Patents by Inventor Hans Fosshaug

Hans Fosshaug has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Further method to pattern a substrate
    Patent number: 7150949
    Abstract: The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates. Particular writing strategies are described. Aspects of the present invention are described in the claims, specification and drawings.
    Type: Grant
    Filed: August 4, 2004
    Date of Patent: December 19, 2006
    Assignee: Micronic Laser Systems AB
    Inventors: Per Askebjer, Hans Fosshaug, Robert Eklund, Jonathan Walford
  • Further method to pattern a substrate
    Publication number: 20050053850
    Abstract: The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates. Particular writing strategies are described. Aspects of the present invention are described in the claims, specification and drawings.
    Type: Application
    Filed: August 4, 2004
    Publication date: March 10, 2005
    Applicant: Micronic Laser Systems AB
    Inventors: Per Askebjer, Hans Fosshaug, Robert Eklund, Jonathan Walford