Patents by Inventor Hans Jansen

Hans Jansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8115899
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. A cleaning device may be provided in the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Grant
    Filed: January 23, 2007
    Date of Patent: February 14, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120013870
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 19, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Johannes Henricus Wilhelmus JACOBS, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Marco Koert STAVENGA, Bob STREEFKERK, Martinus Cornelis Maria VERHAGEN, Lejla SEUNTIENS-GRUDA
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120013867
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christian Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120013874
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Application
    Filed: September 23, 2011
    Publication date: January 19, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120008119
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Application
    Filed: September 23, 2011
    Publication date: January 12, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans JANSEN, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Jeroen Johannes Sophia Maria MERTENS, Jahannes Catharinus Hubertus MULKENS, Marco Koert STAVENGA, Bob STREEFKERK, Jan Cornelis VAN DER HOEVEN, Cedric Desire GROUWSTRA
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120008115
    Abstract: A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 12, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • CLEANING DEVICE AND A LITHOGRAPHIC APPARATUS CLEANING METHOD
    Publication number: 20110292359
    Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
    Type: Application
    Filed: August 4, 2011
    Publication date: December 1, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110292358
    Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
    Type: Application
    Filed: August 4, 2011
    Publication date: December 1, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Martinus Cornelis Maria Verhagen, Johannes Hericus Wilhlemus Jacobs, Hans Jansen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110273677
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: July 20, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erick Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
  • Lithographic apparatus and device manufacturing method
    Patent number: 8054445
    Abstract: A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: November 8, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Christiaan Alexander Hoogendam, Timotheus Franciscus Sengers, Anthonie Kuijper
  • Lithographic apparatus and device manufacturing method
    Patent number: 8045137
    Abstract: A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.
    Type: Grant
    Filed: May 14, 2008
    Date of Patent: October 25, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS CLEANING METHOD
    Publication number: 20110222034
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
    Type: Application
    Filed: May 18, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert STAVENGA, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Culjpers, Raymond Gerardus Marius Beeren
  • Lithographic apparatus and device manufacturing method
    Patent number: 8018573
    Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: September 13, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Martinus Cornelis Maria Verhagen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen
  • Cleaning device and a lithographic apparatus cleaning method
    Patent number: 8011377
    Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: September 6, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marlus Beeren, Kornelis Tijmen Hoekerd
  • Method for preventing deposit forming on guide rollers
    Patent number: 8003029
    Abstract: The invention relates to a method for preventing or reducing deposit forming of superabsorbent material and/or oil onto guide rollers during the process of applying a superabsorbent water-in-oil emulsion onto a yarn wherein the oil is a mixture comprising saturated hydrocarbons, characterized in that the at least 70 wt % of the hydrocarbons have 20 to 32 carbon atoms.
    Type: Grant
    Filed: March 22, 2008
    Date of Patent: August 23, 2011
    Assignee: Teijin Aramid B.V.
    Inventors: Hans Jansen, Stephanus Willemsen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110188015
    Abstract: A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
    Type: Application
    Filed: April 11, 2011
    Publication date: August 4, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Roelof Frederik DE GRAAF, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
  • LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD
    Publication number: 20110188013
    Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
    Type: Application
    Filed: February 22, 2011
    Publication date: August 4, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110183257
    Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
    Type: Application
    Filed: April 8, 2011
    Publication date: July 28, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans JANSEN, Sebastiaan Maria Johannes CORNELISSEN, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Hernes JACOBS, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Bob STREEFKERK, Jan-Gerard Cornelis VAN DER TOORN, Peter SMITS, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
  • Lithographic apparatus and lithographic apparatus cleaning method
    Patent number: 7969548
    Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: June 28, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Hans Jansen, Peter Franciscus Wanten, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren
  • FLUID FILTRATION METHOD, FLUID FILTERED THEREBY, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACUTRING METHOD
    Publication number: 20110136064
    Abstract: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
    Type: Application
    Filed: February 17, 2011
    Publication date: June 9, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Roelof Frederik De Graaf, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay