet field has in cross section two maxima arranged in the axial longitudinal direction of the tube target arrangement. The tube magnetron is configured for use with sputtering targets that are in the form of target plates. The target plates may be made from ceramics, ceramic-like and/or high-melting point materials. Materials such as ITO, zinc oxide, silicon can be efficiently and uniformly sputter coated on substrates.

Abstract: A system for coating band-shaped material, where the band-shaped material travels through at least one process chamber in which there is a vacuum, and at least one cooling roller. On the peripheral surface of each cooling roller are at least two magnetron sputter sources that are arranged separate from one another in magnetron chambers, which are formed by separate magnetron chamber walls and allow each chamber to be evacuated, so the pressure in the magnetron chamber can be maintained higher than that in the process chamber. The magnetron chamber walls and the magnetron sputter sources can be mounted on a common carriage, which is displaceable parallel to the cooling roller axis. The result is the reduction in the maintenance costs in cleaning of the magnetron chamber walls and at the same time improvement of the separation of gas between the magnetron chambers and the process chamber.