Abstract: The invention provides a charged particle beam device to inspect or structure a specimen with a primary charged particle beam propagating along an optical axis; a beam tube element having a tube voltage; and a retarding field analyzer in the vicinity of the beam tube element to detect secondary charged particles generated by the primary charged particle beam on the specimen. According to the invention, the retarding field analyzer thereby comprises an entrance grid electrode at a second voltage; at least one filter grid electrode at a first voltage; a charged particle detector to detect the secondary charged particles; and at least one further electrode element arranged between the entrance grid electrode and the at least one filter grid electrode. The at least one further electrode element reduces the size of the stray fields regions in the retarding electric field region to improve the energy resolution of the retarding field analyzer.

Abstract: A focussing lens for focussing a charged particle beam onto a specimen at a predetermined landing angle. The focussing lens comprises at least one first electrode having a first aperture to generate a focussing electric field for focussing the charged particle beam onto the specimen and a correcting electrode having a curved surface to compensate for landing angle dependent distortions of the focussing electric field caused by the specimen. With the curved surface of the correcting electrode, it is possible to improve the focussing of a charged particle beam at landing angles that differ from the perpendicular landing angle.

Abstract: The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are imaged with a lens. An electrode unit is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.

Abstract: The invention refers to an apparatus (10) for inspecting a sample (12) of a specimen (14) by means of an electron beam (34) comprising a vacuum chamber (18); an ion beam device (20) for generating an ion beam (22) used for etching a sample (12) from the specimen (14) within said vacuum chamber (18); an electron beam device (30) having a scanning unit (32) for scanning the electron beam (34) across said specimen (14) within said vacuum chamber (18); said electron beam device (30) having a first detector (36) positioned to detect electrons (38) that are released from the specimen (14) in a backward direction with respect to the direction of the electron beam (34); and said electron beam device (30) having a second detector (40) positioned to detect electrons (42) that are released from the sample (12) of the specimen (14) in a forward direction with respect to the direction of the electron beam (34); and separation means (50; 52) within said vacuum chamber (18) to separate the sample (12) from the specimen (14)

Abstract: The invention provides a charged particle beam device to inspect or structure a specimen with a primary charged particle beam propagating along an optical axis; a beam tube element having a tube voltage; and a retarding field analyzer in the vicinity of the beam tube element to detect secondary charged particles generated by the primary charged particle beam on the specimen. According to the invention, the retarding field analyzer thereby comprises an entrance grid electrode at a second voltage; at least one filter grid electrode at a first voltage; a charged particle detector to detect the secondary charged particles; and at least one further electrode element arranged between the entrance grid electrode and the at least one filter grid electrode. The at least one further electrode element reduces the size of the stray fields regions in the retarding electric field region to improve the energy resolution of the retarding field analyzer.

Abstract: The present invention relates to a focussing lens (100) for focussing a charged particle beam (7) onto a specimen (3) at a predetermined landing angle (42; 42?; 42) comprising at least one first electrode (26, 105, 105a) having a first aperture (106) to generate a focussing electric field (110) for focussing the charged particle beam (7) onto the specimen (3); and a correcting electrode having a curved surface (115) to compensate for landing angle dependent distortions of the focussing electric field (110) caused by the specimen (3). With the curved surface (115) of the correcting electrode it is possible to improve the focussing of a charged particle beam at landing angles that differ from the perpendicular landing angle.

Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

Abstract: The invention refers to an apparatus (10) for inspecting a sample (12) of a specimen (14) by means of an electron beam (34) comprising a vacuum chamber (18); an ion beam device (20) for generating an ion beam (22) used for etching a sample (12) from the specimen (14) within said vacuum chamber (18); an electron beam device (30) having a scanning unit (32) for scanning the electron beam (34) across said specimen (14) within said vacuum chamber (18); said electron beam device (30) having a first detector (36) positioned to detect electrons (38) that are released from the specimen (14) in a backward direction with respect to the direction of the electron beam (34); and said electron beam device (30) having a second detector (40) positioned to detect electrons (42) that are released from the sample (12) of the specimen (14) in a forward direction with respect to the direction of the electron beam (34); and separation means (50; 52) within said vacuum chamber (18) to separate the sample (12) from the specimen (14)

Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

Abstract: One embodiment of the present invention is an electron microscope that includes: (a) a main vacuum chamber housing a stage therein and connected to a vacuum pump; (b) a load lock for loading a specimen into said main vacuum chamber; (c) a minicolumn non-translatably positioned inside said main chamber; and (d) a vacuum pump situated inside the main vacuum chamber and external to and connected to the minicolumn.

Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

Abstract: The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.

Abstract: The invention provides a miniaturized optical column for a charged particle beam apparatus for examining a specimen (14). The column is constituted by, among other things, a charged particle source (2) for providing a beam of charged particles (10); a lens system for guiding the beam of charged particles (10) from the source (2) onto the specimen (14); and a housing (40) which, during operation, is set on beam boost potential.

Abstract: One embodiment of the present invention is an electron microscope that includes: (a) a main vacuum chamber housing a stage therein and connected to a vacuum pump; (b) a load lock for loading a specimen into said main vacuum chamber; (c) a minicolumn non-translatably positioned inside said main chamber; and (d) a vacuum pump situated inside the main vacuum chamber and external to and connected to the minicolumn.

Abstract: A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

Abstract: A charged particle beam microscope is described, which is equipped with a minicolumn. Various embodiments are disclosed, suitable for various uses. According to one embodiment the minicolumn is situated inside a mini-environment and can be introduced into and withdrawn from the main vacuum chamber. According to other embodiments, the minicolumn is situated inside the main vacuum chamber. According to further embodiments, a turntable stage is used and the minicolumn is attached to an arm movable in the radial direction of the turntable.

Abstract: The invention provides a charged particle device (1) comprising: a particle source (2) for providing a charged particle beam (4), and objective lens (10) for directing the particle beam onto a specimen (8), said objective lens (10) having an optical axis (6); a particle mirror (14) located on the optical axis (6) of the objective lens (10), said particle mirror having a front surface, a back surface, a drift region (26) reaching from the back surface to the front surface for letting the charged particle beam pass from the back surface to the front surface, said drift region (26) being positioned away from the optical axis (6), and a deflecting region located on the front surface for deflecting charge particles coming from the specimen towards a detector (16).

Abstract: The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.

Abstract: The invention provides a miniaturized optical column for a charged particle beam apparatus for examining a specimen (14). Thereby, the column comprises a charged particle source (2) for providing a beam of charged particles (10); a lens system for guiding the beam of charged particles (10) from the source (2) onto the specimen (14); and a housing (40) which, during operation, is set on beam boost potential.

Abstract: A charged particle beam column with a first vacuum chamber further comprises a particle source for providing a beam of charged particles and a multi aperture unit with at least two beam defining apertures for shaping the beam of charged particles. The particle source and the beam defining apertures are located within the first vacuum chamber. A separation unit for isolating a second vacuum chamber from the first vacuum chamber whereby the separation unit comprises a path aperture for the charged particle beam is arranged between the first and second vacuum chamber. A first deflecting unit directs the beam of charged particles through one of the beam defining apertures and a second deflecting unit directs the beam of charged particles through the path aperture.