Patents by Inventor Hao-Wei Liao

Hao-Wei Liao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10591816
    Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: March 17, 2020
    Assignee: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Yu-Jie Tsai, Hung-Chia Chou
  • Patent number: 10495919
    Abstract: A photosensitive resin composition and a manufacturing method thereof, a black matrix, a pixel layer, a protective film, a color filter, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), and a solvent (D), wherein the alkali-soluble resin (A) contains a first alkali-soluble resin (A-1) having all of a fluorene group, a polymerizable unsaturated group, and a carbamate group. The photosensitive resin composition contains a specific alkali-soluble resin (A-1), so that a pattern formed by the photosensitive resin composition has no development residue and good sputtering resistance.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: December 3, 2019
    Assignee: Chi Mei Corporation
    Inventors: Fu-Chien Liu, Hao-Wei Liao
  • Publication number: 20190049780
    Abstract: A photosensitive resin composition and a manufacturing method thereof, a black matrix, a pixel layer, a protective film, a color filter, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), and a solvent (D), wherein the alkali-soluble resin (A) contains a first alkali-soluble resin (A-1) having all of a fluorene group, a polymerizable unsaturated group, and a carbamate group. The photosensitive resin composition contains a specific alkali-soluble resin (A-1), so that a pattern formed by the photosensitive resin composition has no development residue and good sputtering resistance.
    Type: Application
    Filed: August 13, 2018
    Publication date: February 14, 2019
    Applicant: Chi Mei Corporation
    Inventors: Fu-Chien Liu, Hao-Wei Liao
  • Publication number: 20180004086
    Abstract: A negative photosensitive resin composition including an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), a solvent (D), and a silicone compound (E) is provided. The silicone compound (E) contains the structure represented by formula (E-1). The negative photosensitive resin composition has good sputtering resistance, by using the negative photosensitive resin composition, the issue of poor sputtering resistance of the spacer or a protective film formed by the negative photosensitive resin composition can be solved.
    Type: Application
    Filed: June 20, 2017
    Publication date: January 4, 2018
    Applicant: Chi Mei Corporation
    Inventors: I-kuang Chen, Hao-Wei Liao
  • Patent number: 9791773
    Abstract: The present invention relates to a photosensitive resin composition for black matrix, as well as a color filter and a liquid crystal display (LCD) device formed by the composition. The aforementioned photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing vinyl unsaturated group(s) (B), a photo initiator (C), quinonediazide sulfonic acid ester (D), a solvent (E) and black pigment (F). The alkali-soluble resin (A) includes epoxy resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy resin (i) having at least two epoxy groups with a compound (ii) having at least one vinyl unsaturated group and carboxyl group. The aforementioned photo initiator (C) includes an O-acyloxime compound (C-1).
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: October 17, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Hao-Wei Liao, I-Chun Hsieh
  • Publication number: 20170235224
    Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).
    Type: Application
    Filed: October 15, 2015
    Publication date: August 17, 2017
    Applicant: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Yu-Jie Tsai, Hung-Chia Chou
  • Publication number: 20170003586
    Abstract: The invention relates to a photosensitive resin composition for black matrix, a color filter formed by the black matrix, and a liquid crystal display element. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D), a black pigment (E), and a compound (F) containing Formula (1). The photosensitive resin composition for black matrix has the advantage of good linearity of pattern with high finesse.
    Type: Application
    Filed: June 28, 2016
    Publication date: January 5, 2017
    Inventors: HAO-WEI LIAO, HUNG-CHIA CHOU
  • Publication number: 20160178813
    Abstract: The invention relates to a photosensitive resin composition for a black matrix, a color filter and a liquid crystal display element formed by the black matrix. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a solvent (D) and a black pigment (E). The photosensitive resin composition for the black matrix has the advantage of improving resolution and taper angle.
    Type: Application
    Filed: December 14, 2015
    Publication date: June 23, 2016
    Inventors: HAO-WEI LIAO, YU-JIE TSAI
  • Publication number: 20160054651
    Abstract: The present invention relates to a photosensitive resin composition for a black matrix and an application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B), a photo-initiator (C), a solvent (D), a black pigment (E) and an oxetane compound having silicon atom (F). The aforementioned alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) having a fluorine atom. The photosensitive resin composition for the black matrix has excellent development resistance and lower surface resistance.
    Type: Application
    Filed: November 5, 2015
    Publication date: February 25, 2016
    Inventors: Chun-An Shih, Hao-Wei Liao, Li-Ting Hsieh, Chen-Yu Wu
  • Publication number: 20160011509
    Abstract: A photosensitive resin composition capable of forming a black matrix having good adhesion and good hardness, a black matrix, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a hyperbranched polymer (D), a solvent (E), and a black pigment (F). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) represented by formula (1). The hyperbranched polymer (D) is formed by reacting a multi-mercapto compound and a multi-functional (meth)acrylate.
    Type: Application
    Filed: September 25, 2015
    Publication date: January 14, 2016
    Inventors: Hao-Wei Liao, Hung-Chia Chou
  • Patent number: 9223206
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a solvent, (F) a black pigment, and (G) a metal chelate. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: December 29, 2015
    Assignee: Chi Mei Corporation
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao
  • Publication number: 20150370162
    Abstract: The present invention relates to a photosensitive resin composition for black matrix and an application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo-initiator (C), a solvent (D), a black pigment (E) and a fluorescent brightening agent (F). The aforementioned alkali-soluble resin (A) includes a resin having an unsaturated group (A-1), and the resin having the unsaturated group (A-1) is obtained by polymerizing a mixture, and the mixture comprises an epoxy compound having at least two epoxy groups (a-1-1) and a compound having at least one carboxylic group and at least one vinyl unsaturated group (a-1-2).
    Type: Application
    Filed: June 2, 2015
    Publication date: December 24, 2015
    Inventors: Hung-Chia CHOU, Hao-Wei LIAO
  • Publication number: 20150226892
    Abstract: An alkali-soluble resin, a photosensitive resin composition, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), and an organic solvent (D). The photosensitive resin composition contains a specific alkali-soluble resin (A-1), and therefore the photosensitive resin composition has the advantages of high resolution and excellent development resistance.
    Type: Application
    Filed: February 4, 2015
    Publication date: August 13, 2015
    Inventors: Hao-Wei Liao, Yu-Jie Tsai
  • Patent number: 9063422
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a black pigment, and (F) a solvent. The alkali-soluble resin includes an unsaturated-group-containing resin obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the unsaturated-group-containing resin to the polysiloxane ranges from 0.1 to 3.0. Application of the photosensitive resin composition is also disclosed.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: June 23, 2015
    Assignee: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih
  • Patent number: 9063412
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a first solvent, and (F) a black pigment dispersion. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the black pigment dispersion (F) to the polysiloxane (B) ranges from 5 to 35. Application of the photosensitive resin composition is also disclosed.
    Type: Grant
    Filed: February 4, 2013
    Date of Patent: June 23, 2015
    Assignee: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih
  • Patent number: 9029051
    Abstract: A photosensitive resin composition is provided, which comprises an alkali-soluble resin (A), a polysiloxane polymer (B), a compound containing vinyl unsaturated group(s) (C), a photoinitiator (D), a solvent (E), a black pigment (F) and a light stabilizer (G). The alkali-soluble resin (A) includes a resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy compound having at least two epoxy groups (a-1) with a compound having at least one vinyl unsaturated group and carboxyl group (a-2). The light stabilizer (G) includes a UV absorber (G-1) and/or a hindered amine (G-2). Therefore, the photosensitive resin composition has an excellent temporal stability, and a black matrix formed by such composition has a better heat resistance.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: May 12, 2015
    Assignee: Chi Mei Corporation
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao
  • Publication number: 20150115209
    Abstract: The present invention relates to a photosensitive resin composition, a color filter and a liquid crystal display device using the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo initiator (C), a solvent (D) and a black pigment (E) The alkali-soluble resin (A) includes a resin having an unsaturated group (A-1), which is prepared by polymerizing a mixture. The aforementioned compound having a vinyl unsaturated group (B) can include a compound (B-1). The photosensitive resin composition has good reliability at high temperature and high humidity.
    Type: Application
    Filed: October 8, 2014
    Publication date: April 30, 2015
    Inventors: Hao-Wei LIAO, Ching-Yuan TSENG
  • Patent number: 8980506
    Abstract: The present invention relates to a photosensitive resin composition, which comprises an alkali-soluble resin (A), a compound (B) containing vinyl unsaturated group(s), a photoinitiator (C), ortho-naphthoquinone diazide sulfonic acid ester (D), a thermal initiator (E) and a solvent (F). The photosensitive resin composition added with the ortho-naphthoquinone diazide sulfonic acid ester (D) and the thermal initiator (E) can have excellent resolution and development adherence. Moreover, the present invention further provides a spacer or a protective film formed by the aforementioned photosensitive resin composition, as well as a liquid crystal display device (LCD) including the aforementioned spacer or protective film.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: March 17, 2015
    Assignee: Chi Mei Corporation
    Inventors: I-Chun Hsieh, Hao-Wei Liao
  • Publication number: 20150060745
    Abstract: A photosensitive resin composition for a black matrix including an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a black pigment (E), a cross-linking agent (F), and an inorganic particle is provided. The alkali-soluble resin (A) includes a resin (A-1) having an unsaturated group, wherein the resin (A-1) having an unsaturated group is obtained by polymerizing a mixture including an epoxy compound having at least two epoxy groups and a compound having at least one carboxylic acid group and at least one ethylenically unsaturated group. The cross-linking agent (F) includes a cross-linking agent (F-1) obtained by reacting a novolac resin represented by formula (f-1) and an epihalohydrin under an existence of an alkali metal hydroxides. The inorganic particle employs oxides of a Group 4 element, oxides of silicone, or a combination thereof to serve as the major component.
    Type: Application
    Filed: August 19, 2014
    Publication date: March 5, 2015
    Inventors: Hao-Wei Liao, Li-Ting Hsieh
  • Publication number: 20150028272
    Abstract: The present invention relates to a photosensitive resin composition for a black matrix, a color filter including the black matrix and a liquid crystal display device using the same. The aforementioned photosensitive resin composition includes a polysiloxane (A), a compound having a vinyl unsaturated group (B), a photo initiator (C), a solvent (D) and a black pigment (E). The compound having the vinyl unsaturated group (B) includes a compound having an acidic group and at least three vinyl unsaturated groups (B-1).
    Type: Application
    Filed: July 9, 2014
    Publication date: January 29, 2015
    Inventors: Ching-Yuan TSENG, Hao-Wei LIAO