Patents by Inventor Hans Gossmann

Hans Gossmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11551904
    Abstract: A system and method that allows higher energy implants to be performed, wherein the peak concentration depth is shallower than would otherwise occur is disclosed. The system comprises an ion source, an accelerator, a platen and a platen orientation motor that allows large tilt angles. The system may be capable of performing implants of hydrogen ions at an implant energy of up to 5 MeV. By tilting the workpiece during an implant, the system can be used to perform implants that are typically performed at implant energies that are less than the minimum implant energy allowed by the system. Additionally, the resistivity profile of the workpiece after thermal treatment is similar to that achieved using a lower energy implant. In certain embodiments, the peak concentration depth may be reduced by 3 ?m or more using larger tilt angles.
    Type: Grant
    Filed: September 9, 2020
    Date of Patent: January 10, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Venkataramana R. Chavva, KyuHa Shim, Hans Gossmann, Edwin Arevalo, Scott Falk, Rajesh Prasad
  • Publication number: 20220076915
    Abstract: A system and method that allows higher energy implants to be performed, wherein the peak concentration depth is shallower than would otherwise occur is disclosed. The system comprises an ion source, an accelerator, a platen and a platen orientation motor that allows large tilt angles. The system may be capable of performing implants of hydrogen ions at an implant energy of up to 5 MeV. By tilting the workpiece during an implant, the system can be used to perform implants that are typically performed at implant energies that are less than the minimum implant energy allowed by the system. Additionally, the resistivity profile of the workpiece after thermal treatment is similar to that achieved using a lower energy implant. In certain embodiments, the peak concentration depth may be reduced by 3 ?m or more using larger tilt angles.
    Type: Application
    Filed: September 9, 2020
    Publication date: March 10, 2022
    Inventors: Venkataramana R. Chavva, KyuHa Shim, Hans Gossmann, Edwin Arevalo, Scott Falk, Rajesh Prasad
  • Patent number: 4212746
    Abstract: If the edge of a filter cloth is coated with one or more layers of a polychloroprene latex mixture which contains zinc oxide and a silicate filler in addition to a polychloroprene with carboxyl groups, sticking is so greatly reduced that the durability of the filter cloths is substantially increased.
    Type: Grant
    Filed: December 26, 1978
    Date of Patent: July 15, 1980
    Assignee: Bayer Aktiengesellschaft
    Inventors: Edzard Tholema, Heinz-Gerd Nonnenbruch, Hans Gossmann, Peter Schultz