Abstract: A processing system for plate-like objects is provided, with an exposure device and an object carrier with an object carrier surface for receiving the object. The exposure device and the carrier are movable relative to one another, such that the exact position of the object relative to the carrier is determinable. An edge detection device is provided which comprises at least one edge illumination unit having an illumination area, within which an object edge located in the respective object edge area has light directed onto it from the side of the carrier. At least one edge image detection unit is provided on a side of the object located opposite the carrier, the edge image detection unit imaging an edge section of the object edges located in the illumination area as an edge image, such that the respective edge image is detectable in its exact position relative to the carrier.

Abstract: An exposure system for generating exposed structures in a photosensitive layer arranged on an object is provided. The exposure system has an object carrier accommodating the object and an exposure device, which are movable relative to one another. Exposure beams exit from the exposure device, with each of which an exposure spot can be generated on the photosensitive layer by means of an imaging unit in a position controlled manner. At least one first exposure unit generating a set of first exposure beams and at least one second exposure unit generating a set of second exposure beams is associated with at least one deflecting element, first and second exposure beams of these exposure units being deflectable by the same deflecting element. Mirror surface areas for the first exposure beams and for the second exposure beams are arranged on the deflecting element offset relative to one another in a row direction.

Abstract: An exposure apparatus for producing exposed structures in a photosensitive layer arranged on an object is provided. An object carrier and an exposure device, which can be moved relative to one another in an advance direction, enable exposure spots to be produced on the photosensitive layer in a position-controlled manner. The exposure device has at least one exposure unit with a series of radiation exit regions which are arranged successively in a series direction and from which exposure beams emerge, by means of each of which, passed through an imaging optical system, an exposure spot can be produced on the photosensitive layer and each of which can be deflected by a deflection unit in a deflection direction running transversely to the series direction, such that each exposure beam can produce exposure spots that at least partly overlap one another in a multiplicity of successive positions in the deflection direction.

Abstract: In the case of an exposure system for substrate bodies which carry a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier which carries the substrate body and has a substrate carrier surface, and an exposure device with an optics unit, the optics unit and the machine frame being movable relative to one another in a first direction and in a second direction, so that the photosensitive coating can be exposed by this relative movement in the first direction and in the second direction, in order to improve said system in such a way that a compact configuration is possible, despite in this case a substrate body with a very large extent in the first and the second direction, it is proposed that the exposure device has a guide cross-member for at least one guide carriage of the exposure device, the guide carriage carrying the optics unit, in that the guide carriage is guided on the guide cross-member to be movable in the first direction, and in that the guide cross-member is

Abstract: A processing system for plate-like objects is provided, with an exposure device and an object carrier with an object carrier surface for receiving the object. The exposure device and the carrier are movable relative to one another, such that the exact position of the object relative to the carrier is determinable. An edge detection device is provided which comprises at least one edge illumination unit having an illumination area, within which an object edge located in the respective object edge area has light directed onto it from the side of the carrier. At least one edge image detection unit is provided on a side of the object located opposite the carrier, the edge image detection unit imaging an edge section of the object edges located in the illumination area as an edge image, such that the respective edge image is detectable in its exact position relative to the carrier.

Abstract: In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carr

Abstract: In an exposure system for substrate members which bear a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier bearing the substrate member and an exposure device, wherein the substrate member and the exposure device can be moved relative to one another such that the photosensitive coating can be exposed as a result of this relative movement, it is suggested for an exposure of the photosensitive coating which is as precise as possible that the exposure device have an optics slide which can be moved in the second direction and on which an optical imaging device for the exposure of the substrate member is arranged, and that the exposure device have a light source unit which is arranged on the machine frame separately from the optics slide and has a plurality of light sources, the radiation of which can be coupled into the optical imaging device.

Abstract: A lithography exposure device is provided which includes a mounting device for the layer sensitive to light, an exposure unit with several laser radiation sources, an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device, and a control for controlling intensity and position of exposure spots so that exposed structures which are as precisely structured as possible can be produced. A laser radiation field propagating in the direction of the light-sensitive layer generates each of the exposure spots from respective focal points and has a power density which leads in the conversion area in the light-sensitive layer to formation of a channel penetrating the light-sensitive layer with an index of refraction increased in relation to its surroundings by the Kerr effect and which guides the laser radiation field in a spatially limited manner.

Abstract: In order that an exposure apparatus for producing exposed structures in a photosensitive layer arranged on an object, comprising an object carrier and an exposure device, wherein the object carrier and the exposure device can be moved relative to one another in an advance direction and wherein exposure spots can be produced on the photosensitive layer in a position-controlled manner by means of the exposure device transversely with respect to the advance direction, is improved in such a way that a highest possible exposure power is available, i.e.

Abstract: In the case of an exposure system for substrate bodies which carry a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier which carries the substrate body and has a substrate carrier surface, and an exposure device with an optics unit, the optics unit and the machine frame being movable relative to one another in a first direction and in a second direction, so that the photosensitive coating can be exposed by this relative movement in the first direction and in the second direction, in order to improve said system in such a way that a compact configuration is possible, despite in this case a substrate body with a very large extent in the first and the second direction, it is proposed that the exposure device has a guide cross-member for at least one guide carriage of the exposure device, the guide carriage carrying the optics unit, in that the guide carriage is guided on the guide cross-member to be movable in the first direction, and in that the guide cross-member is

Abstract: In an exposure system for substrate members which bear a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier bearing the substrate member and an exposure device, wherein the substrate member and the exposure device can be moved relative to one another such that the photosensitive coating can be exposed as a result of this relative movement, it is suggested for an exposure of the photosensitive coating which is as precise as possible that the exposure device have an optics slide which can be moved in the second direction and on which an optical imaging device for the exposure of the substrate member is arranged, and that the exposure device have a light source unit which is arranged on the machine frame separately from the optics slide and has a plurality of light sources, the radiation of which can be coupled into the optical imaging device.

Abstract: In order to design a lithography exposure device comprising a mounting device for the layer sensitive to light, an exposure unit comprising several laser radiation sources and an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device and a control for controlling intensity and position of the exposure spots in such a manner that exposed structures which are as precisely structured as possible can be produced, it is suggested that the optical focusing means have an end lens which generates focal points of the laser radiation exiting from each of the laser radiation sources close to the light-sensitive layer, that a laser radiation field propagate in the direction of the light-sensitive layer for generating each of the exposure spots from the respective focal points and have a power density which leads in the conversion area in the light-sensitive layer to the formation of a channel which p

Abstract: The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.

Abstract: In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carr

Abstract: The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.

Abstract: A lithography exposure device for producing exposed structures in a layer sensitive to light includes an exposure unit with a movement unit for the relative movement between the optical focusing element and a mounting device. A controler is provided for controlling intensity and position of the exposure spots, such that a plurality of conversion areas can be produced in the light-sensitive layer via the exposure spots. A controllable deflection device is provided between the laser radiation sources and the optical focusing means for the movement of the exposure spot in the deflection direction.

Abstract: In order to provide a device for generating an image on an image surface with N×M image elements which can be illuminated individually, comprising a plurality of semiconductor radiation sources, each of which generates radiation with at least one color, an optical imaging means with a beam guidance, by means of which a plurality of image elements can be illuminated with each of the semiconductor radiation sources, with which it is possible to generate an image on an image surface in as simple a manner as possible using radiation sources, it is suggested that the image surface (12) be divided into a plurality of continuous image surface sections (14), each comprising a two-dimensional ensemble of image elements (16), that an illumination unit (20, 220, 320) be associated with each of the image surface sections (14) and that each illumination unit (20, 220, 320) have at least one semiconductor radiation source (30) and at least one optical imaging means (40, 240, 340) of its own associated with this illum

Abstract: In order to provide a lithography exposure device for producing exposed structures in a layer sensitive to light, comprising an exposure unit with a movement unit for the relative movement between the optical focusing means and a mounting device and a control for controlling intensity and position of the exposure spots in such a manner that a plurality of conversion areas can be produced in the light-sensitive layer by means of the exposure spots, with which work can be carried out with a reduced number of laser radiation sources, it is suggested that with the exposure spot of each laser radiation source all the conversion areas located within a strip area, which has a width amounting to a multiple of the extension of the exposure spot, be generatable within the same due to movement of the exposure spot in a deflection direction extending transversely to the exposure movement direction and that a controllable deflection device be provided between the laser radiation sources and the optical focusing means for

Abstract: In order to create a lithography exposure device for producing structures extending in a surface area in a light-sensitive layer, with which a radiation field can be generated in the light-sensitive layer and with a control for controlling the intensity and position of the radiation field in such a manner that by means of a large number of successive exposure steps a plurality of conversion areas can be generated, in which the material of the light-sensitive layer is converted from an initial state into an end state and which together result in the structures, with which it is possible to produce, without masks, structures which have in at least one direction an extension which is smaller than that of one of the radiation fields used, it is suggested that with at least some of the exposure steps the control generate radiation fields with a distribution of energy which makes the action of at least two radiation fields on the same conversion area necessary in order to transfer the material of the light-sensitiv

Abstract: A laser radiation source is provided with an array of N individual slave laser diodes in a predetermined surface area. Adjustable power supply networks enable adjustment of the slave laser diodes relative to one another for operation in a stable manner. The slave power supply has a separate power supply network for each slave laser diode. Each of the power supply networks can be adjusted with respect to the current supplied to the respective slave laser diode during a certain operating period. This enables adjusting the slave laser diodes relative to one another. The power supply networks can be connected in parallel and supplied by a common source.