Patents by Inventor Hans Martin Hertz

Hans Martin Hertz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10085702
    Abstract: The disclosure provides improvements of resolution and contrast in the field of x-ray imaging by using a line emitting, quasi-monochromatic x-ray source for x-ray fluorescence computed tomography. A particular type of x-ray source suitable for this is a line emitting liquid-jet-anode x-ray source. X-ray fluorescence is obtained using nanoparticles, preferably coated nanoparticles with a metallic core. The x-ray radiation from the x-ray source is shaped and filtered using energy dispersive optics before being delivered to the nanoparticles.
    Type: Grant
    Filed: January 2, 2015
    Date of Patent: October 2, 2018
    Assignee: JETTEC AB
    Inventors: Hans Martin Hertz, Jakob Christer Larsson, Ulf Lundström, Hans Daniel Larsson, Carmen Mihaela Vogt
  • Publication number: 20160331336
    Abstract: The disclosure provides improvements of resolution and contrast in the field of x-ray imaging by using a line emitting, quasi-monochromatic x-ray source for x-ray fluorescence computed tomography. A particular type of x-ray source suitable for this is a line emitting liquid-jet-anode x-ray source. X-ray fluorescence is obtained using nanoparticles, preferably coated nanoparticles with a metallic core. The x-ray radiation from the x-ray source is shaped and filtered using energy dispersive optics before being delivered to the nanoparticles.
    Type: Application
    Filed: January 2, 2015
    Publication date: November 17, 2016
    Applicant: JETTEC AB
    Inventors: Hans Martin HERTZ, Jakob Christer LARSSON, Ulf LUNDSTRÖM, Hans Daniel LARSSON, Carmen Mihaela VOGT
  • Patent number: 6760406
    Abstract: In a method of generating X-ray or EUV radiation, a substance is urged through an outlet to generate a jet in a direction from the outlet, at least one energy beam is directed onto the jet, the energy beam interacting with the jet to generate the X-ray or EUV radiation, and the temperature of the outlet is controlled, such that the stability of the jet is improved. An apparatus is also disclosed.
    Type: Grant
    Filed: October 12, 2001
    Date of Patent: July 6, 2004
    Assignee: Jettec AB
    Inventors: Hans Martin Hertz, Oscar Ĥemberg, Lars Rymell, Björn A.M. Hansson, Magnus Berglund
  • Patent number: 6711233
    Abstract: In a method and an apparatus for generating X-ray or EUV radiation, an electron beam is brought to interact with a propagating target jet, typically in a vacuum chamber. The target jet is formed by urging a liquid substance under pressure through an outlet opening. Hard X-ray radiation may be generated by converting the electron-beam energy to Bremsstrahlung and characteristic line emission, essentially without heating the jet to a plasma-forming temperature. Soft X-ray or EUV radiation may be generated by the electron beam heating the jet to a plasma-forming temperature.
    Type: Grant
    Filed: July 23, 2001
    Date of Patent: March 23, 2004
    Assignee: Jettec AB
    Inventors: Hans Martin Hertz, Oscar Hemberg
  • Publication number: 20020044629
    Abstract: A method and an apparatus is designed to produce X-ray or EUV radiation for use in lithography, microscopy, materials science, or medical diagnostics. The radiation is produced by urging a substance through an outlet (6) to generate a microscopic jet (2) in a direction from the outlet (6), and by directing at least one energy beam (1′) onto the jet (2), wherein the energy beam (1′) interacts with the jet (2) to produce the X-ray or EUV radiation. The temperature of the outlet (6) is controlled to increase the directional stability of the jet (2). The thus-achieved directional stability of the jet (2) provides for reduced pulse-to-pulse fluctuations of the produced radiation, improved spatial stability of the radiation source, as well as high average power since the energy beam (1′) can be tightly focused on the jet (2), even at a comparatively large distance from the jet-generating outlet (6).
    Type: Application
    Filed: October 12, 2001
    Publication date: April 18, 2002
    Inventors: Hans Martin Hertz, Oscar Hemberg, Lars Rymell, Bjorn A.M. Hansson, Magnus Berglund
  • Publication number: 20020015473
    Abstract: In a method and an apparatus for generating X-ray or EUV radiation, an electron beam is brought to interact with a propagating target jet, typically in a vacuum chamber. The target jet is formed by urging a liquid substance under pressure through an outlet opening. Hard X-ray radiation may be generated by converting the electron-beam energy to Bremsstrahlung and characteristic line emission, essentially without heating the jet to a plasma-forming temperature. Soft X-ray or EUV radiation may be generated by the electron beam heating the jet to a plasma-forming temperature.
    Type: Application
    Filed: July 23, 2001
    Publication date: February 7, 2002
    Inventors: Hans Martin Hertz, Oscar Hemberg