Abstract: Flame-retardant thermoplastic molding materials containing A) at least one polyphenylene ether, B) at least one vinylaromatic polymer, and C) at least one flameproofing agent furthermore comprise D) as an antidrip agent, a high molecular weight polymer based on acrylamide having a viscosity of more than about 1.5 mpas, measured in 0.1% strength aqueous solution at 25° C., and are used for the production of fibers, films and moldings.

Abstract: A radiation-crosslinkable mixture which contains a carboxyl-containing precursor of a heterocyclic polymer, a copolymerizable ethylenically unsaturated ternary sulfonium salt, a photoinitiator and a polar aprotic organic solvent.

Abstract: Structured layers of heat-resistant polycondensates are prepared by a process wherein ethylenically unsaturated tetracarboxylates or adducts or salts of tetracarboxylates, which still contain at least one unesterified carboxylic acid group, with ethylenically unsaturated amines, amides or onium compounds mixed with compounds which contain amino, isocyanate or blocked isocyanate groups and can be subjected to polycondensation with the tetracarboxylates are applied as a layer to a substrate, this layer is exposed through a negative, the unexposed, soluble parts are then removed and the insoluble parts are converted into the final polycondensate form at elevated temperatures.

Abstract: Use of a mixture of from 5 to 95% by weight of an azidosilane of the formulaN.sub.3 --R.sup.3 --Si--R.sup.1.sub.n (OR.sup.2).sub.3-n Iwhere R.sup.1 is C.sub.1 -C.sub.3 -alkyl, phenyl, benzyl or tolyl, R.sup.2 is C.sub.1 -C.sub.4 -alkyl, C.sub.2 -C.sub.4 -alkoxyalkyl, phenyl or benzyl, R.sup.3 is C.sub.1 -C.sub.8 -alkylene, which may be interrupted by oxygen, sulfur or --(N--R.sup.4)-- in which R.sup.4 is hydrogen, methyl, ethyl or phenyl, and n is 0, 1 or 2, and from 5 to 95% by weight of an aminoalkoxysilane of the formulaH.sub.2 N--R.sup.5 --Si--R.sup.6.sub.m (OR.sup.7).sub.3-m (II)where R.sup.5 is C.sub.1 -C.sub.6 -alkylene, C.sub.5 -C.sub.6 -cycloalkylene or C.sub.5 -C.sub.6 -arylene, each of which may be additionally substituted by one or two C.sub.1 -C.sub.3 -alkyl groups, and R.sup.6 and R.sup.7, independently of one another, are C.sub.1 -C.sub.6 -alkyl or C.sub.5 -C.sub.6 -cycloalkyl, each of which may likewise be additionally substituted by one or two C.sub.1 -C.sub.

Abstract: Thin protective polyimide layers are produced on ceramic or high temperature superconductors by applying polyimide solutions, polyamic acids or starting substances therefor to the superconductor surface and imidating or drying in an oxygen atmosphere.

Abstract: Use of a mixture of from 5 to 95% by weight of an azidosilane of the formulaN.sub.3 --R.sup.3 --Si--R.sup.1.sub.n (OR.sup.2).sub.3-n Iwhere R.sup.1 is C.sub.1 -C.sub.3 -alkyl, phenyl, benzyl or tolyl, R.sup.2 is C.sub.1 -C.sub.4 -alkyl, C.sub.2 -C.sub.4 -alkoxyalkyl, phenyl or benzyl, R.sup.3 is C.sub.1 -C.sub.8 -alkylene, which may be interrupted by oxygen, sulfur or --(N--R.sup.4)-- in which R.sup.4 is hydrogen, methyl, ethyl or phenyl, and n is 0, 1 or 2, and from 5 to 95% by weight of an aminoalkoxysilane of the formulaH.sub.2 N--R.sup.5 --Si--R.sup.6.sub.m (OR.sup.7).sub.3-m IIwhere R.sup.5 is C.sub.1 -C.sub.6 -alkylene, C.sub.5 -C.sub.6 -cycloalkylene or C.sub.5 -C.sub.6 -arylene, each of which may be additionally substituted by one or two C.sub.1 -C.sub.3 -alkyl groups, and R.sup.6 and R.sup.7, independently of one another, are C.sub.1 -C.sub.6 -alkyl or C.sub.5 -C.sub.6 -cycloalkyl, each of which may likewise be additionally substituted by one or two C.sub.1 -C.sub.

Abstract: Solutions of polycondensates which have N-containing heterocyclic ring systems as structural units, or solutions of intermediates of these polycondensates, in inorganic solvents, contain from 0.1 to 20% by weight, based on the polycondensates or the intermediates thereof, of one or more azidosilanes of the general formulaN.sub.3 --R.sup.3 --Si--R.sup.1.sub.n (OR.sup.2).sub.3-n Iwhere R.sup.1 is C.sub.1 -C.sub.3 -alkyl, phenyl, benzyl or toluyl, R.sup.2 is C.sub.1 -C.sub.4 -alkyl, C.sub.2 -C.sub.4 -alkoxyalkyl, phenyl or benzyl, R.sup.3 is C.sub.1 -C.sub.8 -alkylene which may be interrupted by an oxygen atom, a sulfur atom or a --(N--R.sup.4) -group, where R.sup.4 is hydrogen, methyl, ethyl or phenyl, and n is 0, 1 or 2.