Patents by Inventor Hans-Dieter Geiler

Hans-Dieter Geiler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6927853
    Abstract: A method for optical stress analysis comprises the steps of directing an incident beam of polarized light to the sample to be analyzed and analyzing a light bundle exiting the sample in two detection channels extending perpendicular to one another with respect to the polarization direction, providing that the incident beam is elliptically polarized, carrying out the elliptical polarization with an elliptic shape having a comparatively large ratio of the large principal axis to the small principal axis, the direction of rotation of the elliptical polarization of the incident beam changing periodically and using two alternative states of the direction of rotation for each measurement process, adjusting the detection channels which extend perpendicular to one another corresponding to the position of the principal axes of the ellipse and carrying out the difference between two measurements consecutively with the same beam intensity of the incident beam and the same ratio of principal axes, but with opposite direc
    Type: Grant
    Filed: October 25, 2002
    Date of Patent: August 9, 2005
    Assignee: Jena-Wave GmbH
    Inventors: Hans-Dieter Geiler, Matthias Wagner
  • Publication number: 20030081196
    Abstract: A method for optical stress analysis comprises the steps of directing an incident beam of polarized light to the sample to be analyzed and analyzing a light bundle exiting the sample in two detection channels extending perpendicular to one another with respect to the polarization direction, providing that the incident beam is elliptically polarized, carrying out the elliptical polarization with an elliptic shape having a comparatively large ratio of the large principal axis to the small principal axis, the direction of rotation of the elliptical polarization of the incident beam changing periodically and using two alternative states of the direction of rotation for each measurement process, adjusting the detection channels which extend perpendicular to one another corresponding to the position of the principal axes of the ellipse and carrying out the difference between two measurements consecutively with the same beam intensity of the incident beam and the same ratio of principal axes, but with opposite direc
    Type: Application
    Filed: October 25, 2002
    Publication date: May 1, 2003
    Inventors: Hans-Dieter Geiler, Matthias Wagner
  • Patent number: 6081127
    Abstract: The invention is directed to a method and an arrangement for the response analysis of semiconductor materials with optical excitation. The object of the invention, to find a new type of response analysis of semiconductor materials with optical excitation which also allows a sufficiently precise detection of the charge carrier wave with a higher excitation output and a shorter charge carrier lifetime, is met according to the invention in that an exciting laser beam is intensity-modulated with two discrete modulation frequencies (.OMEGA..sub.1 ; .OMEGA..sub.2), the luminescent light exiting from the object is measured on the difference frequency (.OMEGA..sub.1 -.OMEGA..sub.2), and the luminescent light is analyzed as a function of the arithmetic mean (.OMEGA.) of the modulation frequencies (.OMEGA..sub.1 ; .OMEGA..sub.2). The invention is applied in the semiconductor industry for determining different electrical parameters of semiconductor materials.
    Type: Grant
    Filed: March 14, 1996
    Date of Patent: June 27, 2000
    Assignee: Leica Microsystems Wetzlar GmbH
    Inventors: Matthias Wagner, Hans-Dieter Geiler
  • Patent number: 5408327
    Abstract: A process and arrangements for photothermal spectroscopy (thermal wave analysis) by the single-beam method with double modulation technique. A single-beam method is developed making use of the advantages of double modulation technique in detecting the photothermally generated difference frequency without requiring partial beams and while achieving extensive absence of intermodulation, the intensity of the laser beam is modulated before striking the object in such a way that the modulation spectrum substantially contains a carrier frequency (f.sub.1) and two sideband frequencies (f.sub.1 .+-.F.sub.2), wherein f.sub.2 is the base clock frequency of the modulation, a regulating detector and a control loop intervening in the modulation process suppress that component of the base clock frequency (f.sub.2) in the same phase with the mixed frequency of the carrier frequency and sideband frequencies.
    Type: Grant
    Filed: March 15, 1994
    Date of Patent: April 18, 1995
    Assignee: Jenoptik GmbH
    Inventors: Hans-Dieter Geiler, Matthias Wagner
  • Patent number: 5206710
    Abstract: A method and apparatus for thermowave analysis employs a single laser beam, which has an additive, two-frequency, intensity modulation, and is directed onto the object. The amplitude of the mixed frequency of the discrete modulation frequencies, which is not contained in the exciting beam, is analyzed as response signal. By obtaining a reference signal from the exciting beam and forming the difference between this exciting beam and the measurement signal, noise suppression and a lowering of the limit of sensitivity are achieved in an advantageous manner.
    Type: Grant
    Filed: September 25, 1991
    Date of Patent: April 27, 1993
    Assignee: Jenoptik Jena GmbH
    Inventors: Hans-Dieter Geiler, Matthias Wagner, Peter Kowalski