Patents by Inventor Hans-George Franke

Hans-George Franke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High durability mask for dry etch processing of GaAs
    Patent number: 5378316
    Abstract: A mask is described which enables the fabrication of features in GaAs such as waveguides, channels, facets, mesas, and mirrors by dry etch processing in chlorine containing ambients. The mask consists of an amorphous form of carbon which may contain incorporated hydrogen. The mask can be applied, patterned and removed through dry processing techniques.
    Type: Grant
    Filed: January 7, 1993
    Date of Patent: January 3, 1995
    Assignee: Eastman Kodak Company
    Inventors: Hans-George Franke, Eric T. Prince