Abstract: An inorganic thin film is deposited on a substrate by sputtering a sputter target by cathode sputtering in the vicinity of the substrate. To produce the target, at least two pulverulent starting components are mixed. The mixture is tempered if a uniform reaction product can be obtained in this process. It is powdered and the powder is deposited on a metallic base by plasma-jet spraying. This produces the target. Preferably, an oxide mixture is tempered which is a starting product for a superconducting ceramic material. In order to convert the thin film deposited to a superconducting state, it is treated for a prolonged time at temperatures of 300.degree.-800.degree. C. in an oxygen-containing atmosphere. The reaction product obtained on tempering may have, for example, the overall composition ZBa.sub.m Cu.sub.n O.sub.x, where 1.5.ltoreq.m.ltoreq.2.5, 2.ltoreq.n.ltoreq.5 and 4.ltoreq.x.ltoreq.