Patents by Inventor Hao-Wei Liu

Hao-Wei Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240096781
    Abstract: A package structure including a semiconductor die, a redistribution circuit structure and an electronic device is provided. The semiconductor die is laterally encapsulated by an insulating encapsulation. The redistribution circuit structure is disposed on the semiconductor die and the insulating encapsulation. The redistribution circuit structure includes a colored dielectric layer, inter-dielectric layers and redistribution conductive layers embedded in the inter-dielectric layers. The electronic device is disposed over the colored dielectric layer and electrically connected to the redistribution circuit structure.
    Type: Application
    Filed: March 20, 2023
    Publication date: March 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Ti Lu, Hao-Yi Tsai, Chia-Hung Liu, Yu-Hsiang Hu, Hsiu-Jen Lin, Tzuan-Horng Liu, Chih-Hao Chang, Bo-Jiun Lin, Shih-Wei Chen, Hung-Chun Cho, Pei-Rong Ni, Hsin-Wei Huang, Zheng-Gang Tsai, Tai-You Liu, Po-Chang Shih, Yu-Ting Huang
  • Patent number: 11935804
    Abstract: In an embodiment, a device includes: an integrated circuit die; an encapsulant at least partially surrounding the integrated circuit die, the encapsulant including fillers having an average diameter; a through via extending through the encapsulant, the through via having a lower portion of a constant width and an upper portion of a continuously decreasing width, a thickness of the upper portion being greater than the average diameter of the fillers; and a redistribution structure including: a dielectric layer on the through via, the encapsulant, and the integrated circuit die; and a metallization pattern having a via portion extending through the dielectric layer and a line portion extending along the dielectric layer, the metallization pattern being electrically coupled to the through via and the integrated circuit die.
    Type: Grant
    Filed: April 10, 2023
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tzu-Sung Huang, Ming Hung Tseng, Yen-Liang Lin, Hao-Yi Tsai, Chi-Ming Tsai, Chung-Shi Liu, Chih-Wei Lin, Ming-Che Ho
  • Patent number: 11916025
    Abstract: A device die including a first semiconductor die, a second semiconductor die, an anti-arcing layer and a first insulating encapsulant is provided. The second semiconductor die is stacked over and electrically connected to the first semiconductor die. The anti-arcing layer is in contact with the second semiconductor die. The first insulating encapsulant is disposed over the first semiconductor die and laterally encapsulates the second semiconductor die. Furthermore, methods for fabricating device dies are provided.
    Type: Grant
    Filed: August 13, 2021
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Wei Chen, Tzuan-Horng Liu, Chia-Hung Liu, Hao-Yi Tsai
  • Publication number: 20230020741
    Abstract: A solid-state image sensor is provided. The solid-state image sensor includes photoelectric conversion elements. The solid-state image sensor also includes a mosaic pattern layer disposed above the photoelectric conversion elements. The mosaic pattern layer includes an infrared-passing segment and color filter segments disposed on the periphery of the infrared-passing segment. The solid-state image sensor further includes a first condensing structure disposed on the mosaic pattern layer. The infrared-passing segment and the color filter segments share the first condensing structure.
    Type: Application
    Filed: July 19, 2021
    Publication date: January 19, 2023
    Inventors: Hao-Wei LIU, Chia-Chien HSIEH, Sheng-Chuan CHENG, Ching-Chiang WU
  • Patent number: 9460361
    Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene; detecting a static foreground object in the region of interest; and performing a foreground analysis based on tracking information to determine whether the static foreground object is abandoned or removed.
    Type: Grant
    Filed: August 13, 2014
    Date of Patent: October 4, 2016
    Assignee: International Business Machines Corporation
    Inventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
  • Publication number: 20150286889
    Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene; detecting a static foreground object in the region of interest; and performing a foreground analysis based on tracking information to determine whether the static foreground object is abandoned or removed.
    Type: Application
    Filed: August 13, 2014
    Publication date: October 8, 2015
    Inventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
  • Patent number: 8934714
    Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene, detecting a static foreground object in the region of interest, and determining whether the static foreground object is abandoned or removed, wherein said determining comprises performing a foreground analysis based on tracking information and pruning one or more false alarms using one or more track statistics.
    Type: Grant
    Filed: May 6, 2013
    Date of Patent: January 13, 2015
    Assignee: International Business Machines Corporation
    Inventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
  • Patent number: 8921844
    Abstract: An optoelectronic materials for OLED is represented by formula (I): wherein R1 is selected from a group consisting of formulas (II)-(VI): wherein R2 and R3 are identical and selected from a group consisting of formula (VII) and formula (VIII): The optoelectronic materials possesses superior luminescent performance and thermal stability and is suitable to be a new type of ambipolar materials for OLED elements.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: December 30, 2014
    Assignee: National Tsing Hua University
    Inventors: Chien-Tien Chen, Wei-Shan Chao, Hao-Wei Liu, Wei-Sheng Su
  • Publication number: 20140312311
    Abstract: An optoelectronic materials for OLED is represented by formula (I): wherein R1 is selected from a group consisting of formulas (II)-(VI): wherein R2 and R3 are identical and selected from a group consisting of formula (VII) and formula (VIII): The optoelectronic materials possesses superior luminescent performance and thermal stability and is suitable to be a new type of ambipolar materials for OLED elements.
    Type: Application
    Filed: July 11, 2013
    Publication date: October 23, 2014
    Inventors: Chien-Tien CHEN, Wei-Shan CHAO, Hao-Wei LIU, Wei-Sheng SU
  • Publication number: 20130243254
    Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene, detecting a static foreground object in the region of interest, and determining whether the static foreground object is abandoned or removed, wherein said determining comprises performing a foreground analysis based on tracking information and pruning one or more false alarms using one or more track statistics.
    Type: Application
    Filed: May 6, 2013
    Publication date: September 19, 2013
    Applicant: International Business Machines Corporation
    Inventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
  • Patent number: 8483481
    Abstract: Techniques are provided. The techniques include identifying a region of interest in a video scene, applying a background subtraction algorithm to the region of interest to detect a static foreground object in the region of interest, and determining whether the static foreground object is abandoned or removed, wherein determining whether the static foreground object is abandoned or removed comprises performing a foreground analysis based on edge energy and region growing, and pruning one or more false alarms using one or more track statistics.
    Type: Grant
    Filed: July 27, 2010
    Date of Patent: July 9, 2013
    Assignee: International Business Machines Corporation
    Inventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu
  • Publication number: 20120027248
    Abstract: Techniques for performing foreground analysis are provided. The techniques include identifying a region of interest in a video scene, applying a background subtraction algorithm to the region of interest to detect a static foreground object in the region of interest, and determining whether the static foreground object is abandoned or removed, wherein determining whether the static foreground object is abandoned or removed comprises performing a foreground analysis based on edge energy and region growing, and pruning one or more false alarms using one or more track statistics.
    Type: Application
    Filed: July 27, 2010
    Publication date: February 2, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Rogerio S. Feris, Arun Hampapur, Frederik C. Kjeldsen, Hao-Wei Liu