Patents by Inventor Hans-Ulrich Kricheldorf

Hans-Ulrich Kricheldorf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180136369
    Abstract: A coated object and a method for producing a coated object are disclosed. In an embodiment, the coated object includes a substrate and an optical coating disposed on the substrate, wherein the optical coating includes a reflection-reducing layer sequence, which includes a covering layer with a refractive index nA and at least one diamond layer with a refractive index nD1>nA, wherein the diamond layer is disposed between the covering layer and the substrate and includes diamond crystals, and wherein the diamond layer has a layer thickness of less than 500 nm.
    Type: Application
    Filed: April 13, 2016
    Publication date: May 17, 2018
    Inventors: Michael Vergöhl, Stefan Bruns, Hans-Ulrich Kricheldorf, Lothar Schäfer, Markus Höfer, Markus Armgardt
  • Patent number: 9803276
    Abstract: The invention relates to methods and devices for producing one or more low-particle layers on substrates in a vacuum. The layers are deposited onto the substrate from a cylindrical source material, optionally together with a reactive gas component, by means of magnetron sputtering. The layer is deposited against the force of gravity in a sputter-up method. During the method or within the device, the structure or stochiometric atomic composition of the layers can optionally be modified using a plasma source. Multiple sputtering sources with different source materials can be provided in the device such that multiple layers of different compositions can be applied on the substrate at a high speed in one process.
    Type: Grant
    Filed: July 23, 2012
    Date of Patent: October 31, 2017
    Assignee: FRAUNHOER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSHUNG E.V.
    Inventors: Michael Vergöhl, Daniel Rademacher, Hans-Ulrich Kricheldorf, Günter Bräuer
  • Publication number: 20140262752
    Abstract: The invention relates to methods and devices for producing one or more low-particle layers on substrates in a vacuum. The layers are deposited onto the substrate from a cylindrical source material, optionally together with a reactive gas component, by means of magnetron sputtering. The layer is deposited against the force of gravity in a sputter-up method. During the method or within the device, the structure or stochiometric atomic composition of the layers can optionally be modified using a plasma source. Multiple sputtering sources with different source materials can be provided in the device such that multiple layers of different compositions can be applied on the substrate at a high speed in one process.
    Type: Application
    Filed: July 23, 2012
    Publication date: September 18, 2014
    Applicant: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
    Inventors: Michael Vergöhl, Daniel Rademacher, Hans-Ulrich Kricheldorf, Günter Bräuer