Patents by Inventor Hans Erik Kattouw

Hans Erik Kattouw has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic process and apparatus and inspection process and apparatus
    Patent number: 11599027
    Abstract: A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
    Type: Grant
    Filed: November 8, 2021
    Date of Patent: March 7, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo Tel, Hans Erik Kattouw, Valerio Altini, Bearrach Moest
  • SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS
    Publication number: 20220334499
    Abstract: A method for determining a correction for control of a lithographic process for exposing a pattern on an exposure field using a lithographic apparatus. The method including obtaining a spatial profile describing spatial variation of a performance parameter across at least a portion of the exposure field and co-determining control profiles for the spatial profile to minimize error in the performance parameter while ensuring a minimum contrast quality. The co-determined control profiles include at least a stage control profile for control of a stage arrangement of the lithographic apparatus and an optical element (e.g., lens) manipulator control profile for control of an optical element manipulator of the lithographic apparatus, the manipulator operable to perform a correction for at least magnification in a direction perpendicular to the substrate plane.
    Type: Application
    Filed: August 6, 2020
    Publication date: October 20, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jacob Fredrik Friso KLINKHAMER, Valerio ALTINI, Hans Erik KATTOUW, Theo Wilhelmus Maria THIJSSEN
  • LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS
    Publication number: 20220057719
    Abstract: A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
    Type: Application
    Filed: November 8, 2021
    Publication date: February 24, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Hans Erik KATTOUW, Valerio ALTINI, Bearrach MOEST
  • Lithographic process and apparatus and inspection process and apparatus
    Patent number: 11199782
    Abstract: A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
    Type: Grant
    Filed: November 22, 2017
    Date of Patent: December 14, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbo Tel, Hans Erik Kattouw, Valerio Altini, Bearrach Moest
  • LITHOGRAPHIC PROCESS & APPARATUS AND INSPECTION PROCESS AND APPARATUS
    Publication number: 20210208511
    Abstract: A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
    Type: Application
    Filed: November 22, 2017
    Publication date: July 8, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wim Tjibbo TEL, Hans Erik KATTOUW, Valerio ALTINI, Bearrach MOEST
  • Lithographic apparatus, calibration method, device manufacturing method and computer program product
    Patent number: 7502096
    Abstract: Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor.
    Type: Grant
    Filed: February 7, 2006
    Date of Patent: March 10, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Jeffrey Godefridus Cornelis Tempelaars, Gerardus Carolus Johannus Hofmans, Rene Oesterholt, Jan Hauschild, Hans Erik Kattouw