Patents by Inventor Hans-Rudolf Meier
Hans-Rudolf Meier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11161813Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.Type: GrantFiled: December 18, 2019Date of Patent: November 2, 2021Assignee: BASF SEInventors: Hans-Rudolf Meier, Kai-Uwe Schoening, Shrirang Bhikaji Hindalekar
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Publication number: 20200123107Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.Type: ApplicationFiled: December 18, 2019Publication date: April 23, 2020Applicant: BASF SEInventors: Hans-Rudolf Meier, Kai-Uwe Schoening, Shrirang Bhikaji Hindalekar
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Publication number: 20180319746Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.Type: ApplicationFiled: July 16, 2018Publication date: November 8, 2018Applicant: BASF SEInventors: Hans-Rudolf Meier, Kai-Uwe Schoning, Shrirang Bhikaji Hindalekar
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Patent number: 10040762Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.Type: GrantFiled: March 2, 2011Date of Patent: August 7, 2018Assignee: BASF SEInventors: Hans-Rudolf Meier, Kai-Uwe Schoning, Shrirang Bhikaji Hindalekar
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Publication number: 20150210828Abstract: A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.Type: ApplicationFiled: April 3, 2015Publication date: July 30, 2015Applicant: BASF SEInventors: Hans-Rudolf MEIER, Kai-Uwe SCHOENING, Shrirang Bhikaji HINDALEKAR
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Patent number: 9045430Abstract: A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.Type: GrantFiled: March 2, 2011Date of Patent: June 2, 2015Assignee: BASF SEInventors: Hans-Rudolf Meier, Kai-Uwe Schoening, Shrirang Bhikaji Hindalekar
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Publication number: 20130053484Abstract: An intermediate of the formula (I) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, is suitable for preparing a compound of the formula (A) wherein X is a group of the formula (A-I) or (A-II), Y is C11-C17alkyl, and Z is a direct bond, —(CH2)8— or —CH2—S—CH2—. The compounds of the formula (A) are useful for stabilizing an organic material against thermal, oxidative or light induced degradation.Type: ApplicationFiled: March 2, 2011Publication date: February 28, 2013Applicant: BASF SEInventors: Hans-Rudolf Meier, Kai-Uwe Schoning, Shrirang Bhikaji Hindalekar
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Publication number: 20130041076Abstract: A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.Type: ApplicationFiled: March 2, 2011Publication date: February 14, 2013Applicant: BASF SEInventors: Hans-Rudolf Meier, Kai-Uwe Schöning, Shrirang Bhikaji Hindalekar
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Patent number: 7947831Abstract: Polymers grafted with a compound of formula I, wherein the general symbols are as defined within, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.Type: GrantFiled: September 19, 2006Date of Patent: May 24, 2011Assignee: BASF SE LudwigshafenInventors: Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi, Samuel Evans, Paul Dubs, Michèle Gerster
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Patent number: 7799951Abstract: The instant invention discloses a process for preventing contact discoloration of substrates coming into contact with elastomers and stabilizing elastomers to prevent oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation, which comprises incorporating into the elastomers, or applying to these, at least a compound of the formula (I) wherein R1 is C1-C12alkyl, R2 is C1-C12alkyl, or R1 and R2 together with the carbon atom to which they are attached form an unsubstituted or with C1-C4alkyl substituted C5-C12cycloalkyl ring; R3 is hydrogen or —CH2—S(O)m—R5, R4 and R5 independently of each other are unsubstituted or with cyano substituted C5-C18-alkyl; C7-C9phenylalkyl, unsubstituted or with halogen, hydroxyl, cyano or C1-C4alkyl substituted phenyl or naphthyl; benzothiazolyl or —R6—CO2—R7, R6 is C1-C18alkylene, R7 is C1-C18alkyl, and m is 0, 1 or 2.Type: GrantFiled: October 2, 2006Date of Patent: September 21, 2010Assignee: Ciba CorporationInventors: Michèle Gerster, Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi
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Patent number: 7790793Abstract: A composition containing a) a natural or synthetic polymer and b) one or more compounds of the formula (I), (II) or (III) wherein R1, R2 and R3 or Y1, Y2 and Y3 or Z1, Z2 and Z3 are e.g. branched C3-C20alkyl.Type: GrantFiled: February 9, 2004Date of Patent: September 7, 2010Assignee: Ciba Specialty Chem. Corp.Inventors: Hans-Werner Schmidt, Markus Blomenhofer, Klaus Stoll, Hans-Rudolf Meier
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Patent number: 7790897Abstract: The invention describes novel compound of the formula I, wherein the general symbols are as defined in claim 1, as stabilizers for protecting organic materials, in particular synthetic polymers, against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.Type: GrantFiled: February 5, 2009Date of Patent: September 7, 2010Assignee: Ciba Specialty Chemicals Corp.Inventors: Hans-Rudolf Meier, Gerrit Knobloch
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Publication number: 20090227730Abstract: The instant invention discloses a process for preventing contact discoloration of substrates coming into contact with elastomers and stabilizing elastomers to prevent oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation, which comprises incorporating into the elastomers, or applying to these, at least a compound of the formula (I) wherein R1 is C1-C12alkyl, R2 is C1-C12alkyl, or R1 and R2 together with the carbon atom to which they are attached form an unsubstituted or with C1-C4alkyl substituted C5-C12cycloalkyl ring; R3 is hydrogen or —CH2—S(O)m—R5, R4 and R5 independently of each other are unsubstituted or with cyano substituted C5-C18-alkyl; C7-C9phenylalkyl, unsubstituted or with halogen, hydroxyl, cyano or C1-C4alkyl substituted phenyl or naphthyl; benzothiazolyl or —R6—CO2—R7, R6 is C1-C18alkylene, R7 is C1-C18alkyl, and m is 0, 1 or 2.Type: ApplicationFiled: October 2, 2006Publication date: September 10, 2009Applicant: Ciba CorporationInventors: Michèle Gerster, Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi
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Publication number: 20090144915Abstract: The invention describes novel compound of the formula I, wherein the general symbols are as defined in claim 1, as stabilizers for protecting organic materials, in particular synthetic polymers, against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.Type: ApplicationFiled: February 5, 2009Publication date: June 11, 2009Inventors: Hans-Rudolf Meier, Gerrit Knobloch
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Patent number: 7504510Abstract: The invention describes novel compound of the formula (I), wherein the general symbols are as defined in claim 1, as stabilizers for protecting organic materials, in particular synthetic polymers, against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.Type: GrantFiled: February 2, 2004Date of Patent: March 17, 2009Assignee: Ciba Specialty Chemicals Corp.Inventors: Hans-Rudolf Meier, Gerrit Knobloch
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Publication number: 20070149663Abstract: A composition containing a) a natural or synthetic polymer and b) one or more compounds of the formula (I), (II) or (III) wherein R1, R2 and R3 or Y1, Y2 and Y3 or Z1, Z2 and Z3 are e.g. branched C3-C20alkyl.Type: ApplicationFiled: February 9, 2004Publication date: June 28, 2007Inventors: Hans-Werner Schmidt, Markus Blomenhofer, Klaus Stoll, Hans-Rudolf Meier
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Patent number: 7217841Abstract: Elastomers which have excellent stability to prevent oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation comprise, as stabilizers, at least one compound of the formula I [R—S(?O)m—CH2—CH(OH)—CH2]n—N(R1)2-n—R2, ??(I) in which R is C4–C20alkyl, hydroxyl-substituted C4–C20alkyl; phenyl, benzyl, ?-methylbenzyl, ?,?-dimethylbenzyl, cyclohexyl or —(CH2)qCOOR3, and, if m is 0, R may additionally be and, if n is 1 and R4 is hydrogen, R may additionally be R2—R1N—CH2—CH(OH)—CH2—S(?O)m—(CH2)x— or R2—R1N—CH2—CH(OH)—CH2—S(?O)m—CH2—CH2—(O—CH2—CH2)y—, R1 is hydrogen, cyclohexyl or C3–C12alkyl, R2 is R3 is C1-C18alkyl, R4 is hydrogen or —CH2—CH(OH)—CH2—S(?O)m—R, X is C1–C8alkyl, Y is C1–C8alkyl, m is 0 or 1, n is 1 or 2, q is 1 or 2, x is from 2 to 6, and y is 1 or 2. The compounds of the formula I are also suitable as stabilizers for elastomers to prevent contact discoloration of substrates coming into contact with elastomers.Type: GrantFiled: April 15, 2004Date of Patent: May 15, 2007Assignee: Ciba Specialty Chemicals Corp.Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Samuel Evans
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Publication number: 20070015870Abstract: Polymers grafted with a compound of formula I, wherein the general symbols are as defined in claim 1, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.Type: ApplicationFiled: September 19, 2006Publication date: January 18, 2007Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi, Samuel Evans, Paul Dubs, Michele Gerster
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Patent number: 7160955Abstract: Polymers grafted with a compound of formula I, formula (I) wherein the general symbols are as defined in claim 1, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation [R1—SOmnR—SOp—R2.Type: GrantFiled: March 26, 2002Date of Patent: January 9, 2007Assignee: Ciba Specialty Chemicals CorporationInventors: Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi, Samuel Evans, Paul Dubs, Michèle Gerster
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Publication number: 20060173107Abstract: The invention describes novel compound of the formula (I), wherein the general symbols are as defined in claim 1, as stabilizers for protecting organic materials, in particular synthetic polymers, against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.Type: ApplicationFiled: February 2, 2004Publication date: August 3, 2006Inventors: Hans-Rudolf Meier, Gerrit Knobloch