Abstract: In a known method, a quartz glass component is produced for a UV radiation source by melting SiO2-containing grain. Starting therefrom, to indicate an inexpensive method by means of which a quartz glass component is obtained that is characterized by high radiation resistance, it is suggested according to the invention that synthetically produced quartz crystals are molten to obtain a pre-product which consists of quartz glass containing hydroxyl groups in a number greater than the number of SiH groups, and that for the elimination of SiH groups the pre-product is subjected to an annealing treatment at a temperature of at least 850° C., whereby the quartz glass component is obtained. In the quartz glass component of the invention, the quartz glass is molten from synthetically produced quartz crystals, and it has a content of SiH groups of less than 5×1017 molecules/cm3.

Abstract: A discharge vessel with an excimer fill comprises a cap, electrodes and a fill having at least one noble gas and a halogen, which, when the lamp is operating, together form an excimer, the discharge vessel being manufactured from quartz glass. The inner wall of the discharge vessel is completely covered with a passivation layer of a metal oxide of the metals Al, Hf, Y or Sc or the mixed oxides thereof, the layer having an amorphous structure and its layer thickness being 20 to 200 nm.

Abstract: A discharge vessel with an excimer fill comprises a cap, electrodes and a fill having at least one noble gas and a halogen, which, when the lamp is operating, together form an excimer, the discharge vessel being manufactured from quartz glass. The inner wall of the discharge vessel is completely covered with a passivation layer of a metal oxide of the metals Al, Hf, Y or Sc or the mixed oxides thereof, the layer having an amorphous structure and its layer thickness being 20 to 200 nm.