Patents by Inventor Hans-Dieter Frommeld
Hans-Dieter Frommeld has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6127091Abstract: A photopolymerizable composition, which contains a polymeric binder, a compound which can be polymerized by free radicals and has at least one terminal ethylenic double bond and a photoinitiator combination comprising an N-heterocyclic compound, a thioxanthone derivative and a dialkylamino compound, is highly photosensitive and produces photoresist stencils with vertical side walls.Type: GrantFiled: November 3, 1997Date of Patent: October 3, 2000Assignee: Morton International, Inc.Inventors: Ulrich Geissler, Hans-Dieter Frommeld, Hans Ruckert
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Patent number: 6114091Abstract: A photopolymerizable composition, which contains a polymeric binder, a compound which can be polymerized by free radicals and has at least one terminal ethylenic double bond and a photoinitiator combination comprising an N-heterocyclic compound, a thioxanthone derivative and a dialkylamino compound, is highly photosensitive and produces photoresist stencils with vertical side walls.Type: GrantFiled: November 3, 1997Date of Patent: September 5, 2000Assignee: Morton International, Inc.Inventors: Ulrich Geissler, Hans-Dieter Frommeld, Hans Ruckert
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Patent number: 5221595Abstract: A photopolymerizable mixture is disclosed that contains a polymer binder, a polymerizable compound having at least one terminal ethylene double bond and a boiling point above 100.degree. C. at normal pressure, a hexaarylbisimidazole and a 1,3-diarylpyrazoline or a 1-aryl-3-aralkenyl-pyrazoline. The mixture is suitable for the preparation of printing plates and photoresists and is distinguished by high photosensitivity and low sensitivity towards acid solutions.Type: GrantFiled: March 27, 1991Date of Patent: June 22, 1993Assignee: Hoechst AktiengesellschaftInventors: Juergen Lingnau, Hans-Dieter Frommeld
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Patent number: 5217845Abstract: A photopolymerizable mixture is described which contains a polymeric binder, a polymerizable compound and an acridine compound of the general formula I ##STR1## as photoinitiator, in which R.sup.1 denotes an optionally substituted alkyl or acyl group,R.sup.2, R.sup.3 are identical or different and denoteand R.sup.4 hydrogen or halogen atoms or optionally substituted alkyl or acyl groups,R.sup.5, R.sup.6 are identical or different and denoteand R.sup.7 hydrogen or halogen atoms or optionally substituted alkyl, aryl or acyl groups, or groups of the formula II ##STR2## The photoinitiators yield a mixture having high photosensitivity and have a lower tendency to diffusion than the known 9-phenylacridine.Type: GrantFiled: September 26, 1991Date of Patent: June 8, 1993Assignee: Hoechst AktiengesellschaftInventors: Hartmut Steppan, Hans-Dieter Frommeld
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Patent number: 5200299Abstract: Compounds of the general formula I ##STR1## are described in which R.sup.1 is a group of the formula ##STR2## and R.sup.2 is a hydrogen atom or a methyl group, orR.sup.1 and R.sup.2 jointly form an optionally substituted 5- or 6-membered ring,R.sup.3 is a hydrogen atom, a methyl group or an optionally substituted phenyl group,R.sup.4 is a hydrogen or halogen atom, a methyl group, an optionally substituted benzoyl group or a group of the formula ##STR3## n is zero or 1, X is a hydrogen or chlorine atom, an alkyl group containing 1 to 4 carbon atoms or one of the groups OA, CH.sub.2 OA, CH.sub.2 NHA or C.sub.2 H.sub.4 OA, andA is an acryloyl or methacryloyl group,the compounds containing in each case at least one group A. The compounds are suitable for the production of photoresists and printing plates as diffusion-resistant photoinitiators in photopolymerizable mixtures.Type: GrantFiled: December 21, 1989Date of Patent: April 6, 1993Assignee: Hoechst AktiengesellschaftInventors: Hartmut Steppan, Hans-Dieter Frommeld
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Patent number: 5085669Abstract: The invention describes a process for stabilizing a leuco-dye solution in an organic solvent against oxidation in air. In the process, a compound containing at least one 2,2,6,6-tetraalkylpiperidine, 2,2-dialkylpiperidine-6-spiro-cycloalkane or piperidine-2,6-dispiro-cycloalkane grouping is added to the solution. The process is, in particular, used for stabilizing photoresist solutions which, apart from the leuco dye, contain polymerizable compounds and photoinitiators, especially radiation-sensitive trihalomethyl compounds.Type: GrantFiled: October 6, 1989Date of Patent: February 4, 1992Assignee: Hoechst AktiengesellschaftInventors: Hans-Dieter Frommeld, Hartmut Wiezer
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Patent number: 5057398Abstract: A photopolymerizable composition that contains a polymeric binder, a polymerizable compound and photoinitiator combination comprising an N-heterocyclic compound and a halogen compound corresponding to one of the folowing formulas I and II ##STR1## in which X.sup.1 stands for chlorine or bromine,X.sup.2 and X.sup.3 are identical or different and denote X.sup.1, hydrogen or alkyl groups,Y and Z are identical or different and denote X.sup.1, hydrogen, CN or (A).sub.n --(B).sub.n --D,A is a phenylene group,n is 0 or 1,B is CO or SO.sub.2,D is R, OR, NHR, NH.sub.2, NR.sub.2 or CX.sup.1 X.sup.2 X.sup.3,R is an alkyl, cycloalkyl, aryl or heteroyl radical,W is a five or six-membered heterocyclic ring having from 1 to 3 heteroatoms, which optionally carries substituents and optionally a fused aromatic ring, andm is 1 or 2,is distinguished by an improved light sensitivity.Type: GrantFiled: April 26, 1990Date of Patent: October 15, 1991Assignee: Hoechst AktiengesellschaftInventors: Hans-Dieter Frommeld, Hansjoerg Vollmann
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Patent number: 4940647Abstract: The invention comprises a photopolymerizable mixture comprising as the essential constituents a polymeric binder, a compound capable of forming a polymer by free-radical initiated polymerization, a photoinitiator, a leuco dye and a leuco dye stabilizer having at least one epoxy group. The mixture has a better shelf life in the dark than known compositions and is preferably used in the preparation of dry photoresists.Type: GrantFiled: October 6, 1988Date of Patent: July 10, 1990Assignee: Hoechst AktiengesellschaftInventors: Hans-Dieter Frommeld, Hartmut Wiezer
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Patent number: 4780393Abstract: Upon imagewise exposure, a photopolymerizable composition which contains(a) a polymeric binder;(b) a compound that has at least one terminal ethylenic double bond and a boiling temperature, at standard pressure, of above 100.degree. C., and that can form a polymer by polymerization initiated by a free-radical process;(c) a photoinitiator;(d) a leuco base of a triarylmethane dye; and(e) a photochromic spiro-indolino-benzopyran compound represented by the formula ##STR1## wherein R denotes a hydrogen atom or a C.sub.1 -to-C.sub.16 alkyl group,R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are identical or different, and each denotes a hydrogen or a halogen atom, a C.sub.1 -to-C.sub.4 alkyl or alkoxy group, or a nitro group, andR.sup.5, R.sup.6, R.sup.7 and R.sup.8 are identical or different, and each denotes a hydrogen or a halogen atom, a nitro or an amino group, a C.sub.1 -to-C.sub.5 alkyl or alkoxy group, or a C.sub.6 -to-C.sub.Type: GrantFiled: January 22, 1987Date of Patent: October 25, 1988Assignee: Hoechst AktiengesellschaftInventor: Hans-Dieter Frommeld
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Patent number: 4749639Abstract: A photosensitive composition comprising a polymeric diazonium salt, preferably a diazonium salt polycondensation product, and a polymeric binder possessing lateral crosslinking groups represented by the formula --CH.sub.2 --OR, wherein R denotes a hydrogen atom, a lower alkyl group, a lower acyl group or a lower hydroxyalkyl group, can be used to produce printing plates which yield considerably increased print runs after being baked at temperatures of 150.degree. C. to 250.degree. C.Type: GrantFiled: February 7, 1986Date of Patent: June 7, 1988Assignee: Hoechst AktiengesellschaftInventor: Hans-Dieter Frommeld
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Photopolymerizable composition and photopolymerizable recording material containing said composition
Patent number: 4737445Abstract: In photopolymerizable composition that contains, as the essential constituents,(a) a polymeric binder,(b) a polymerizable compound, and,(c) as the photoinitiator, a 2,3-dihydro-1H-cyclopenta(b)quinoline represented the formula ##STR1## in which R.sup.1 is a substituted or unsubstituted m-valent, carbocyclic aromatic or heterocyclic aromatic radical,R.sup.2 is a hydrogen atom, an alkyl group, an aryl group, an aralkyl group or an aralkenyl group,R.sup.3 and R.sup.4 are identical or different, and each denotes a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group,n is 0 or 1, andm is 1 or 2,the photoinitiator possesses an excellent initiating action, resulting in high image resolution.Type: GrantFiled: October 21, 1986Date of Patent: April 12, 1988Assignee: Hoechst AktiengesellschaftInventors: Hans-Dieter Frommeld, Heike Ziemke -
Patent number: 4659645Abstract: A photosensitive mixture comprised of(a) a diazonium salt polycondensation product comprising recurring units of the formulas A--N.sub.2 X and B, which units are linked by bivalent intermediate members derived from a carbonyl compound which is capable of condensation, wherein the A--N.sub.2 X units are derived from aromatic diazonium compounds that are capable of condensation with formaldehyde, and the B units are derived from compounds which are free from diazonium groups and are also capable of condensation with formaldehyde in a strongly acidic medium;(b) a compound which can be polymerized by a free-radical process;(c) a photopolymerization initiator; and(d) a polymeric binder that is insoluble in water, but soluble in organic solventscan be used in the production of photosensitive printing plates and photoresists.Type: GrantFiled: July 9, 1985Date of Patent: April 21, 1987Assignee: Hoechst AktiengesellschaftInventors: Hans-Dieter Frommeld, Walter Lutz, Hartmut Steppan
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Patent number: 4457997Abstract: A two-component diazotype material, composed of a support and a light-sensitive layer which is applied thereto and contains a polymeric binder, a diazonium salt, a coupler, an acid stabilizer and conventional additives, wherein the support is a biaxially oriented polyester film and the polymeric binder comprises a mixture of about 10-60 percent by weight of a polymer or copolymer of vinyl acetate, for example, a copolymer of vinyl acetate and crotonic acid, and about 40-90 percent by weight of a cellulose ester, such as cellulose acetopropionate, cellulose acetobutyrate, cellulose propionate or cellulose butyrate.Type: GrantFiled: January 5, 1982Date of Patent: July 3, 1984Assignee: Hoechst AktiengesellschaftInventors: Klaus Thoese, Hans-Dieter Frommeld, Siegfried Scheler
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Patent number: 4273850Abstract: This invention relates to an improvement in a two-component diazotype material, composed of a support and of a light-sensitive layer applied to the support, the layer containing at least one benzene diazonium salt as the light-sensitive component and at least one coupler, the improvement comprising the combination of at least one 2,5-dialkoxy-4-mercaptobenzene diazonium salt and at least one compound of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen or alkyl, alkenyl, aralkyl, aryl or cycloalkyl groups, which can be further substituted.Type: GrantFiled: February 25, 1980Date of Patent: June 16, 1981Assignee: Hoechst AktiengesellschaftInventor: Hans-Dieter Frommeld
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Patent number: 4171222Abstract: This invention relates to an improvement in a two-component diazotype material comprising a film support and a light-sensitive layer thereon, the light-sensitive layer being composed of at least one polymeric hydrophobic binder, a light-sensitive diazonium salt and a coupler, the improvement that the light-sensitive layer additionally contains at least one resin containing acid groups, which resin has an acid number of at least about 100 and which is derived from the maleic acid or phthalic acid type.Type: GrantFiled: November 21, 1977Date of Patent: October 16, 1979Assignee: Hoechst AktiengesellschaftInventor: Hans-Dieter Frommeld
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Patent number: 3944423Abstract: Diazotype material includes a light-sensitive diazonium compound of the general formula ##SPC1##Wherein:R.sub.1 and R.sub.2 are substituted or unsubstituted alkyl, aralkyl, or cycloalkyl groups, or form, with the nitrogen atom, a heterocyclic radical, which may be substituted;R.sub.3 is hydrogen or the group OR.sub.6 ;R.sub.4 and R.sub.5 are hydrogen, halogen, alkyl, or OR.sub.6 groups;R.sub.6 is alkyl; or fluorinated alkyl, alkenyl, cycloalkyl, or cycloalkenyl; andX is the anion of the diazonium compound;At least one of the radicals R.sub.4 and R.sub.5 is hydrogen; and at least one of the radicals R.sub.3, R.sub.4, and R.sub.5 is one of said fluorinated radicals, at least one of said fluorinated radicals being further substituted by other halogen atoms, hydroxy groups, acyloxy groups, alkoxy groups, alkylated or acylated amino groups, or aryl radicals.Type: GrantFiled: September 2, 1969Date of Patent: March 16, 1976Assignee: Keuffel & Esser CompanyInventors: Hans-Dieter Frommeld, Herbert Rauhut