Patents by Inventor Hao-Wei Liu
Hao-Wei Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240096781Abstract: A package structure including a semiconductor die, a redistribution circuit structure and an electronic device is provided. The semiconductor die is laterally encapsulated by an insulating encapsulation. The redistribution circuit structure is disposed on the semiconductor die and the insulating encapsulation. The redistribution circuit structure includes a colored dielectric layer, inter-dielectric layers and redistribution conductive layers embedded in the inter-dielectric layers. The electronic device is disposed over the colored dielectric layer and electrically connected to the redistribution circuit structure.Type: ApplicationFiled: March 20, 2023Publication date: March 21, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun-Ti Lu, Hao-Yi Tsai, Chia-Hung Liu, Yu-Hsiang Hu, Hsiu-Jen Lin, Tzuan-Horng Liu, Chih-Hao Chang, Bo-Jiun Lin, Shih-Wei Chen, Hung-Chun Cho, Pei-Rong Ni, Hsin-Wei Huang, Zheng-Gang Tsai, Tai-You Liu, Po-Chang Shih, Yu-Ting Huang
-
Patent number: 11935804Abstract: In an embodiment, a device includes: an integrated circuit die; an encapsulant at least partially surrounding the integrated circuit die, the encapsulant including fillers having an average diameter; a through via extending through the encapsulant, the through via having a lower portion of a constant width and an upper portion of a continuously decreasing width, a thickness of the upper portion being greater than the average diameter of the fillers; and a redistribution structure including: a dielectric layer on the through via, the encapsulant, and the integrated circuit die; and a metallization pattern having a via portion extending through the dielectric layer and a line portion extending along the dielectric layer, the metallization pattern being electrically coupled to the through via and the integrated circuit die.Type: GrantFiled: April 10, 2023Date of Patent: March 19, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Tzu-Sung Huang, Ming Hung Tseng, Yen-Liang Lin, Hao-Yi Tsai, Chi-Ming Tsai, Chung-Shi Liu, Chih-Wei Lin, Ming-Che Ho
-
Patent number: 11916025Abstract: A device die including a first semiconductor die, a second semiconductor die, an anti-arcing layer and a first insulating encapsulant is provided. The second semiconductor die is stacked over and electrically connected to the first semiconductor die. The anti-arcing layer is in contact with the second semiconductor die. The first insulating encapsulant is disposed over the first semiconductor die and laterally encapsulates the second semiconductor die. Furthermore, methods for fabricating device dies are provided.Type: GrantFiled: August 13, 2021Date of Patent: February 27, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Shih-Wei Chen, Tzuan-Horng Liu, Chia-Hung Liu, Hao-Yi Tsai
-
Publication number: 20230020741Abstract: A solid-state image sensor is provided. The solid-state image sensor includes photoelectric conversion elements. The solid-state image sensor also includes a mosaic pattern layer disposed above the photoelectric conversion elements. The mosaic pattern layer includes an infrared-passing segment and color filter segments disposed on the periphery of the infrared-passing segment. The solid-state image sensor further includes a first condensing structure disposed on the mosaic pattern layer. The infrared-passing segment and the color filter segments share the first condensing structure.Type: ApplicationFiled: July 19, 2021Publication date: January 19, 2023Inventors: Hao-Wei LIU, Chia-Chien HSIEH, Sheng-Chuan CHENG, Ching-Chiang WU
-
Patent number: 9460361Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene; detecting a static foreground object in the region of interest; and performing a foreground analysis based on tracking information to determine whether the static foreground object is abandoned or removed.Type: GrantFiled: August 13, 2014Date of Patent: October 4, 2016Assignee: International Business Machines CorporationInventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
-
Publication number: 20150286889Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene; detecting a static foreground object in the region of interest; and performing a foreground analysis based on tracking information to determine whether the static foreground object is abandoned or removed.Type: ApplicationFiled: August 13, 2014Publication date: October 8, 2015Inventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
-
Patent number: 8934714Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene, detecting a static foreground object in the region of interest, and determining whether the static foreground object is abandoned or removed, wherein said determining comprises performing a foreground analysis based on tracking information and pruning one or more false alarms using one or more track statistics.Type: GrantFiled: May 6, 2013Date of Patent: January 13, 2015Assignee: International Business Machines CorporationInventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
-
Patent number: 8921844Abstract: An optoelectronic materials for OLED is represented by formula (I): wherein R1 is selected from a group consisting of formulas (II)-(VI): wherein R2 and R3 are identical and selected from a group consisting of formula (VII) and formula (VIII): The optoelectronic materials possesses superior luminescent performance and thermal stability and is suitable to be a new type of ambipolar materials for OLED elements.Type: GrantFiled: July 11, 2013Date of Patent: December 30, 2014Assignee: National Tsing Hua UniversityInventors: Chien-Tien Chen, Wei-Shan Chao, Hao-Wei Liu, Wei-Sheng Su
-
Publication number: 20140312311Abstract: An optoelectronic materials for OLED is represented by formula (I): wherein R1 is selected from a group consisting of formulas (II)-(VI): wherein R2 and R3 are identical and selected from a group consisting of formula (VII) and formula (VIII): The optoelectronic materials possesses superior luminescent performance and thermal stability and is suitable to be a new type of ambipolar materials for OLED elements.Type: ApplicationFiled: July 11, 2013Publication date: October 23, 2014Inventors: Chien-Tien CHEN, Wei-Shan CHAO, Hao-Wei LIU, Wei-Sheng SU
-
Publication number: 20130243254Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene, detecting a static foreground object in the region of interest, and determining whether the static foreground object is abandoned or removed, wherein said determining comprises performing a foreground analysis based on tracking information and pruning one or more false alarms using one or more track statistics.Type: ApplicationFiled: May 6, 2013Publication date: September 19, 2013Applicant: International Business Machines CorporationInventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
-
Patent number: 8483481Abstract: Techniques are provided. The techniques include identifying a region of interest in a video scene, applying a background subtraction algorithm to the region of interest to detect a static foreground object in the region of interest, and determining whether the static foreground object is abandoned or removed, wherein determining whether the static foreground object is abandoned or removed comprises performing a foreground analysis based on edge energy and region growing, and pruning one or more false alarms using one or more track statistics.Type: GrantFiled: July 27, 2010Date of Patent: July 9, 2013Assignee: International Business Machines CorporationInventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
-
Publication number: 20120027248Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene, applying a background subtraction algorithm to the region of interest to detect a static foreground object in the region of interest, and determining whether the static foreground object is abandoned or removed, wherein determining whether the static foreground object is abandoned or removed comprises performing a foreground analysis based on edge energy and region growing, and pruning one or more false alarms using one or more track statistics.Type: ApplicationFiled: July 27, 2010Publication date: February 2, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu