Patents by Inventor Hans-Peter Harmann

Hans-Peter Harmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12467817
    Abstract: The invention relates to relates to a pressure cell configured for working according to the piezo-resistive principle and for use under high-energy radiation, particularly for use in space, i.e. to work under cosmic radiation. In order to reduce radiation drift effects during operation of the pressure cell, the pressure cell is treated with a radiation hardening procedure comprising an exposing of the cell with a radiation dose up to a saturation range of a radiation drift curve or above.
    Type: Grant
    Filed: April 14, 2023
    Date of Patent: November 11, 2025
    Assignee: AST Advanced Space Technologies GmbH
    Inventors: Hans-Peter Harmann, Heiko Dartsch, Kyra Bekaan
  • Publication number: 20230332971
    Abstract: The invention relates to relates to a pressure cell configured for working according to the piezo-resistive principle and for use under high-energy radiation, particularly for use in space, i.e. to work under cosmic radiation. In order to reduce radiation drift effects during operation of the pressure cell, the pressure cell is treated with a radiation hardening procedure comprising an exposing of the cell with a radiation dose up to a saturation range of a radiation drift curve or above.
    Type: Application
    Filed: April 14, 2023
    Publication date: October 19, 2023
    Inventors: Hans-Peter Harmann, Heiko Dartsch, Kyra Bekaan
  • Patent number: 9769915
    Abstract: The invention relates to a drive arrangement in a spacecraft, comprising several drive units (TW1,TW2,TW3), several individually controllable drive units that can be continuously applied to a common, constant voltage potential (HV), and a control of the axial thrust in the respective drive units is achieved due to the fact that the production of plasma in the respective drive units is individually controlled. In particular, the time-variable control of the production of plasma occurs by the time-variable control of the flow of neutral working gas (AG) in the ionization chamber (IK).
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: September 19, 2017
    Assignee: Thales Electronic Systems GmbH
    Inventors: Hans-Peter Harmann, Norbert Koch, Guenter Kornfeld
  • Patent number: 8944385
    Abstract: The invention relates to a surface section that is exposed to an ion flow, in particular for a drive arrangement in a spacecraft, comprising an electrostatic ion accelerator arrangement. According to the invention, in order to reduce erosion, an intermediate potential energy surface is provided, the surface being advantageous in that it allows a magnetic field that is essentially parallel to the surface section to be formed.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: February 3, 2015
    Assignee: Thales Electronic Systems GmbH
    Inventors: Hans-Peter Harmann, Norbert Koch, Guenter Kornfeld
  • Patent number: 8587202
    Abstract: The invention relates to an ion accelerator arrangement comprising an electrostatic acceleration field between a cathode to which a frame potential is applied and an anode to which a high-voltage potential is applied. The ion accelerator arrangement further comprises a gas supply system into which a gas-permeable, open porous insulator member is introduced. Also described is a high-voltage insulator arrangement that comprises such an insulator member and is suitable, inter alia, for such an ion accelerator arrangement and for the corona-resistant insulation of other components to which a high voltage is applied.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: November 19, 2013
    Assignee: Thales Electronic Systems GmbH
    Inventors: Hans-Peter Harmann, Norbert Koch, Guenter Kornfeld
  • Patent number: 8581483
    Abstract: The invention relates to an ion accelerator arrangement comprising an ionization chamber which is surrounded by a chamber wall and a magnetic arrangement that is disposed outside the chamber wall. Steps are taken to dissipate lost heat occurring on the chamber wall, and advantageous solutions are provided to protect permanent-magnet elements of the magnetic arrangement.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: November 12, 2013
    Assignee: Thales Electronic Systems GmbH
    Inventors: Hans-Peter Harmann, Norbert Koch, Mathias Clages
  • Publication number: 20110089836
    Abstract: The invention relates to an ion accelerator arrangement comprising an electrostatic acceleration field between a cathode to which a frame potential is applied and an anode to which a high-voltage potential is applied. The ion accelerator arrangement further comprises a gas supply system into which a gas-permeable, open porous insulator member is introduced. Also described is a high-voltage insulator arrangement that comprises such an insulator member and is suitable, inter alia, for such an ion accelerator arrangement and for the corona-resistant insulation of other components to which a high voltage is applied.
    Type: Application
    Filed: September 12, 2008
    Publication date: April 21, 2011
    Inventors: Hans-Peter Harmann, Norbert Koch, Guenter Kornfeld
  • Publication number: 20110089808
    Abstract: The invention relates to an ion accelerator arrangement comprising an ionization chamber which is surrounded by a chamber wall and a magnetic arrangement that is disposed outside the chamber wall. Steps are taken to dissipate lost heat occurring on the chamber wall, and advantageous solutions are provided to protect permanent-magnet elements of the magnetic arrangement.
    Type: Application
    Filed: September 12, 2008
    Publication date: April 21, 2011
    Inventors: Hans-Peter Harmann, Norbert Koch, Mathias Clages
  • Publication number: 20110080085
    Abstract: The invention relates to a surface section that is exposed to an ion flow, in particular for a drive arrangement in a spacecraft, comprising an electrostatic ion accelerator arrangement. According to the invention, in order to reduce erosion, an intermediate potential energy surface is provided, the surface being advantageous in that it allows a magnetic field that is essentially parallel to the surface section to be formed.
    Type: Application
    Filed: September 12, 2008
    Publication date: April 7, 2011
    Inventors: Hans-Peter Harmann, Norbert Koch, Guenter Kornfeld
  • Publication number: 20110073713
    Abstract: The invention relates to a drive arrangement in a spacecraft, comprising several drive units (TW1,TW2,TW3), several individually controllable drive units that can be continuously applied to a common, constant voltage potential (HV), and a control of the axial thrust in the respective drive units is achieved due to the fact that the production of plasma in the respective drive units is individually controlled. In particular, the time-variable control of the production of plasma occurs by the time-variable control of the flow of neutral working gas (AG) in the ionisation chamber (IK).
    Type: Application
    Filed: September 12, 2008
    Publication date: March 31, 2011
    Inventors: Hans-Peter Harmann, Norbert Koch, Guenter Kornfeld
  • Patent number: 6870321
    Abstract: A high-frequency electron source includes a discharge chamber having at least one gas inlet for a gas to be ionized and at least one extraction opening for electrons. The high-frequency electron source also includes a first electrode at least partially surrounding the discharge chamber and a keeper electrode at least partially surround the discharge chamber. The first electrode and the keeper electrode are configured to provide a high-frequency electric field therebetween.
    Type: Grant
    Filed: April 9, 2003
    Date of Patent: March 22, 2005
    Assignee: Astrium GmbH
    Inventors: Karl-Heinz Schartner, Horst Loeb, Hans Juergen Leiter, Hans-Peter Harmann
  • Publication number: 20030209961
    Abstract: A high-frequency electron source includes a discharge chamber having at least one gas inlet for a gas to be ionized and at least one extraction opening for electrons. The high-frequency electron source also includes a first electrode at least partially surrounding the discharge chamber and a keeper electrode at least partially surround the discharge chamber. The first electrode and the keeper electrode are configured to provide a high-frequency electric field therebetween.
    Type: Application
    Filed: April 9, 2003
    Publication date: November 13, 2003
    Applicant: Astrium GmbH
    Inventors: Karl-Heinz Schartner, Horst Loeb, Hans Juergen Leiter, Hans-Peter Harmann