Patents by Inventor Hanson Liu
Hanson Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140287571Abstract: A first amorphous silicon layer is formed over a substrate and a second amorphous silicon layer is formed over the first amorphous silicon layer. When a laser annealing process is performed, the second amorphous silicon layer absorbs more laser light than the first amorphous silicon layer does. The first amorphous silicon layer crystallizes into a microcrystalline silicon layer and the second amorphous silicon layer crystallizes into a polysilicon layer. During the laser annealing process, light interference between the first amorphous silicon layer and an underlying buffer layer is eliminated owing to that the second amorphous silicon layer absorbs more laser light. The laser fringe is eliminated. The microcrystalline silicon layer with better crystalline uniformity can serve as an active layer for TFTs in the display area of an OLED display to improve its illumination uniformity.Type: ApplicationFiled: June 5, 2014Publication date: September 25, 2014Inventors: Hanson Liu, Ryan Lee
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Patent number: 8299471Abstract: The invention discloses an organic electroluminescent device includes a substrate. The substrate includes a first control area and a second control area, a polysilicon active layer disposed on the first control area, and a first conductivity type source/drain area disposed in the polysilicon active layer. A first dielectric layer is disposed on the polysilicon active layer serving as a first gate dielectric layer, a first gate and a second gate is disposed on the polysilicon active layer and the second control area, respectively, wherein the first gate and the first conductivity type source/drain area constitute a first conductivity type thin film transistor serving as a switch element. A second dielectric layer disposed on the first gate and the second gate serves as a second gate dielectric layer, a micro-crystal silicon active layer disposed over the second gate.Type: GrantFiled: January 27, 2009Date of Patent: October 30, 2012Assignee: Chimei Innolux CorporationInventors: Hanson Liu, Ryan Lee, Chun-Hsiang Fang
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Patent number: 8120037Abstract: A system for displaying images is disclosed. The system includes a self-emitting display device including an array substrate having a pixel region. A light-emitting diode is disposed on the array substrate of the pixel region. First and second driving thin film transistors are electrically connected to a light-emitting diode. The first driving thin film transistor includes a first gate and an active layer stacked on the array substrate of the pixel region and the second driving thin film transistor includes the active layer and a second gate thereon. The first gate is coupled to a first voltage and the second gate is coupled to a second voltage different from the first voltage during the same frame.Type: GrantFiled: February 19, 2009Date of Patent: February 21, 2012Assignee: Chimei Innolux CorporationInventors: Hanson Liu, Ryan Lee
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Patent number: 7786480Abstract: A system for displaying images. The system comprises a thin film transistor (TFT) device comprising a substrate having a pixel region. An active layer is disposed on the substrate of the pixel region, comprising a channel region, a pair of source/drain regions separated by the channel region. The channel region comprises dopants with a first conductivity type and a second conductivity type opposite to the first conductivity type. A gate structure is disposed on the active layer, comprising a stack of a gate dielectric layer and a gate layer. A method for fabricating a system for displaying images including the TFT device is also disclosed.Type: GrantFiled: August 11, 2006Date of Patent: August 31, 2010Assignee: TPO Displays Corp.Inventors: Yoshihiro Morimoto, Ryan Lee, Hanson Liu, Feng-Yi Chen
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Patent number: 7612379Abstract: An image display system has a multi-gate thin film transistor (TFT) disposed on a transparent substrate. The multi-gate TFT includes a silicon film layer, a first electrode and a reflecting layer. The silicon film layer is formed on the transparent substrate and has a first crystallization zone and a second crystallization zone, which are not adjacent to each other. A grain size of the first crystallization zone is smaller than a grain size of the second crystallization zone. The first electrode corresponding to the first crystallization zone is disposed on the silicon film layer. The reflecting layer corresponding to the second crystallization zone is disposed on the transparent substrate. The silicon film layer is disposed on the transparent substrate and the reflecting layer.Type: GrantFiled: November 9, 2007Date of Patent: November 3, 2009Assignee: TPO Displays Corp.Inventors: Yoshihiro Morimoto, Ryan Lee, Hanson Liu, Fengyi Chen
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Publication number: 20090206344Abstract: A system for displaying images is disclosed. The system includes a self-emitting display device including an array substrate having a pixel region. A light-emitting diode is disposed on the array substrate of the pixel region. First and second driving thin film transistors are electrically connected to a light-emitting diode. The first driving thin film transistor includes a first gate and an active layer stacked on the array substrate of the pixel region and the second driving thin film transistor includes the active layer and a second gate thereon. The first gate is coupled to a first voltage and the second gate is coupled to a second voltage different from the first voltage during the same frame.Type: ApplicationFiled: February 19, 2009Publication date: August 20, 2009Inventors: Hanson Liu, Ryan Lee
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Publication number: 20090206737Abstract: The invention discloses an organic electroluminescent device includes a substrate. The substrate includes a first control area and a second control area, a polysilicon active layer disposed on the first control area, and a first conductivity type source/drain area disposed in the polysilicon active layer. A first dielectric layer is disposed on the polysilicon active layer serving as a first gate dielectric layer, a first gate and a second gate is disposed on the polysilicon active layer and the second control area, respectively, wherein the first gate and the first conductivity type source/drain area constitute a first conductivity type thin film transistor serving as a switch element. A second dielectric layer disposed on the first gate and the second gate serves as a second gate dielectric layer, a micro-crystal silicon active layer disposed over the second gate.Type: ApplicationFiled: January 27, 2009Publication date: August 20, 2009Inventors: Hanson Liu, Ryan Lee, Chun-Hsiang Fang
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Publication number: 20090203160Abstract: A system for displaying images. The system comprises a thin film transistor (TFT) device comprising a substrate comprising a driving circuit region and a pixel region. First and second active layers are disposed on the substrate in the driving circuit region and in the pixel region, respectively. The first active layer has a grain size greater than that of the second active layer. Two gate structures are disposed on the first and second active layers, respectively, in which each gate structure comprises a stack of a gate dielectric layer and a gate layer. A reflector is disposed on the substrate under the first active layer and insulated from the first active layer. A method for fabricating a system for displaying images including the TFT device is also disclosed.Type: ApplicationFiled: April 21, 2009Publication date: August 13, 2009Applicant: TPO Displays Corp.Inventors: Yoshihiro Morimoto, Ryan Lee, Hanson Liu, Feng-Yi Chen
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Publication number: 20090194770Abstract: A first amorphous silicon layer is formed over a substrate and a second amorphous silicon layer is formed over the first amorphous silicon layer. When a laser annealing process is performed, the second amorphous silicon layer absorbs more laser light than the first amorphous silicon layer does. The first amorphous silicon layer crystallizes into a microcrystalline silicon layer and the second amorphous silicon layer crystallizes into a polysilicon layer. During the laser annealing process, light interference between the first amorphous silicon layer and an underlying buffer layer is eliminated owing to that the second amorphous silicon layer absorbs more laser light. The laser fringe is eliminated. The microcrystalline silicon layer with better crystalline uniformity can serve as an active layer for TFTs in the display area of an OLED display to improve its illumination uniformity.Type: ApplicationFiled: December 16, 2008Publication date: August 6, 2009Applicant: TPO DISPLAYS CORP.Inventors: Hanson LIU, Ryan LEE
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Publication number: 20080128704Abstract: An image display system has a multi-gate thin film transistor (TFT) disposed on a transparent substrate. The multi-gate TFT includes a silicon film layer, a first electrode and a reflecting layer. The silicon film layer is formed on the transparent substrate and has a first crystallization zone and a second crystallization zone, which are not adjacent to each other. A grain size of the first crystallization zone is smaller than a grain size of the second crystallization zone. The first electrode corresponding to the first crystallization zone is disposed on the silicon film layer. The reflecting layer corresponding to the second crystallization zone is disposed on the transparent substrate. The silicon film layer is disposed on the transparent substrate and the reflecting layer.Type: ApplicationFiled: November 9, 2007Publication date: June 5, 2008Inventors: Yoshihiro Morimoto, Ryan Lee, Hanson Liu, Fengyi Chen
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Publication number: 20080042131Abstract: A system for displaying images. The system comprises a thin film transistor (TFT) device comprising a substrate comprising a driving circuit region and a pixel region. First and second active layers are disposed on the substrate in the driving circuit region and in the pixel region, respectively. The first active layer has a grain size greater than that of the second active layer. Two gate structures are disposed on the first and second active layers, respectively, in which each gate structure comprises a stack of a gate dielectric layer and a gate layer. A reflector is disposed on the substrate under the first active layer and insulated from the first active layer. A method for fabricating a system for displaying images including the TFT device is also disclosed.Type: ApplicationFiled: August 15, 2006Publication date: February 21, 2008Inventors: Yoshihiro Morimoto, Ryan Lee, Hanson Liu, Feng-Yi Chen
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Publication number: 20080035995Abstract: A system for displaying images. The system comprises a thin film transistor (TFT) device comprising a substrate having a pixel region. An active layer is disposed on the substrate of the pixel region, comprising a channel region, a pair of source/drain regions separated by the channel region. The channel region comprises dopants with a first conductivity type and a second conductivity type opposite to the first conductivity type. A gate structure is disposed on the active layer, comprising a stack of a gate dielectric layer and a gate layer. A method for fabricating a system for displaying images including the TFT device is also disclosed.Type: ApplicationFiled: August 11, 2006Publication date: February 14, 2008Inventors: Yoshihiro Morimoto, Ryan Lee, Hanson Liu, Feng-Yi Chen
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Publication number: 20070285592Abstract: A method for fabricating a system for displaying images is provided, wherein the system comprises a low temperature polysilicon thin film transistor (LTPS-TFT) substrate. The method comprises providing a substrate comprising a first metal layer and a silicon film layer. The silicon film layer is illuminated t by a laser light having a wavelength larger than 400 nm. The silicon film layer is heated to crystallize by absorbing a part of the laser light, and is heated to re-crystallize by absorbing another part of the laser light, which passes through the silicon film layer and is reflected from the first metal layer to the silicon film layer.Type: ApplicationFiled: April 16, 2007Publication date: December 13, 2007Inventors: Yoshihiro Morimoto, Ryan Lee, Hanson Liu
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Patent number: 6577220Abstract: A coil element with no solder joints is made of a continuous conductive strip includes a first terminal, a second terminal, a conductive path between the first terminal and the second terminal. The conductive path has curved regions and foldable hinge regions shaped such that the coil element may be folded into single or multi-turn coils for use in transformers and other electronic devices.Type: GrantFiled: February 14, 2002Date of Patent: June 10, 2003Assignee: Power-One, Inc.Inventors: Hanson Liu, Pi-Yao Aileen Liu
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Publication number: 20020075117Abstract: A coil element with no solder joints is made of a continuous conductive strip includes a first terminal, a second terminal, a conductive path between the first terminal and the second terminal. The conductive path has curved regions and foldable hinge regions shaped such that the coil element may be folded into single or multi-turn coils for use in transformers and other electronic devices.Type: ApplicationFiled: February 14, 2002Publication date: June 20, 2002Applicant: International Power Devices, a Boston, Massachusetts corporationInventors: Hanson Liu, Pi-Yao Aileen Liu
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Patent number: 6377157Abstract: A coil element with no solder joints is made of a continuous conductive strip includes a first terminal, a second terminal, a conductive path between the first terminal and the second terminal. The conductive path has curved regions and foldable hinge regions shaped such that the coil element may be folded into single or multi-turn coils for use in transformers and other electronic devices.Type: GrantFiled: August 17, 2000Date of Patent: April 23, 2002Assignee: International Power Devices, Inc.Inventors: Hanson Liu, Pi-Yao Aileen Liu
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Publication number: 20010028556Abstract: In printed circuit board fabrication, processing steps for components on one section of the board are sometimes incompatible with processing steps for components on another section of the board. The method of the invention provides for physically separate printed circuit board sections that are processed separately and joined together following processing. To provide electrical connection between a first component on a first printed circuit board section and a second component on a second printed circuit board section, the method of the invention includes the steps of connecting the first and second components to conducting regions disposed on edges of their respective printed circuit board sections. The two printed circuit board sections are then joined together so that the two conducting regions contact each other.Type: ApplicationFiled: December 18, 2000Publication date: October 11, 2001Inventors: Qun Lu, Hanson Liu
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Patent number: 6204745Abstract: A coil element with no solder joints is made of a continuous conductive strip includes a first terminal, a second terminal, a conductive path between the first terminal and the second terminal. The conductive path has curved regions and foldable hinge regions shaped such that the coil element may be folded into single or multi-turn coils for use in transformers and other electronic devices.Type: GrantFiled: November 15, 1999Date of Patent: March 20, 2001Assignee: International Power Devices, Inc.Inventors: Hanson Liu, Pi-Yao Aileen Liu