Patents by Inventor Hans-Jurgen Wildau

Hans-Jurgen Wildau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090048524
    Abstract: Implantable pressure measuring unit for internal pressure measurement in a blood vessel or heart of a patient, having a pressure sensor having electrical signal output, fixing means adapted to the intended measurement location for fixing the pressure sensor, a power supply unit of the pressure sensor, a signal detection unit connected by a line to the signal output of the pressure sensor, and a transmitting unit connected to a measurement data output of the signal detection unit, in particular for wireless transmission of measurement data to an analysis unit, in particular outward from the patient body.
    Type: Application
    Filed: August 12, 2008
    Publication date: February 19, 2009
    Inventors: Hans-Jurgen WILDAU, Gerald Czygan, Michael Diebold, Michael Lippert, Claus Harder, Thomas Schmitz-Rode
  • Patent number: 5268311
    Abstract: Disclosed is a thin dielectric inorganic layer overlaying a substrate, and having a thickness of.ltoreq. about 20 nm and a defect density of.ltoreq. about 0.6 defects/cm.sup.2 determined by BV measurements.Also disclosed is a method of forming such a layer, according to which a layer having the desired composition and thickness is formed on a substrate, followed by an ion implantation into the substrate through the layer with a dose of.gtoreq. about 10.sup.15 ions/cm.sup.2 and a subsequent anneal at a temperature of.gtoreq. about 500.degree. C. for a predetermined time.
    Type: Grant
    Filed: April 25, 1991
    Date of Patent: December 7, 1993
    Assignee: International Business Machines Corporation
    Inventors: Wolfgang Euen, Dieter Hagmann, Hans-Jurgen Wildau
  • Patent number: 5051377
    Abstract: Disclosed is a thin dielectric inorganic layer overlaying a substrate, and having a thickness of .ltoreq. about 20 nm and a defect density of .ltoreq. about 0.6 defects/cm.sup.2 determined by BV measurements.Also disclosed is a method of forming such a layer, according to which a layer having the desired composition and thickness is formed on a substrate, followed by an ion implanatation into the substrate through the layer with a dose of .gtoreq. about 10.sup.15 ions/cm.sup.2 and a subsequence anneal at a temperature of .gtoreq. about 500.degree. C. for a predetermined time.
    Type: Grant
    Filed: August 29, 1989
    Date of Patent: September 24, 1991
    Assignee: International Business Machines Corporation
    Inventors: Wolfgang Euen, Dieter Hagmann, Hans-Jurgen Wildau