Abstract: A ferromagnetic magnetron target contains a pattern of blind holes with a circular cross-section distributed along a sputtering surface thereof. A process produces the target for a given magnetron source with a given tunnel field and includes determining and storing the tunnel field course when individual blind holes are provided in a new target surface, additively superimposing the determined tunnel field course of plural individual blind holes, comparing the resulting tunnel field course with a DESIRED tunnel field course; and changing, as a function of the comparison result, the relative parameter position of one or more of the individual blind holes, or the like to control the working of blind holes into the plane target sputtering surface.

Abstract: A composite aluminum plate suitable for making targets for coating processes, and methods for making them are disclosed. The plate comprises a surface layer of pure aluminum or an alloy of pure aluminum, and a supporting layer made of a hardenable aluminum alloy having a Brinell hardness index HB of at least about 50 after being heat-treated under suitable conditions. The targets made are suitable for physical or sputter coating processes such as cathodic sputtering and magnetron sputtering.

Abstract: The present invention provides a composite aluminum plate suitable as a target for coating purposes, said plate comprising a surface layer melted on the basis of pure aluminum (Al.gtoreq.99.99), optionally consisting of a pure alloy, e.g., the members of which have a purity greater than or equal to 99.99%, melted on the basis of pure aluminum (Al.gtoreq.99.99); and (2) a supporting layer comprising a hardenable aluminum alloy having a Brinell hardness index HB of at least about 50 after being heat-treated under suitable conditions. This invention further provides a target suitable for physical or sputter coating processes, such as cathodic sputtering and magnetron sputtering. Methods for preparing such a plate and target are also provided.

Abstract: A rectangular target plate for cathode sputtering apparatus has a groove which extends on the side of the surface to be sputtered, along a center line, and in the bottom of which recesses 5 are provided. By means of a thrust strip 6 inserted into the groove, the target plate can be secured to a cooled support, to obtain a satisfactory thermal contact. The depth of the groove is to ensure that the thrust strip does not protrude from the sputtering plane.