Abstract: The developer nozzle is employed to supply developer, in a photographic technique of a photoresist and etching process, for developing photoresist to a surface of a semiconductor process wafer at least partly covered with the photoresist. The face of the developer nozzle that comes to face the surface of the semiconductor wafer and that closes off the developer supply duct in the developer nozzle is flat.

Abstract: A transmission casing wherein is inserted a flooded hydromotor has together with an annular space traversed by a forced flow a double function both as oil cooler and as receiver container of the externally situated pumps. Both the working substance flowing out from said hydromotor and the flushing oil that is conveyed past it are led together on intermediate ribs and vanes in a flow channel meanderingly passed about said hydromotor to the filling pump feed pipe. Intermediate ribs and vanes are connected or integral with the transmission casing that has many ribs and can be exposed to a cooling current directed as needed. Said annular space is spatially separated by stop plates from mechanical gear portions eventually situated in front, but is at the same time oil sump thereof by means of a connecting opening.