Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.

Abstract: The invention provides an apparatus for defining a pattern on a substrate (52). The apparatus comprises an emission source (48) for directing an emission (50) to the substrate (52), defining a working position (60) between the emission source (48) and the substrate (52), at least one shadow mask (66) having one or more apertures (68, 70, 72, 74) and at least one inspection device for inspecting the properties of the substrate (52) and/or the pattern, the inspection device having at least one inspection tool (82; 88, 90, 92, 94). The shadow mask (66) and the inspection tool (82; 88, 90, 92, 94) are separately provided on a movable portion (6), so that the shadow mask (66) and the inspection tool (82; 88, 90, 92, 94) are subsequently movable into the working position (60). The invention is further related to a method for defining a pattern on a substrate.

Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.

Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.

Abstract: A method and apparatus for maintaining orientation of a wafer with respect to the wafer holder and a source emission is disclosed.Briefly stated, a wafer is disposed on a wafer holder and displaced in translation only while made to continuously follow a planar closed path which allows the rotation of the wafer with respect to source of emission while keeping the wafer and the wafer holder uniformly aligned with respect to each other.

Abstract: A vacuum transfer device includes a central processing chamber and a plurality of additional chambers radially positioned around the central chamber and in vacuum-tight connection therewith. A rotatable coulisse arrangement in the central chamber is extendable so as to reach into the additional chambers when correctly aligned. The device can transfer objects among several work stations without intermediate venting and re-evacuation of the system of chambers.