Patents by Inventor Hans Morian

Hans Morian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate material for X-ray optical components
    Patent number: 7031428
    Abstract: There is provided a substrate material for an optical component for X-rays of wavelength ?R. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 ?R. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10?6 K?1 in a temperature range of about 20 °C. to 100°C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about ?R/30 rms.
    Type: Grant
    Filed: February 13, 2004
    Date of Patent: April 18, 2006
    Assignees: Carl-Zeiss SMT AG, Schott AG
    Inventors: Udo Dinger, Frank Eisert, Martin Weiser, Konrad Knapp, Ina Mitra, Hans Morian
  • Substrate material for X-ray optical components
    Publication number: 20040202278
    Abstract: There is provided a substrate material for an optical component for X-rays of wavelength &lgr;R. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 &lgr;R. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10−6 K−1 in a temperature range of about 20° C. to 100° C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about &lgr;R/30 rms.
    Type: Application
    Filed: February 13, 2004
    Publication date: October 14, 2004
    Applicant: Carl-Zeiss Stiftung Trading as Schott-Glas and Carl Zeiss SMT AG
    Inventors: Udo Dinger, Frank Eisert, Martin Weiser, Konrad Knapp, Ina Mitra, Hans Morian